Abstract

The continuous monitoring of H<sub>2</sub>S gas concentration is a common problem in natural gas desulfurization process technology. Tunable diode laser absorption spectroscopy (TDLAS) is a preferred technology for continuous monitoring of gas in industrial sites, because of its high selectivity, high sensitivity, and fast response. We discuss the technical solutions of on-line monitoring of H<sub>2</sub>S in natural gas desulfurization process technology based on TDLAS, and study the security design of monitoring system in inflammable and explosive areas. We also design a weak photocurrent signal converting circuit and perform experiments on transmission characteristics of different distances. The signal-to-noise ratio (SNR) of laser absorption spectrum does not decrease after the 1 500-m transmission. The detection limit is 300 ppb. The system can be operated stably and reliably, and satisfies the need for continuous monitoring of the H<sub>2</sub>S in natural gas desulfurization process.

© 2012 Chinese Optics Letters

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2011 (1)

2010 (1)

2007 (1)

2006 (1)

2004 (1)

L. R. Brown, O. V. Naumenk, E. R. Polovtseva, and L. N. Sinitsa, Proc. SPIE 5311, 59 (2004).

2000 (1)

1993 (1)

I. Watanabe, S. Sugou, H. Ishikawa, T. Anan, K. Makita, M. Tsuji, and K. Taguchi, IEEE Photon. Technol. Lett. 5, 675 (1993).

Amarouche, N.

Anan, T.

I. Watanabe, S. Sugou, H. Ishikawa, T. Anan, K. Makita, M. Tsuji, and K. Taguchi, IEEE Photon. Technol. Lett. 5, 675 (1993).

Brown, L. R.

L. R. Brown, O. V. Naumenk, E. R. Polovtseva, and L. N. Sinitsa, Proc. SPIE 5311, 59 (2004).

Chen, D.

Chen, J.

Danguy, T.

Durry, G.

Fang, X.

Hou, D.

Ishikawa, H.

I. Watanabe, S. Sugou, H. Ishikawa, T. Anan, K. Makita, M. Tsuji, and K. Taguchi, IEEE Photon. Technol. Lett. 5, 675 (1993).

Kan, R.

Li, P.

Liao, J.

Liu, J.

Liu, W.

Makita, K.

I. Watanabe, S. Sugou, H. Ishikawa, T. Anan, K. Makita, M. Tsuji, and K. Taguchi, IEEE Photon. Technol. Lett. 5, 675 (1993).

Megie, G.

Naumenk, O. V.

L. R. Brown, O. V. Naumenk, E. R. Polovtseva, and L. N. Sinitsa, Proc. SPIE 5311, 59 (2004).

Polovtseva, E. R.

L. R. Brown, O. V. Naumenk, E. R. Polovtseva, and L. N. Sinitsa, Proc. SPIE 5311, 59 (2004).

Pouchet, I.

Sinitsa, L. N.

L. R. Brown, O. V. Naumenk, E. R. Polovtseva, and L. N. Sinitsa, Proc. SPIE 5311, 59 (2004).

Sugou, S.

I. Watanabe, S. Sugou, H. Ishikawa, T. Anan, K. Makita, M. Tsuji, and K. Taguchi, IEEE Photon. Technol. Lett. 5, 675 (1993).

Taguchi, K.

I. Watanabe, S. Sugou, H. Ishikawa, T. Anan, K. Makita, M. Tsuji, and K. Taguchi, IEEE Photon. Technol. Lett. 5, 675 (1993).

Tarsitano, C. G.

Tsuji, M.

I. Watanabe, S. Sugou, H. Ishikawa, T. Anan, K. Makita, M. Tsuji, and K. Taguchi, IEEE Photon. Technol. Lett. 5, 675 (1993).

Wang, M.

Wang, T.

Wang, X.

Watanabe, I.

I. Watanabe, S. Sugou, H. Ishikawa, T. Anan, K. Makita, M. Tsuji, and K. Taguchi, IEEE Photon. Technol. Lett. 5, 675 (1993).

Webster, C. R.

Wen, H.

Xi, P.

Xia, H.

Zhang, H.

Zhang, Y.

Zhang, Z.

Zhao, J.

Zheng, X.

Appl. Opt. (2)

Chin. Opt. Lett. (3)

IEEE Photon. Technol. Lett. (1)

I. Watanabe, S. Sugou, H. Ishikawa, T. Anan, K. Makita, M. Tsuji, and K. Taguchi, IEEE Photon. Technol. Lett. 5, 675 (1993).

Proc. SPIE (1)

L. R. Brown, O. V. Naumenk, E. R. Polovtseva, and L. N. Sinitsa, Proc. SPIE 5311, 59 (2004).

Other (3)

M. B. Frish and D. M. Sonnenfroh, in Proceedings of OSA/Energy 2009 (2009).

L. Wang, Y. Zhang, Y. He, J. Dong, and K. You, in Proceedings of 2011 International Conference on Electronics and Optoelectronics (2011).

B. Carter and T. R. Brown, Handbook of operational amplif ier applications (Texas Instruments, 2001).

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