Abstract

The application of the matrix isolation technique to the study of the sputtering process is reported. Equations are derived which relate the experimentally measured absorbance data to the sputtering yield. These equations are applied to data from the sputtering of Nb metal by 50 keV rare gas ions. Relative sputtering yields obtained in this manner are in good agreement with sputtering yields obtained by weight loss measurements. The potential of the technique for studies of both physical and chemical sputtering and for the determination of oscillator strengths is discussed.

Differential sputter yield measurements using cavity ringdown spectroscopy

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Isolating individual polarization effects from the Mueller matrix: comparison of two non-decomposition techniques

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Recent studies of atomic spectra using fast-beam techniques

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