Abstract

The free photoelectron signals of spectral sensitized AgCl emulsion with different sensitization concentrations are obtained from microwave absorption dielectric spectrum experiment. It is found that when sensitization concentration is small (0.04 mg dye per 40 g AgCl emulsion) or great (4 mg dye per 40 g AgCl emulsion), the decay of free photoelectron of sensitized emulsion is slower or faster than that of pure emulsions; when sensitization concentration is between the above values (0.4 mg dye per 40 g AgCl emulsion), the decay of free photoelectron is the same for sensitized and pure emulsion. The results indicate that the adsorbed green-sensitizing dye on the surface of cubic AgCl microcrystals takes on different actions with different sensitization concentrations.

© 2005 Chinese Optics Letters

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  2. T. Tani, Photographic Sensitivity (Oxford University Press, Oxford, 1995) chap.5.
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  7. H. Saijo and M. Shiojiri, J. Imaging Sci. Technol. 40, 111 (1996).
  8. H. Saijo, K. Tanabe, and M. Shiojiri, J. Imaging Sci. Technol. 43, 89 (1999).
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  11. S. Takada and T. Tani, J. Appl. Phys. 45, 4767 (1974).
  12. T. Tani and T. Suzumoto, J. Appl. Phys. 70, 3626 (1991).

2003 (1)

X. W. Li, C. A. Geng, S. P. Yang, L. Han, and G. S. Fu, Chin. Phys. Lett. 20, 1323 (2003).

2002 (1)

S. P. Yang, X. W. Li, L. Han, and G. S. Fu, Chin. Phys. Lett. 19, 429 (2002).

1999 (1)

H. Saijo, K. Tanabe, and M. Shiojiri, J. Imaging Sci. Technol. 43, 89 (1999).

1998 (1)

W. F. Zhao, H. Saijo, Y. Kobayashi, M. Shiojiri, W. P. Yan, Q. Li, and B. X. Peng, J. Imaging Sci. Technol. 42, 144 (1998).

1997 (1)

H. Saijo and M. Shiojiri, J. Imaging Sci. Technol. 41, 266 (1997).

1996 (1)

H. Saijo and M. Shiojiri, J. Imaging Sci. Technol. 40, 111 (1996).

1995 (1)

H. Saijo, T. Isshiki, M. Shiojiri, S. Watanabe, T. Tain, and K. Ogawa, J. Imaging Sci. Technol. 39, 539 (1995).

1991 (1)

T. Tani and T. Suzumoto, J. Appl. Phys. 70, 3626 (1991).

1974 (1)

S. Takada and T. Tani, J. Appl. Phys. 45, 4767 (1974).

Chin. Phys. Lett. (2)

S. P. Yang, X. W. Li, L. Han, and G. S. Fu, Chin. Phys. Lett. 19, 429 (2002).

X. W. Li, C. A. Geng, S. P. Yang, L. Han, and G. S. Fu, Chin. Phys. Lett. 20, 1323 (2003).

J. Appl. Phys. (2)

S. Takada and T. Tani, J. Appl. Phys. 45, 4767 (1974).

T. Tani and T. Suzumoto, J. Appl. Phys. 70, 3626 (1991).

J. Imaging Sci. Technol. (5)

W. F. Zhao, H. Saijo, Y. Kobayashi, M. Shiojiri, W. P. Yan, Q. Li, and B. X. Peng, J. Imaging Sci. Technol. 42, 144 (1998).

H. Saijo, T. Isshiki, M. Shiojiri, S. Watanabe, T. Tain, and K. Ogawa, J. Imaging Sci. Technol. 39, 539 (1995).

H. Saijo and M. Shiojiri, J. Imaging Sci. Technol. 41, 266 (1997).

H. Saijo and M. Shiojiri, J. Imaging Sci. Technol. 40, 111 (1996).

H. Saijo, K. Tanabe, and M. Shiojiri, J. Imaging Sci. Technol. 43, 89 (1999).

Other (3)

W. West and P. B. Gilman, in The Theory of the Photographic Process, T. H. James(eds.) (Macmillan, New York, 1997) chap.10.

T. Tani, Photographic Sensitivity (Oxford University Press, Oxford, 1995) chap.5.

A. H. Herz, in The Theory of the Photographic Process, T. H. James (eds.) (Macmillan, New York, 1997) chap.9.

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