Abstract
It is necessary to control the internal stress of optical thin films in order to address problems such as peeling and cracking. Internal stress differs among films prepared by different deposition methods. We investigated the internal stress of films prepared by sputtering, electron beam (EB) evaporation, and a combination deposition method that we developed. The internal stress was successfully controlled, showing a value between that of EB evaporation and sputtering.
© 2016 Optical Society of America
Full Article | PDF ArticleMore Like This
Toshiyuki Nishikawa, Hiroi Ono, Hiroshi Murotani, Yoshitaka Iida, and Katsuhisa Okada
Appl. Opt. 50(9) C210-C216 (2011)
Tomoaki Takahashi, Toshinori Harada, Hiroshi Murotani, and Shigeharu Matumoto
Appl. Opt. 53(4) A287-A290 (2014)
Cheng-Chung Lee, Chuen-Lin Tien, and Jin-Cherng Hsu
Appl. Opt. 41(10) 2043-2047 (2002)