Abstract

Analysis of glass homogeneity using the attaching interferometric data model neglects body distribution. To improve analysis accuracy, we establish the three-dimensional gradient index (GRIN) model of glass index by analyzing fused silica homogeneity distribution in two perpendicular measurement directions. Using the GRIN model, a lithography projection lens with a numerical aperture of 0.75 is analyzed. Root mean square wavefront aberration deteriorates from 0.9 to 9.65 nm and then improves to 5.9 nm after clocking.

© 2013 Chinese Optics Letters

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  1. Z. Liao, T. Xing, and H. Zhu, Proc. SPIE 7656, 866846 (2010).
  2. L. Deck, Appl. Opt. 42, 2354 (2003).
  3. Zygo, MST PSurf and MST PHom MetroPro Applications (2003).
  4. H. Liu, Chin. Opt. Lett. 10, 071201 (2012).
  5. H. Shen, R. Zhu, Z. Gao, E. Pun, W. Wong , and X. Zhu, Chin. Opt. Lett. 11, 032201 (2013).
  6. A. Sharma, Appl. Opt. 24, 4367 (1985).
  7. M. Born and E. Wolf, Principle of Optics, 7th ed. (Cambridge University Press, 1999).
  8. Synopsys, Inc. CODE V Electronic Document Library, version 10.5 (2012).
  9. Y. Omura, "Projection exposure methods and apparatus, and projection optical systems", U.S. patent 6,864,961B2 (2005).
  10. T. Matsuyama, I. Tanaka, T. Ozawa, K. Nomura, and T. Koyama, Proc. SPIE 5040, 801 (2003).

2013 (1)

2012 (1)

2010 (1)

Z. Liao, T. Xing, and H. Zhu, Proc. SPIE 7656, 866846 (2010).

2005 (1)

Y. Omura, "Projection exposure methods and apparatus, and projection optical systems", U.S. patent 6,864,961B2 (2005).

2003 (2)

T. Matsuyama, I. Tanaka, T. Ozawa, K. Nomura, and T. Koyama, Proc. SPIE 5040, 801 (2003).

L. Deck, Appl. Opt. 42, 2354 (2003).

1985 (1)

Deck, L.

Gao, Z.

Koyama, T.

T. Matsuyama, I. Tanaka, T. Ozawa, K. Nomura, and T. Koyama, Proc. SPIE 5040, 801 (2003).

Liao, Z.

Z. Liao, T. Xing, and H. Zhu, Proc. SPIE 7656, 866846 (2010).

Liu, H.

Matsuyama, T.

T. Matsuyama, I. Tanaka, T. Ozawa, K. Nomura, and T. Koyama, Proc. SPIE 5040, 801 (2003).

Nomura, K.

T. Matsuyama, I. Tanaka, T. Ozawa, K. Nomura, and T. Koyama, Proc. SPIE 5040, 801 (2003).

Omura, Y.

Y. Omura, "Projection exposure methods and apparatus, and projection optical systems", U.S. patent 6,864,961B2 (2005).

Ozawa, T.

T. Matsuyama, I. Tanaka, T. Ozawa, K. Nomura, and T. Koyama, Proc. SPIE 5040, 801 (2003).

Pun, E.

Sharma, A.

Shen, H.

Tanaka, I.

T. Matsuyama, I. Tanaka, T. Ozawa, K. Nomura, and T. Koyama, Proc. SPIE 5040, 801 (2003).

Wong, W.

Xing, T.

Z. Liao, T. Xing, and H. Zhu, Proc. SPIE 7656, 866846 (2010).

Zhu, H.

Z. Liao, T. Xing, and H. Zhu, Proc. SPIE 7656, 866846 (2010).

Zhu, R.

Zhu, X.

Appl. Opt. (2)

Chin. Opt. Lett. (2)

Proc. SPIE (2)

Z. Liao, T. Xing, and H. Zhu, Proc. SPIE 7656, 866846 (2010).

T. Matsuyama, I. Tanaka, T. Ozawa, K. Nomura, and T. Koyama, Proc. SPIE 5040, 801 (2003).

Other (4)

Zygo, MST PSurf and MST PHom MetroPro Applications (2003).

M. Born and E. Wolf, Principle of Optics, 7th ed. (Cambridge University Press, 1999).

Synopsys, Inc. CODE V Electronic Document Library, version 10.5 (2012).

Y. Omura, "Projection exposure methods and apparatus, and projection optical systems", U.S. patent 6,864,961B2 (2005).

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