Abstract

Upconversion luminescence of Er^(3+)/Yb^(3+)-doped halide tellurite glass is investigated experimentally upon 976-nm excitation. Three intense emissions centered at 525, 545 and 655 nm owing to the transitions (2)^H_(11/2) ? (4)^I_(15/2), (4)^S_(3/2) ? (4)^I_(15/2) and (4)^F_(9/2) ? (4)^I_(15/2), respectively, are observed when pumping power is as low as 20 mW. The upconversion mechanisms and power dependent intensities are discussed. The high-populated (4)^I_(11/2) level is supposed to serve as the intermediate state responsible for the upconversion processes.

© 2005 Chinese Optics Letters

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2002 (4)

J. P. Jouart, M. Bouffard, T. Duvaut, and N. M. Khadukov, Chem. Phys. Lett. 366, 62 (2002).

F. Vetrone, J. C. Boyer, J. A. Capobianco, A. Speghini, and M. Bettinelli, Appl. Phys. Lett. 80, 1752 (2002).

F. Vetrone, J. C. Boyer, J. A. Capobianco, A. Speghini, and M. Bettinelli, Appl. Phys. Lett. 80, 1752 (2002).

S. H. Park, D. C. Lee, and J. Heo, J. Appl. Phys. 91, 9072 (2002).

2001 (1)

H. Lin, E. Y. B. Pun, and X. R. Liu, J. Non-Cryst. Solids 283, 27 (2001).

2000 (1)

H. U. Gudel and M. Pollnau, J. Alloys Comp. 303 & 304, 307 (2000).

1999 (1)

Y. G. Choi, D. S. Lim, and K. H. Kim, Electron. Lett. 35, 1765 (1999).

1998 (1)

I. R. Martin, V. D. Rodriguez, V. Lavin, and U. R. Rodriguez-Mendoza, J. Alloys Comp. 275 & 277, 345 (1998).

1994 (1)

1993 (1)

Y. Wang and J. Ohwaki, J. Appl. Phys. 74, 1272 (1993).

1991 (1)

B. Pederson, A. Bjarklev, J. H. Povlsen, K. Dybdal, and C. C. Larsen, J. Light. Tech. 9, 1105 (1991).

1970 (1)

J. V. Pan van der Ziel, F. W. Ostermayer, and L. G. Van Uitert, Phys. Rev. B 2, 4432 (1970).

Bettinelli, M.

F. Vetrone, J. C. Boyer, J. A. Capobianco, A. Speghini, and M. Bettinelli, Appl. Phys. Lett. 80, 1752 (2002).

F. Vetrone, J. C. Boyer, J. A. Capobianco, A. Speghini, and M. Bettinelli, Appl. Phys. Lett. 80, 1752 (2002).

Bjarklev, A.

B. Pederson, A. Bjarklev, J. H. Povlsen, K. Dybdal, and C. C. Larsen, J. Light. Tech. 9, 1105 (1991).

Bouffard, M.

J. P. Jouart, M. Bouffard, T. Duvaut, and N. M. Khadukov, Chem. Phys. Lett. 366, 62 (2002).

Boyer, J. C.

F. Vetrone, J. C. Boyer, J. A. Capobianco, A. Speghini, and M. Bettinelli, Appl. Phys. Lett. 80, 1752 (2002).

F. Vetrone, J. C. Boyer, J. A. Capobianco, A. Speghini, and M. Bettinelli, Appl. Phys. Lett. 80, 1752 (2002).

Capobianco, J. A.

F. Vetrone, J. C. Boyer, J. A. Capobianco, A. Speghini, and M. Bettinelli, Appl. Phys. Lett. 80, 1752 (2002).

F. Vetrone, J. C. Boyer, J. A. Capobianco, A. Speghini, and M. Bettinelli, Appl. Phys. Lett. 80, 1752 (2002).

Choi, Y. G.

Y. G. Choi, D. S. Lim, and K. H. Kim, Electron. Lett. 35, 1765 (1999).

Dussardier, B.

Duvaut, T.

J. P. Jouart, M. Bouffard, T. Duvaut, and N. M. Khadukov, Chem. Phys. Lett. 366, 62 (2002).

Dybdal, K.

B. Pederson, A. Bjarklev, J. H. Povlsen, K. Dybdal, and C. C. Larsen, J. Light. Tech. 9, 1105 (1991).

Gudel, H. U.

H. U. Gudel and M. Pollnau, J. Alloys Comp. 303 & 304, 307 (2000).

Heo, J.

S. H. Park, D. C. Lee, and J. Heo, J. Appl. Phys. 91, 9072 (2002).

Jouart, J. P.

J. P. Jouart, M. Bouffard, T. Duvaut, and N. M. Khadukov, Chem. Phys. Lett. 366, 62 (2002).

Khadukov, N. M.

J. P. Jouart, M. Bouffard, T. Duvaut, and N. M. Khadukov, Chem. Phys. Lett. 366, 62 (2002).

Kim, K. H.

Y. G. Choi, D. S. Lim, and K. H. Kim, Electron. Lett. 35, 1765 (1999).

Larsen, C. C.

B. Pederson, A. Bjarklev, J. H. Povlsen, K. Dybdal, and C. C. Larsen, J. Light. Tech. 9, 1105 (1991).

Lavin, V.

I. R. Martin, V. D. Rodriguez, V. Lavin, and U. R. Rodriguez-Mendoza, J. Alloys Comp. 275 & 277, 345 (1998).

Lee, D. C.

S. H. Park, D. C. Lee, and J. Heo, J. Appl. Phys. 91, 9072 (2002).

Lim, D. S.

Y. G. Choi, D. S. Lim, and K. H. Kim, Electron. Lett. 35, 1765 (1999).

Lin, H.

H. Lin, E. Y. B. Pun, and X. R. Liu, J. Non-Cryst. Solids 283, 27 (2001).

Liu, X. R.

H. Lin, E. Y. B. Pun, and X. R. Liu, J. Non-Cryst. Solids 283, 27 (2001).

Martin, I. R.

I. R. Martin, V. D. Rodriguez, V. Lavin, and U. R. Rodriguez-Mendoza, J. Alloys Comp. 275 & 277, 345 (1998).

Maurice, E.

Monnom, G.

Ohwaki, J.

Y. Wang and J. Ohwaki, J. Appl. Phys. 74, 1272 (1993).

Ostermayer, F. W.

J. V. Pan van der Ziel, F. W. Ostermayer, and L. G. Van Uitert, Phys. Rev. B 2, 4432 (1970).

Ostrowsky, D. B.

Park, S. H.

S. H. Park, D. C. Lee, and J. Heo, J. Appl. Phys. 91, 9072 (2002).

Pederson, B.

B. Pederson, A. Bjarklev, J. H. Povlsen, K. Dybdal, and C. C. Larsen, J. Light. Tech. 9, 1105 (1991).

Pollnau, M.

H. U. Gudel and M. Pollnau, J. Alloys Comp. 303 & 304, 307 (2000).

Povlsen, J. H.

B. Pederson, A. Bjarklev, J. H. Povlsen, K. Dybdal, and C. C. Larsen, J. Light. Tech. 9, 1105 (1991).

Pun, E. Y. B.

H. Lin, E. Y. B. Pun, and X. R. Liu, J. Non-Cryst. Solids 283, 27 (2001).

Rodriguez, V. D.

I. R. Martin, V. D. Rodriguez, V. Lavin, and U. R. Rodriguez-Mendoza, J. Alloys Comp. 275 & 277, 345 (1998).

Rodriguez-Mendoza, U. R.

I. R. Martin, V. D. Rodriguez, V. Lavin, and U. R. Rodriguez-Mendoza, J. Alloys Comp. 275 & 277, 345 (1998).

Saisy, A.

Speghini, A.

F. Vetrone, J. C. Boyer, J. A. Capobianco, A. Speghini, and M. Bettinelli, Appl. Phys. Lett. 80, 1752 (2002).

F. Vetrone, J. C. Boyer, J. A. Capobianco, A. Speghini, and M. Bettinelli, Appl. Phys. Lett. 80, 1752 (2002).

Uitert, L. G. Van

J. V. Pan van der Ziel, F. W. Ostermayer, and L. G. Van Uitert, Phys. Rev. B 2, 4432 (1970).

Vetrone, F.

F. Vetrone, J. C. Boyer, J. A. Capobianco, A. Speghini, and M. Bettinelli, Appl. Phys. Lett. 80, 1752 (2002).

F. Vetrone, J. C. Boyer, J. A. Capobianco, A. Speghini, and M. Bettinelli, Appl. Phys. Lett. 80, 1752 (2002).

Wang, Y.

Y. Wang and J. Ohwaki, J. Appl. Phys. 74, 1272 (1993).

Ziel, J. V. Pan van der

J. V. Pan van der Ziel, F. W. Ostermayer, and L. G. Van Uitert, Phys. Rev. B 2, 4432 (1970).

Appl. Phys. Lett. (2)

F. Vetrone, J. C. Boyer, J. A. Capobianco, A. Speghini, and M. Bettinelli, Appl. Phys. Lett. 80, 1752 (2002).

F. Vetrone, J. C. Boyer, J. A. Capobianco, A. Speghini, and M. Bettinelli, Appl. Phys. Lett. 80, 1752 (2002).

Chem. Phys. Lett. (1)

J. P. Jouart, M. Bouffard, T. Duvaut, and N. M. Khadukov, Chem. Phys. Lett. 366, 62 (2002).

Electron. Lett. (1)

Y. G. Choi, D. S. Lim, and K. H. Kim, Electron. Lett. 35, 1765 (1999).

J. Alloys Comp. 275 & (1)

I. R. Martin, V. D. Rodriguez, V. Lavin, and U. R. Rodriguez-Mendoza, J. Alloys Comp. 275 & 277, 345 (1998).

J. Alloys Comp. 303 & (1)

H. U. Gudel and M. Pollnau, J. Alloys Comp. 303 & 304, 307 (2000).

J. Appl. Phys. (2)

Y. Wang and J. Ohwaki, J. Appl. Phys. 74, 1272 (1993).

S. H. Park, D. C. Lee, and J. Heo, J. Appl. Phys. 91, 9072 (2002).

J. Light. Tech. (1)

B. Pederson, A. Bjarklev, J. H. Povlsen, K. Dybdal, and C. C. Larsen, J. Light. Tech. 9, 1105 (1991).

J. Non-Cryst. Solids (1)

H. Lin, E. Y. B. Pun, and X. R. Liu, J. Non-Cryst. Solids 283, 27 (2001).

Opt. Lett. (1)

Phys. Rev. B (1)

J. V. Pan van der Ziel, F. W. Ostermayer, and L. G. Van Uitert, Phys. Rev. B 2, 4432 (1970).

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