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Optica Publishing Group
  • Applied Spectroscopy
  • Vol. 41,
  • Issue 4,
  • pp. 679-682
  • (1987)

Characterization of OH Radical 306.4 nm Emission in Argon and Helium Reduced-Pressure ICPs

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Abstract

The A → X emission of OH at 306.4 nm has been studied in reduced-pressure inductively coupled argon and helium plasmas. Under a variety of conditions of power and flow rate, a comparison of the A state rotational level distributions shows significant differences in the two plasmas. The rotational level distributions are generally nonlinear but can be quantitatively described as the sum of two separate Boltzmann distributions.

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