Abstract
To develop high quality dispersion optics in the X-ray region, the sliced
multilayer transmission grating is examined. Dynamical diffraction theory is used to
calculate the diffraction property of this volume grating. A WSi<sub>2</sub>/Si multilayer with
a d-spacing of 14.3 nm and bi-layer number of 300 is deposited on a superpolished
silicon substrate by direct current magnetron sputtering technology. To make the
transmission grating, the multilayer is sliced and thinned in the cross-section
direction to a depth of 23-25 μm. The diffraction efficiency of the grating
is measured at E = 8.05 keV, and the 1st-order efficiency is 19%. The sliced
multilayer grating with large aspect ratio and nanometer period can be used for high
efficiency and high dispersion optics in the X-ray region.
© 2012 Chinese Optics Letters
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