Abstract

By using n-butylamine as carbon resource, diamond-like carbon film (DLCF) was deposited on the p-n porous silicon (PS) surface by means of a radio-frequency glow discharge plasma system. Electroluminescent (EL) spectra show that EL intensity of the passivated PS diodes increases by 4.5 times and 30-nm blue-shift of EL peak occurs compared with the diodes without treatment and both of them are stable while the passivated diodes are exposed to the air indoor. The current-voltage (I-V) characteristics exhibit that the passivated diodes have a smaller series resistance and a lower onset voltage. The EL intensity-voltage (I_(EL)-V) relations of the PS devices with different DLCF thicknesses show that only medium DLCF thickness is optimum. These experimental phenomena have been explained based on Raman spectra and IR spectra of the diamond-like carbon films and IR spectra of the passivated PS samples.

© 2005 Chinese Optics Letters

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  5. H. Koshida and H. Koyama, Appl. Phys. Lett. 60, 347 (1992).
  6. P. Steiner, F. Kozlowski, and W. Lang, Appl. Phys. Lett. 62, 2700 (1993).
  7. Z. Chen, G. Bosman, and R. Ochoa, Appl. Phys. Lett. 62, 708 (1993).
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2003 (2)

H. J. Li, B. Y. Huang, D. Q. Yi, H. Y. Cui, and J. C. Peng, Chin. Opt. Lett. 1, 677 (2003).

Q. W. Chen, D. L. Zhu, C. Zhu, J. Wang, and Y. G. Zhan, Appl. Phys. Lett. 82, 1018 (2003).

2002 (1)

H.-S. Kim, E. C. Zouzounis, and Y. H. Xie, Appl. Phys. Lett. 80, 2287 (2002).

2001 (1)

Y. C. Liu, N. H. Wang, and Y. X. Liu, Chin. Phys. Lett. 18, 117 (2001).

2000 (1)

H. J. Li, J. C. Peng, Y. H. Yan, and J. N. Xiang, Acta Physico-Chemica Sin. 16, 447 (2000).

1994 (1)

T. Kancmitsu, T. Futagi, and T. Matsumoto, Phys. Rev. B 49, 14732 (1994).

1993 (2)

P. Steiner, F. Kozlowski, and W. Lang, Appl. Phys. Lett. 62, 2700 (1993).

Z. Chen, G. Bosman, and R. Ochoa, Appl. Phys. Lett. 62, 708 (1993).

1992 (4)

F. Namavar, H. P. Maruska, and N. M. Kalkhoran, Appl. Phys. Lett. 60, 2514 (1992).

V. Petrova-Koch, T. Muschik, A. Kux, B. K. Meyer, and F. Koch, Appl. Phys. Lett. 61, 943 (1992).

T. Canham, W. Y. Leong, M. I. J. Beale, T. I. Cox, and L. Taylor, Appl. Phys. Lett. 61, 2563 (1992).

H. Koshida and H. Koyama, Appl. Phys. Lett. 60, 347 (1992).

1991 (1)

A. Halimaoui, C. Oules, and B. Bomchil, Appl. Phys. Lett. 59, 304 (1991).

1990 (1)

L. T. Canham, Appl. Phys. Lett. 57, 1046 (1990).

1955 (1)

R. Newman, W. C. Dash, R. N. Hall, and W. E. Burch, Phys. Rev. A 100, 700 (1955).

Beale, M. I. J.

T. Canham, W. Y. Leong, M. I. J. Beale, T. I. Cox, and L. Taylor, Appl. Phys. Lett. 61, 2563 (1992).

Bomchil, B.

A. Halimaoui, C. Oules, and B. Bomchil, Appl. Phys. Lett. 59, 304 (1991).

Bosman, G.

Z. Chen, G. Bosman, and R. Ochoa, Appl. Phys. Lett. 62, 708 (1993).

Burch, W. E.

R. Newman, W. C. Dash, R. N. Hall, and W. E. Burch, Phys. Rev. A 100, 700 (1955).

Canham, L. T.

L. T. Canham, Appl. Phys. Lett. 57, 1046 (1990).

Canham, T.

T. Canham, W. Y. Leong, M. I. J. Beale, T. I. Cox, and L. Taylor, Appl. Phys. Lett. 61, 2563 (1992).

Chen, Q. W.

Q. W. Chen, D. L. Zhu, C. Zhu, J. Wang, and Y. G. Zhan, Appl. Phys. Lett. 82, 1018 (2003).

Chen, Z.

Z. Chen, G. Bosman, and R. Ochoa, Appl. Phys. Lett. 62, 708 (1993).

Cox, T. I.

T. Canham, W. Y. Leong, M. I. J. Beale, T. I. Cox, and L. Taylor, Appl. Phys. Lett. 61, 2563 (1992).

Cui, H. Y.

Dash, W. C.

R. Newman, W. C. Dash, R. N. Hall, and W. E. Burch, Phys. Rev. A 100, 700 (1955).

Futagi, T.

T. Kancmitsu, T. Futagi, and T. Matsumoto, Phys. Rev. B 49, 14732 (1994).

Halimaoui, A.

A. Halimaoui, C. Oules, and B. Bomchil, Appl. Phys. Lett. 59, 304 (1991).

Hall, R. N.

R. Newman, W. C. Dash, R. N. Hall, and W. E. Burch, Phys. Rev. A 100, 700 (1955).

Huang, B. Y.

Kalkhoran, N. M.

F. Namavar, H. P. Maruska, and N. M. Kalkhoran, Appl. Phys. Lett. 60, 2514 (1992).

Kancmitsu, T.

T. Kancmitsu, T. Futagi, and T. Matsumoto, Phys. Rev. B 49, 14732 (1994).

Kim, H.-S.

H.-S. Kim, E. C. Zouzounis, and Y. H. Xie, Appl. Phys. Lett. 80, 2287 (2002).

Koch, F.

V. Petrova-Koch, T. Muschik, A. Kux, B. K. Meyer, and F. Koch, Appl. Phys. Lett. 61, 943 (1992).

Koshida, H.

H. Koshida and H. Koyama, Appl. Phys. Lett. 60, 347 (1992).

Koyama, H.

H. Koshida and H. Koyama, Appl. Phys. Lett. 60, 347 (1992).

Kozlowski, F.

P. Steiner, F. Kozlowski, and W. Lang, Appl. Phys. Lett. 62, 2700 (1993).

Kux, A.

V. Petrova-Koch, T. Muschik, A. Kux, B. K. Meyer, and F. Koch, Appl. Phys. Lett. 61, 943 (1992).

Lang, W.

P. Steiner, F. Kozlowski, and W. Lang, Appl. Phys. Lett. 62, 2700 (1993).

Leong, W. Y.

T. Canham, W. Y. Leong, M. I. J. Beale, T. I. Cox, and L. Taylor, Appl. Phys. Lett. 61, 2563 (1992).

Li, H. J.

H. J. Li, B. Y. Huang, D. Q. Yi, H. Y. Cui, and J. C. Peng, Chin. Opt. Lett. 1, 677 (2003).

H. J. Li, J. C. Peng, Y. H. Yan, and J. N. Xiang, Acta Physico-Chemica Sin. 16, 447 (2000).

Liu, Y. C.

Y. C. Liu, N. H. Wang, and Y. X. Liu, Chin. Phys. Lett. 18, 117 (2001).

Liu, Y. X.

Y. C. Liu, N. H. Wang, and Y. X. Liu, Chin. Phys. Lett. 18, 117 (2001).

Maruska, H. P.

F. Namavar, H. P. Maruska, and N. M. Kalkhoran, Appl. Phys. Lett. 60, 2514 (1992).

Matsumoto, T.

T. Kancmitsu, T. Futagi, and T. Matsumoto, Phys. Rev. B 49, 14732 (1994).

Meyer, B. K.

V. Petrova-Koch, T. Muschik, A. Kux, B. K. Meyer, and F. Koch, Appl. Phys. Lett. 61, 943 (1992).

Muschik, T.

V. Petrova-Koch, T. Muschik, A. Kux, B. K. Meyer, and F. Koch, Appl. Phys. Lett. 61, 943 (1992).

Namavar, F.

F. Namavar, H. P. Maruska, and N. M. Kalkhoran, Appl. Phys. Lett. 60, 2514 (1992).

Newman, R.

R. Newman, W. C. Dash, R. N. Hall, and W. E. Burch, Phys. Rev. A 100, 700 (1955).

Ochoa, R.

Z. Chen, G. Bosman, and R. Ochoa, Appl. Phys. Lett. 62, 708 (1993).

Oules, C.

A. Halimaoui, C. Oules, and B. Bomchil, Appl. Phys. Lett. 59, 304 (1991).

Peng, J. C.

H. J. Li, B. Y. Huang, D. Q. Yi, H. Y. Cui, and J. C. Peng, Chin. Opt. Lett. 1, 677 (2003).

H. J. Li, J. C. Peng, Y. H. Yan, and J. N. Xiang, Acta Physico-Chemica Sin. 16, 447 (2000).

Petrova-Koch, V.

V. Petrova-Koch, T. Muschik, A. Kux, B. K. Meyer, and F. Koch, Appl. Phys. Lett. 61, 943 (1992).

Steiner, P.

P. Steiner, F. Kozlowski, and W. Lang, Appl. Phys. Lett. 62, 2700 (1993).

Taylor, L.

T. Canham, W. Y. Leong, M. I. J. Beale, T. I. Cox, and L. Taylor, Appl. Phys. Lett. 61, 2563 (1992).

Wang, J.

Q. W. Chen, D. L. Zhu, C. Zhu, J. Wang, and Y. G. Zhan, Appl. Phys. Lett. 82, 1018 (2003).

Wang, N. H.

Y. C. Liu, N. H. Wang, and Y. X. Liu, Chin. Phys. Lett. 18, 117 (2001).

Xiang, J. N.

H. J. Li, J. C. Peng, Y. H. Yan, and J. N. Xiang, Acta Physico-Chemica Sin. 16, 447 (2000).

Xie, Y. H.

H.-S. Kim, E. C. Zouzounis, and Y. H. Xie, Appl. Phys. Lett. 80, 2287 (2002).

Yan, Y. H.

H. J. Li, J. C. Peng, Y. H. Yan, and J. N. Xiang, Acta Physico-Chemica Sin. 16, 447 (2000).

Yi, D. Q.

Zhan, Y. G.

Q. W. Chen, D. L. Zhu, C. Zhu, J. Wang, and Y. G. Zhan, Appl. Phys. Lett. 82, 1018 (2003).

Zhu, C.

Q. W. Chen, D. L. Zhu, C. Zhu, J. Wang, and Y. G. Zhan, Appl. Phys. Lett. 82, 1018 (2003).

Zhu, D. L.

Q. W. Chen, D. L. Zhu, C. Zhu, J. Wang, and Y. G. Zhan, Appl. Phys. Lett. 82, 1018 (2003).

Zouzounis, E. C.

H.-S. Kim, E. C. Zouzounis, and Y. H. Xie, Appl. Phys. Lett. 80, 2287 (2002).

Acta Physico-Chemica Sin. (1)

H. J. Li, J. C. Peng, Y. H. Yan, and J. N. Xiang, Acta Physico-Chemica Sin. 16, 447 (2000).

Appl. Phys. Lett. (10)

H.-S. Kim, E. C. Zouzounis, and Y. H. Xie, Appl. Phys. Lett. 80, 2287 (2002).

Q. W. Chen, D. L. Zhu, C. Zhu, J. Wang, and Y. G. Zhan, Appl. Phys. Lett. 82, 1018 (2003).

V. Petrova-Koch, T. Muschik, A. Kux, B. K. Meyer, and F. Koch, Appl. Phys. Lett. 61, 943 (1992).

L. T. Canham, Appl. Phys. Lett. 57, 1046 (1990).

A. Halimaoui, C. Oules, and B. Bomchil, Appl. Phys. Lett. 59, 304 (1991).

T. Canham, W. Y. Leong, M. I. J. Beale, T. I. Cox, and L. Taylor, Appl. Phys. Lett. 61, 2563 (1992).

H. Koshida and H. Koyama, Appl. Phys. Lett. 60, 347 (1992).

P. Steiner, F. Kozlowski, and W. Lang, Appl. Phys. Lett. 62, 2700 (1993).

Z. Chen, G. Bosman, and R. Ochoa, Appl. Phys. Lett. 62, 708 (1993).

F. Namavar, H. P. Maruska, and N. M. Kalkhoran, Appl. Phys. Lett. 60, 2514 (1992).

Chin. Opt. Lett. (1)

Chin. Phys. Lett. (1)

Y. C. Liu, N. H. Wang, and Y. X. Liu, Chin. Phys. Lett. 18, 117 (2001).

Phys. Rev. A (1)

R. Newman, W. C. Dash, R. N. Hall, and W. E. Burch, Phys. Rev. A 100, 700 (1955).

Phys. Rev. B (1)

T. Kancmitsu, T. Futagi, and T. Matsumoto, Phys. Rev. B 49, 14732 (1994).

Other (2)

E. R. Kupp, W. R. Drawl, and K. E. Spear, Surface and Coating Technol. 68/69, 378 (1994).

T. Futagi, T. Matsumoto, and M. Katsuno, Jpn. J. Appl. Phys. 31, L616 (1992).

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