Abstract
A simple modal analysis (MA) method to explain the diffraction process of 0th order
nulled phase mask is presented. In MA, multiple reflections of the grating modes at grating
interfaces are considered by introducing equivalent Fresnel coefficients. Analytical expressions of
the diffraction efficiencies and modal guidelines for the 0th order nulled phase grating design are
also presented. The phase mask structure, which comprises a high-index contrast HfO<sub>2</sub> grating and a
fused-silica substrate, is optimized using rigorous coupled-wave analysis around the 800-nm
wavelength, after which the modal guideline for cancellation of the 0th order in a phase mask is
verified. The proposed MA method illustrates the inherent physical mechanism of multiple reflections
of the grating modes in the diffraction process, which can help to analyze and design both
low-contrast and high-contrast gratings.
© 2013 Chinese Optics Letters
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