Abstract
thin films were deposited by plasma polymerization. The stress of the deposited thin films can be modified by adjusting the beam current, the anode voltage, and the flow rate of hexamethyldisiloxane (HMDSO) gas and oxygen. Reducing the beam current or increasing the flow rate of HMDSO gas increased the linear/cage structure ratio and turned the stress of the thin films from compressive to tensile. The linear/cage structure ratio can be adjusted by changing the composite parameter, , to control the stress of the deposited plasma polymer films. Multilayers of were coated on a plasma polymer film herein, reducing their stress by 70% from 0.06 to 0.018 GPa. The refractive index is 1.55, and the absorption coefficient is less than at 550 nm of the films. Superior optical performances of thin films make their use in optical thin films.
© 2016 Optical Society of America
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