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Reflective EUVL tool design with generalized Gaussian constant mathematics

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Abstract

This study aims to develop a systematic design procedure for extreme ultraviolet lithography tools. Through analysis using generalized Gaussian constants, relationships between optical properties and requirements can be obtained, and can be used to help ensure that optical system properties required for the tool are upheld during the design process. As verification of the design method, an eight-mirror 0.4 NA tool design has been demonstrated.

© 2018 Optical Society of America

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