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OSA Publishing

1 December 1993, Volume 32, Issue 34, pp. 6880-7113   41 articles

Introduction to special issue of Applied Optics on soft-x-ray projection lithography

Appl. Opt. 32(34), 6895-6896 (1993)  View: HTML | PDF

X-ray production ~13 nm from laser-produced plasmas for projection x-ray lithography applications

Appl. Opt. 32(34), 6897-6900 (1993)  View: HTML | PDF

Characterization and control of laser plasma flux parameters for soft-x-ray projection lithography

Appl. Opt. 32(34), 6901-6910 (1993)  View: HTML | PDF

X-ray plasma source design simulations

Appl. Opt. 32(34), 6911-6913 (1993)  View: HTML | PDF

Laser driver for soft-x-ray projection lithography

Appl. Opt. 32(34), 6914-6919 (1993)  View: HTML | PDF

Synchrotron radiation sources and condensers for projection x-ray lithography

Appl. Opt. 32(34), 6920-6929 (1993)  View: HTML | PDF

Continuous emission source covering the 50–300-Å band

Appl. Opt. 32(34), 6930-6933 (1993)  View: HTML | PDF

Prototype high-speed tape target transport for a laser plasma soft-x-ray projection lithography source

Appl. Opt. 32(34), 6934-6937 (1993)  View: HTML | PDF

Condenser optics, partial coherence, and imaging for soft-x-ray projection lithography

Appl. Opt. 32(34), 6938-6944 (1993)  View: HTML | PDF

Physical optics modeling in soft-x-ray projection lithography

Appl. Opt. 32(34), 6945-6951 (1993)  View: HTML | PDF

Multilayer mirror technology for soft-x-ray projection lithography

Appl. Opt. 32(34), 6952-6960 (1993)  View: HTML | PDF

Masked deposition techniques for achieving multilayer period variations required for short-wavelength (68-Å) soft-x-ray imaging optics

Appl. Opt. 32(34), 6961-6968 (1993)  View: HTML | PDF

Ion-assisted sputter deposition of molybdenum-silicon multilayers

Appl. Opt. 32(34), 6969-6974 (1993)  View: HTML | PDF

Silicide layer growth rates in Mo/Si multilayers

Appl. Opt. 32(34), 6975-6980 (1993)  View: HTML | PDF

Influence of electrical isolation on the structure and reflectivity of multilayer coatings deposited on dielectric substrates

Appl. Opt. 32(34), 6981-6984 (1993)  View: HTML | PDF

Tarnishing of Mo/Si multilayer x-ray mirrors

Appl. Opt. 32(34), 6985-6990 (1993)  View: HTML | PDF

Radiation hardness of molybdenum silicon multilayers designed for use in a soft-x-ray projection lithography system

Appl. Opt. 32(34), 6991-6998 (1993)  View: HTML | PDF

Investigation of distortion and damage of molybdenum–silicon multilayer reflective coatings with high-intensity ultraviolet radiation

Appl. Opt. 32(34), 6999-7006 (1993)  View: HTML | PDF

Mask technologies for soft-x-ray projection lithography at 13 nm

Appl. Opt. 32(34), 7007-7011 (1993)  View: HTML | PDF

Reflection mask defect repair

Appl. Opt. 32(34), 7012-7015 (1993)  View: HTML | PDF

Propagation errors in precision Fizeau interferometry

Appl. Opt. 32(34), 7016-7021 (1993)  View: HTML | PDF

Undulator radiation for at-wavelength interferometry of optics for extreme-ultraviolet lithography

Appl. Opt. 32(34), 7022-7031 (1993)  View: HTML | PDF

Resist alternatives for sub-0.35-μm lithography by using highly attenuated radiation

Appl. Opt. 32(34), 7032-7035 (1993)  View: HTML | PDF

Chemically amplified soft-x-ray resists: sensitivity, resolution, and molecular photodesorption

Appl. Opt. 32(34), 7036-7043 (1993)  View: HTML | PDF

Characterization of AZ PN114 resist for soft-x-ray projection lithography

Appl. Opt. 32(34), 7044-7049 (1993)  View: HTML | PDF

Front-end design issues in soft-x-ray projection lithography

Appl. Opt. 32(34), 7050-7056 (1993)  View: HTML | PDF

Schwarzschild microscope for carbon Kα radiation

Appl. Opt. 32(34), 7057-7061 (1993)  View: HTML | PDF

Wavelength considerations in soft-x-ray projection lithography

Appl. Opt. 32(34), 7062-7067 (1993)  View: HTML | PDF

Soft-x-ray projection lithography experiments using Schwarzschild imaging optics

Appl. Opt. 32(34), 7068-7071 (1993)  View: HTML | PDF

Soft-x-ray projection imaging with a 1:1 ring-field optic

Appl. Opt. 32(34), 7072-7078 (1993)  View: HTML | PDF

Large-area, high-resolution pattern replication by the use of a two-aspherical-mirror system

Appl. Opt. 32(34), 7079-7083 (1993)  View: HTML | PDF

Possible damage mechanism of the dielectric coatings for a KrF laser

Appl. Opt. 32(34), 7084-7088 (1993)  View: HTML | PDF

Transverse color tolerances for visual optical systems

Appl. Opt. 32(34), 7089-7094 (1993)  View: HTML | PDF

Hadamard spectroscopy with a two-dimensional detecting array

Appl. Opt. 32(34), 7095-7105 (1993)  View: HTML | PDF

Optical and crystalline properties of PbF2 thin films

Appl. Opt. 32(34), 7106-7109 (1993)  View: HTML | PDF

Infrared Collimator System

Appl. Opt. 32(34), 7117-7118 (1993)  View: HTML | PDF

Rotational Shearing Interferometer

Appl. Opt. 32(34), 7118-7119 (1993)  View: HTML | PDF

Accurate Measurement of Refractive Indices

Appl. Opt. 32(34), 7120-7121 (1993)  View: HTML | PDF

Fiber-coupled Laser Diode Mount for Interferometry

Appl. Opt. 32(34), 7122-7123 (1993)  View: HTML | PDF

Estimating Secondary Color

Appl. Opt. 32(34), 7124-7124 (1993)  View: HTML | PDF

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