Abstract

Patterning of self-assembled monolayer (SAM) was demonstrated by area-selective deposition of SAMs on a pattern made by synchrotron radiation (SR) stimulated etching SiO2 thin films. The etching was conducted by exposing the SiO2 films to SR through a Co contact mask with SF6+O2 as the reaction gas. A dodecene SAM was deposited on the etched surface and an octadecyltrichlorosilane SAM was deposited on the SiO2 surface. The deposited SAMs were densely packed and well ordered, which were characterized by infrared spectroscopy, ellipsometer, and water contact angle.

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2000

K. Iimura, Y. Nakajima, and T. Kato, Thin Solid Films 379, 230 (2000).

1998

J. Collet and D. Vuillaume, Appl. Phys. Lett. 73, 2681 (1998).

D. Vuillaume, C. Boulas, J. Collet, and C. Delerue, Phys. Rev. B 58, 16491 (1998).

N. B. Sheller, S. Petrash, and M. D. Foster, Langmuir 14, 4535 (1998).

Z. Miqin, T. Desai, and M. Ferrari, Biomaterials 19, 953 (1998).

S. Hirano, A. Yoshigoe, M. Nagasono, K. Mase, J. Ohara, Y. Nonogaki, Y. Takeda, and T. Urisu, J. Synchrotron Radiat. 5, 1363 (1998).

1995

H. Akazawa, Phys. Rev. B 52, 12386 (1995).

1993

C. S. Britland and P. Connolly, J. Cell Sci. 105, 203 (1993).

1992

J. B. Brzoska, N. Shadhidzadch, and F. Rondclcz, Nature 360, 719 (1992).

1989

S. R. Wasserman, Y. T. Tao, and G. M. Whitesides, Langmuir 5, 1074 (1989).

1988

D. Kleinfeld, K. Kahler, and P. Hockberger, J. Neurosci. 8, 4098 (1988).

1987

T. Urisu and H. Kyuragi, J. Vac. Sci. Technol. B 5, 1436 (1987).

Appl. Phys. Lett.

J. Collet and D. Vuillaume, Appl. Phys. Lett. 73, 2681 (1998).

Biomaterials

Z. Miqin, T. Desai, and M. Ferrari, Biomaterials 19, 953 (1998).

J. Cell Sci.

C. S. Britland and P. Connolly, J. Cell Sci. 105, 203 (1993).

J. Neurosci.

D. Kleinfeld, K. Kahler, and P. Hockberger, J. Neurosci. 8, 4098 (1988).

J. Synchrotron Radiat.

S. Hirano, A. Yoshigoe, M. Nagasono, K. Mase, J. Ohara, Y. Nonogaki, Y. Takeda, and T. Urisu, J. Synchrotron Radiat. 5, 1363 (1998).

J. Vac. Sci. Technol. B

T. Urisu and H. Kyuragi, J. Vac. Sci. Technol. B 5, 1436 (1987).

Langmuir

S. R. Wasserman, Y. T. Tao, and G. M. Whitesides, Langmuir 5, 1074 (1989).

N. B. Sheller, S. Petrash, and M. D. Foster, Langmuir 14, 4535 (1998).

Nature

J. B. Brzoska, N. Shadhidzadch, and F. Rondclcz, Nature 360, 719 (1992).

Phys. Rev. B

D. Vuillaume, C. Boulas, J. Collet, and C. Delerue, Phys. Rev. B 58, 16491 (1998).

H. Akazawa, Phys. Rev. B 52, 12386 (1995).

Thin Solid Films

K. Iimura, Y. Nakajima, and T. Kato, Thin Solid Films 379, 230 (2000).

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