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References

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  1. J. Altman, H. Schmitt, “On the Optics of Thin Films of Resist Over Chrome,” Kodak Photoresist Seminar Proceedings (Kodak Publications P-192-B 2, 1968).
  2. P. Baumeister, Appl. Opt. 8, 423 (1969).
    [CrossRef] [PubMed]
  3. F. Abelès, in Advanced Optical Techniques, A. C. S. Van Heel, Ed. (North-Holland Publishing Company, Amsterdam, 1967).

1969 (1)

Abelès, F.

F. Abelès, in Advanced Optical Techniques, A. C. S. Van Heel, Ed. (North-Holland Publishing Company, Amsterdam, 1967).

Altman, J.

J. Altman, H. Schmitt, “On the Optics of Thin Films of Resist Over Chrome,” Kodak Photoresist Seminar Proceedings (Kodak Publications P-192-B 2, 1968).

Baumeister, P.

Schmitt, H.

J. Altman, H. Schmitt, “On the Optics of Thin Films of Resist Over Chrome,” Kodak Photoresist Seminar Proceedings (Kodak Publications P-192-B 2, 1968).

Appl. Opt. (1)

Other (2)

F. Abelès, in Advanced Optical Techniques, A. C. S. Van Heel, Ed. (North-Holland Publishing Company, Amsterdam, 1967).

J. Altman, H. Schmitt, “On the Optics of Thin Films of Resist Over Chrome,” Kodak Photoresist Seminar Proceedings (Kodak Publications P-192-B 2, 1968).

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Figures (2)

Fig. 1
Fig. 1

The differential absorption (Å−1) of a one micron photoresist at 410 nm as a function of the distance in the film. The film [ ( n ˆ = 1.6 j 0.02 ( curve a ) , n ˆ = 1.6 j 0.04 ( curve b ) ], is deposited on a chrome substrate ( n ˆ s = 3.5 j 4.0 ).

Fig. 2
Fig. 2

The differential absorption (Å−1) of a 0.1-μ resist at 410 nm as a function of the distance in the film. The film [ n ˆ = 1.6 j 0.01 ( curve A ) , n ˆ = 1.6 j 0.05 ( curve B ) ], is deposited on a chrome substrate ( n ˆ s = 3.5 j 4.0 ).

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