Abstract

Polarization aberration caused by material birefringence can be partially compensated by lens clocking. In this Letter, we propose a fast and efficient clocking optimization method. First, the material birefringence distribution is fitted by the orientation Zernike polynomials. On this basis, the birefringence sensitivity matrix of each lens element can be calculated. Then we derive the rotation matrix of the orientation Zernike polynomials and establish a mathematical model for clocking optimization. Finally, an optimization example is given to illustrate the efficiency of the new method. The result shows that the maximum RMS of retardation is reduced by 64% using only 48.99 s.

© 2020 Chinese Laser Press

Jones pupil metrology of lithographic projection lens and its optimal configuration in the presence of error sources

Zejiang Meng, Sikun Li, Xiangzhao Wang, Yang Bu, Jian Wang, Sheng Ni, Chaoxing Yang, and Yanjie Mao
Opt. Express 27(4) 4629-4647 (2019)

Aberrations introduced by a lens made from a birefringent material

J. Paul Lesso, Alan J. Duncan, Wilson Sibbett, and Miles J. Padgett
Appl. Opt. 39(4) 592-598 (2000)

Wavefront aberration compensation of projection lens using clocking lens elements

ChunLai Liu, Wei Huang, Zhenguang Shi, and Weicai Xu
Appl. Opt. 52(22) 5398-5401 (2013)

Lens design with reduced sensitivity to thermally induced stress birefringence

Andrew F. Kurtz and Joseph R. Bietry
Appl. Opt. 52(18) 4311-4322 (2013)

Orthogonal polynomials describing polarization aberration for rotationally symmetric optical systems

Xiangru Xu, Wei Huang, and Mingfei Xu
Opt. Express 23(21) 27911-27919 (2015)