Abstract

A simple method to fabricate vertically coupled micro-ring resonators in amorphous silicon-on-insulator is created by a three-step lithography process. First, the linear loss at 1.55 μm of the a-Si:H film is calculated to be 0.2±0.05 dB/cm. Then, the bottom line waveguide of Su-8 with a flat top surface of 300 nm is created by etching. The thickness of Su-8 can easily be controlled by the etching time. Finally, by opening the window pattern and etching several layers, the first layer marks made by electron beam lithography are found with a 50 nm resolution, and the high quality of the micro-ring resonator is demonstrated.

© 2015 Chinese Laser Press

Vertically coupled microring resonators using one epitaxial growth step and single-side lithography

Óscar García López, Dries Van Thourhout, Daniel Lasaosa, Manuel López-Amo, Roel Baets, and Marko Galarza
Opt. Express 23(4) 5317-5326 (2015)

Enhanced photoluminescence from ring resonators in hydrogenated amorphous silicon thin films at telecommunications wavelengths

Ryan J. Patton, Michael G. Wood, and Ronald M. Reano
Opt. Lett. 42(21) 4239-4242 (2017)

Experimental demonstration of ultracompact air hole photonic crystal ring resonator fabricated on silicon-on-insulator wafer

Xiaoyuan Ren, Lishuang Feng, Zhili Lin, and Junbo Feng
Opt. Lett. 38(9) 1416-1418 (2013)

Trimming of silicon-on-insulator ring-resonators via localized laser annealing

Vera Biryukova, Graham J. Sharp, Charalambos Klitis, and Marc Sorel
Opt. Express 28(8) 11156-11164 (2020)

Improved coupling technique of ultracompact ring resonators in silicon-on-insulator technology

Guofang Fan, Regis Orbtchouk, Bing Han, Xinhou Liu, and Zhen Zhen
Appl. Opt. 51(21) 5212-5215 (2012)