Abstract
The effect of thermal annealing on the optical properties, microstructure, and laser-induced damage threshold (LIDT) of HfO2/Ta2O5/SiO2 HR films has been investigated. The transmission spectra shift to a short wavelength and the X-ray diffraction peaks of monoclinic structure HfO2 are enhanced after thermal annealing. The calculated results of the m(−111) diffraction peak show that the HfO2 grain size is increased, which is conducive to increasing the thermal conductivity. Thermal annealing also reduces the laser absorption of high-reflection films. The improvement of thermal conductivity and the decrease of laser absorption both contribute to the improvement of LIDT. The experimental results show that the highest LIDT of 22.4 J/cm2 is obtained at 300°C annealing temperature. With the further increase of annealing temperature, the damage changes from thermal stress damage to thermal explosion damage, resulting in the decrease of LIDT.
© 2019 Chinese Laser Press
PDF Article
More Like This
Investigation on nano-absorbing precursors in the picosecond regime via the comparative study of HfO2/SiO2 and Ta2O5/SiO2 high-reflectivity coating damage
He Gong, Xiaofeng Liu, Chunxian Tao, Yuan’an Zhao, Kun Shuai, Dawei Li, Weili Zhang, Jian Sun, Li Zhou, You’en Jiang, Yun Cui, Dawei Zhang, Yaping Dai, and Jianda Shao
Opt. Mater. Express 13(6) 1820-1835 (2023)
Cited By
You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.
Contact your librarian or system administrator
or
Login to access Optica Member Subscription