Abstract

We investigate the on-line writing identical fiber Bragg grating (FBG) arrays using the phase mask technique. Given the limitation of laser power, the energy density uniformity and the horizontal width of the writing spot cannot be further optimized. The results show that the FBG arrays obtained in the optimal process (drawing speed of 12 ± 0.15 m/min and average tension of 38.2 g) have a central wavelength bandwidth of less than 0.1 nm and an average reflectivity of 0.26%. Thus, the phase mask method is a promising alternative for on-line writing identical FBG arrays.

© 2013 Chinese Optics Letters

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M. Zhang, Q. Sun, Z. Wang, X. Li, H. Liu, and D. Liu, Opt. Commun. 285, 3082 (2012).

X. Li, Q. Sun, D. Liu, R. Liang, J. Zhang, J. Wo, P. P. Shum, and D. Liu, Opt. Express 20, 12076 (2012).

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Y. Wang, J. Gong, D. Y. Wang, B. Dong, W. Bi, and A. Wang, IEEE Photon. Technol. Lett. 23, 70 (2011).

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Y. Dai, Y. Liu, J. Leng, G. Deng, and A. Asundi, Opt. Laser Eng. 47, 1028 (2009).

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V. Hagemann, M. N. Trutzel, L. Staudigel, M. Rothhardt, H.-R. Mueller, and O. Krumpholz, Electron. Lett. 34, 211 (1998).

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C. G. Askins, M. A. Putnam, H. J. Patrick, and E. J. Friebele, Electron. Lett. 33, 1333 (1997).

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1993 (2)

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Ara'uo, F. M.

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Y. Dai, Y. Liu, J. Leng, G. Deng, and A. Asundi, Opt. Laser Eng. 47, 1028 (2009).

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Y. Dai, Y. Liu, J. Leng, G. Deng, and A. Asundi, Opt. Laser Eng. 47, 1028 (2009).

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Y. Dai, Y. Liu, J. Leng, G. Deng, and A. Asundi, Opt. Laser Eng. 47, 1028 (2009).

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Y. Wang, J. Gong, D. Y. Wang, B. Dong, W. Bi, and A. Wang, IEEE Photon. Technol. Lett. 23, 70 (2011).

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L. Dong, J.-L. Archambault, L. Reekie, P. St. J. Russell, and D. N. Payne, Electron. Lett. 29, 1557 (1993).

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V. Hagemann, M. N. Trutzel, L. Staudigel, M. Rothhardt, H.-R. Mueller, and O. Krumpholz, Electron. Lett. 34, 211 (1998).

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D. L. Williams, B. J. Ainslie. J. R. Armitage, R. Kashyap, and R. Campbell, Electron. Lett. 29, 45(1993).

Krumpholz, O.

V. Hagemann, M. N. Trutzel, L. Staudigel, M. Rothhardt, H.-R. Mueller, and O. Krumpholz, Electron. Lett. 34, 211 (1998).

Latka, I.

Leng, J.

Y. Dai, Y. Liu, J. Leng, G. Deng, and A. Asundi, Opt. Laser Eng. 47, 1028 (2009).

Li, X.

M. Zhang, Q. Sun, Z. Wang, X. Li, H. Liu, and D. Liu, Opt. Commun. 285, 3082 (2012).

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Liang, R.

Liu, D.

Liu, H.

M. Zhang, Q. Sun, Z. Wang, X. Li, H. Liu, and D. Liu, Opt. Commun. 285, 3082 (2012).

Liu, Y.

Y. Dai, Y. Liu, J. Leng, G. Deng, and A. Asundi, Opt. Laser Eng. 47, 1028 (2009).

L'oez-Amo, M.

Mueller, H.-R.

V. Hagemann, M. N. Trutzel, L. Staudigel, M. Rothhardt, H.-R. Mueller, and O. Krumpholz, Electron. Lett. 34, 211 (1998).

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C. G. Askins, M. A. Putnam, H. J. Patrick, and E. J. Friebele, Electron. Lett. 33, 1333 (1997).

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L. Dong, J.-L. Archambault, L. Reekie, P. St. J. Russell, and D. N. Payne, Electron. Lett. 29, 1557 (1993).

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L. Dong, J.-L. Archambault, L. Reekie, P. St. J. Russell, and D. N. Payne, Electron. Lett. 29, 1557 (1993).

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H. Bartelt, K. Schuster, S. Unger, C. Chojetzki, M. Rothhardt, and I. Latka, Appl. Opt. 46, 3417 (2007).

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L. Dong, J.-L. Archambault, L. Reekie, P. St. J. Russell, and D. N. Payne, Electron. Lett. 29, 1557 (1993).

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Shum, P. P.

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V. Hagemann, M. N. Trutzel, L. Staudigel, M. Rothhardt, H.-R. Mueller, and O. Krumpholz, Electron. Lett. 34, 211 (1998).

Sun, Q.

M. Zhang, Q. Sun, Z. Wang, X. Li, H. Liu, and D. Liu, Opt. Commun. 285, 3082 (2012).

X. Li, Q. Sun, D. Liu, R. Liang, J. Zhang, J. Wo, P. P. Shum, and D. Liu, Opt. Express 20, 12076 (2012).

Taylor, H. F.

Trutzel, M. N.

V. Hagemann, M. N. Trutzel, L. Staudigel, M. Rothhardt, H.-R. Mueller, and O. Krumpholz, Electron. Lett. 34, 211 (1998).

Unger, S.

Wan, X.

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Y. Wang, J. Gong, D. Y. Wang, B. Dong, W. Bi, and A. Wang, IEEE Photon. Technol. Lett. 23, 70 (2011).

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Y. Wang, J. Gong, D. Y. Wang, B. Dong, W. Bi, and A. Wang, IEEE Photon. Technol. Lett. 23, 70 (2011).

Wang, Y.

Y. Wang, J. Gong, D. Y. Wang, B. Dong, W. Bi, and A. Wang, IEEE Photon. Technol. Lett. 23, 70 (2011).

Wang, Z.

M. Zhang, Q. Sun, Z. Wang, X. Li, H. Liu, and D. Liu, Opt. Commun. 285, 3082 (2012).

Williams, D. L.

D. L. Williams, B. J. Ainslie. J. R. Armitage, R. Kashyap, and R. Campbell, Electron. Lett. 29, 45(1993).

Williams, G. M.

Wo, J.

Zhang, J.

Zhang, M.

M. Zhang, Q. Sun, Z. Wang, X. Li, H. Liu, and D. Liu, Opt. Commun. 285, 3082 (2012).

Appl. Opt. (1)

Electron. Lett. (4)

C. G. Askins, M. A. Putnam, H. J. Patrick, and E. J. Friebele, Electron. Lett. 33, 1333 (1997).

V. Hagemann, M. N. Trutzel, L. Staudigel, M. Rothhardt, H.-R. Mueller, and O. Krumpholz, Electron. Lett. 34, 211 (1998).

L. Dong, J.-L. Archambault, L. Reekie, P. St. J. Russell, and D. N. Payne, Electron. Lett. 29, 1557 (1993).

D. L. Williams, B. J. Ainslie. J. R. Armitage, R. Kashyap, and R. Campbell, Electron. Lett. 29, 45(1993).

IEEE Photon. Technol. Lett. (1)

Y. Wang, J. Gong, D. Y. Wang, B. Dong, W. Bi, and A. Wang, IEEE Photon. Technol. Lett. 23, 70 (2011).

J. Lightwave Technol. (1)

Opt. Commun. (1)

M. Zhang, Q. Sun, Z. Wang, X. Li, H. Liu, and D. Liu, Opt. Commun. 285, 3082 (2012).

Opt. Express (1)

Opt. Laser Eng. (1)

Y. Dai, Y. Liu, J. Leng, G. Deng, and A. Asundi, Opt. Laser Eng. 47, 1028 (2009).

Opt. Lett. (2)

Other (1)

http://www.fbgs-technologies.com/pagina.php?id=21366.

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