Abstract

Amorphous Si waveguides with gradient refractive index cladding structure are proposed and fabricated using plasma-enhanced chemical vapor deposition method. Compared with 6 dB/cm for ridge waveguide without gradient cladding, the propagation loss of the gradient cladding waveguides is less than 1 dB/cm with both TE and TM polarizations.

© 2012 Chinese Optics Letters

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