Abstract

The relation between the phase shift and the mean optical power (MOP) output from a delay-line interferometer (DLI) port applied for phase-shift keying (PSK) signal demodulation is proven of a cosine law irrelevant to signal modulation condition. The variation amplitude of the MOP is proportional to the transition duration of the modulation pulses. This phenomenon is interpreted as the result of the statistical and waveform characteristics of the PSK. The conclusions verified by simulation and experiment are generalized to other modulation formats and then applied to phase detuning monitoring, delay time judgment of DLI, and independence of modulation data assessment.

© 2012 Chinese Optics Letters

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J. Zhao, A. P. T. Lau, C. Lu, H. Y. Tam, and P. K. A. Wai, IEEE Photon. Technol. Lett. 22, 1018 (2010).

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H. Wen, Y. Ge, H. Jiang, L. Han, X. Chen, X. Zheng, H. Zhang, and Y. Guo, Proc. SPIE 7136, 713636 (2008).

H. Kawakami, E. Yoshida, Y. Miyamoto, M. Oguma, and T. Itoh, Electron. Lett. 44, 437 (2008).

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H. C. Ji, P. K. J. Park, H. Kim, J. H. Lee, and Y. C. Chung, IEEE Photon. Technol. Lett. 18, 950 (2006).

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K.-P. Ho, IEEE Photon. Technol. Lett. 16, 308 (2004).

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H. Wen, Y. Ge, H. Jiang, L. Han, X. Chen, X. Zheng, H. Zhang, and Y. Guo, Proc. SPIE 7136, 713636 (2008).

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H. C. Ji, P. K. J. Park, H. Kim, J. H. Lee, and Y. C. Chung, IEEE Photon. Technol. Lett. 18, 950 (2006).

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Ge, Y.

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Guo, Y.

H. Wen, Y. Ge, H. Jiang, L. Han, X. Chen, X. Zheng, H. Zhang, and Y. Guo, Proc. SPIE 7136, 713636 (2008).

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H. Wen, Y. Ge, H. Jiang, L. Han, X. Chen, X. Zheng, H. Zhang, and Y. Guo, Proc. SPIE 7136, 713636 (2008).

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Itoh, T.

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Jiang, H.

H. Wen, Y. Ge, H. Jiang, L. Han, X. Chen, X. Zheng, H. Zhang, and Y. Guo, Proc. SPIE 7136, 713636 (2008).

Kawakami, H.

H. Kawakami, E. Yoshida, Y. Miyamoto, M. Oguma, and T. Itoh, Electron. Lett. 44, 437 (2008).

Kim, H.

H. C. Ji, P. K. J. Park, H. Kim, J. H. Lee, and Y. C. Chung, IEEE Photon. Technol. Lett. 18, 950 (2006).

H. Kim and P. J. Winzer, J. Lightwave Technol. 21, 1887 (2003).

Koonen, A. M. J.

Lau, A. P. T.

J. Zhao, A. P. T. Lau, C. Lu, H. Y. Tam, and P. K. A. Wai, IEEE Photon. Technol. Lett. 22, 1018 (2010).

Lee, J. H.

H. C. Ji, P. K. J. Park, H. Kim, J. H. Lee, and Y. C. Chung, IEEE Photon. Technol. Lett. 18, 950 (2006).

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Li, J.

Liao, J.

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J. Zhao, A. P. T. Lau, C. Lu, H. Y. Tam, and P. K. A. Wai, IEEE Photon. Technol. Lett. 22, 1018 (2010).

Maestle, R.

Miyamoto, Y.

H. Kawakami, E. Yoshida, Y. Miyamoto, M. Oguma, and T. Itoh, Electron. Lett. 44, 437 (2008).

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Oguma, M.

H. Kawakami, E. Yoshida, Y. Miyamoto, M. Oguma, and T. Itoh, Electron. Lett. 44, 437 (2008).

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H. C. Ji, P. K. J. Park, H. Kim, J. H. Lee, and Y. C. Chung, IEEE Photon. Technol. Lett. 18, 950 (2006).

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J. Zhao, A. P. T. Lau, C. Lu, H. Y. Tam, and P. K. A. Wai, IEEE Photon. Technol. Lett. 22, 1018 (2010).

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Wai, P. K. A.

J. Zhao, A. P. T. Lau, C. Lu, H. Y. Tam, and P. K. A. Wai, IEEE Photon. Technol. Lett. 22, 1018 (2010).

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H. Wen, J. Liao, X. Zheng, and H. Zhang, Chin. Opt. Lett. 9, 100607 (2011).

H. Wen, Y. Ge, H. Jiang, L. Han, X. Chen, X. Zheng, H. Zhang, and Y. Guo, Proc. SPIE 7136, 713636 (2008).

Winzer, P. J.

Worms, K.

Yoshida, E.

H. Kawakami, E. Yoshida, Y. Miyamoto, M. Oguma, and T. Itoh, Electron. Lett. 44, 437 (2008).

Zhang, H.

H. Wen, J. Liao, X. Zheng, and H. Zhang, Chin. Opt. Lett. 9, 100607 (2011).

H. Wen, Y. Ge, H. Jiang, L. Han, X. Chen, X. Zheng, H. Zhang, and Y. Guo, Proc. SPIE 7136, 713636 (2008).

Zhao, J.

J. Zhao, A. P. T. Lau, C. Lu, H. Y. Tam, and P. K. A. Wai, IEEE Photon. Technol. Lett. 22, 1018 (2010).

Zheng, X.

H. Wen, J. Liao, X. Zheng, and H. Zhang, Chin. Opt. Lett. 9, 100607 (2011).

H. Wen, Y. Ge, H. Jiang, L. Han, X. Chen, X. Zheng, H. Zhang, and Y. Guo, Proc. SPIE 7136, 713636 (2008).

Chin. Opt. Lett. (1)

Electron. Lett. (1)

H. Kawakami, E. Yoshida, Y. Miyamoto, M. Oguma, and T. Itoh, Electron. Lett. 44, 437 (2008).

IEEE Photon. Technol. Lett. (3)

H. C. Ji, P. K. J. Park, H. Kim, J. H. Lee, and Y. C. Chung, IEEE Photon. Technol. Lett. 18, 950 (2006).

J. Zhao, A. P. T. Lau, C. Lu, H. Y. Tam, and P. K. A. Wai, IEEE Photon. Technol. Lett. 22, 1018 (2010).

K.-P. Ho, IEEE Photon. Technol. Lett. 16, 308 (2004).

J. Lightwave Technol. (3)

Opt. Express (1)

Proc. SPIE (1)

H. Wen, Y. Ge, H. Jiang, L. Han, X. Chen, X. Zheng, H. Zhang, and Y. Guo, Proc. SPIE 7136, 713636 (2008).

Other (4)

L. Christen, S. Nuccio, Y. K. Lize, N. Jayachandran, A. E. Willner, and L. Parschis, in Proceedings of CLEO2007 CMJJ2 (2007).

F. Seguin and F. Gonthier, in Proceedings of OFC2005 OFL5 (2005).

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J. Li, K. Worms, D. Hillerkuss, B. Richter, R. Maestle, W. Freude, and J. Leuthold, in Proceedings of OFC2010 JWA24 (2010).

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