Optical Working of Infrared Materials

C. L. Gupta; R. C. Tyagi

doi:10.1364/AO.9.000675

Applied Optics
Vol. 9,
Issue 3,
pp. 675-679
(1970)
•https://doi.org/10.1364/AO.9.000675

Optical Working of Infrared Materials

C. L. Gupta and R. C. Tyagi

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C. L. Gupta and R. C. Tyagi, "Optical Working of Infrared Materials," Appl. Opt. 9, 675-679 (1970)

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Abstract

The techniques of optical working of various ir materials, namely, cutting, grinding, polishing, protective coatings, and testing, are described in detail.

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Material	Etchants/polishing agent	Remarks
NaCl (Ref. 6)	Glacial acetic acid.	Etching time 30 sec
	Methanol.
	Absolute ethyl alcohol containing an inhibitor of 3 g of mercuric chloride per liter of alcohol.
KCl (Ref. 6)	Acetic acid.	Rinse with ether.
	Concentrated solution of polyvinyl butyrol in buryl or ethyl alcohol. Ethyl alcohol saturated with 25% BaBr₂ + 5% methanol containing 100 g of BaBr₂ per liter.	Increased contrast and sharpness of pits. Etching time 30–90 sec.
	Propionic acid.	Time 30–90 sec. Rinse with ether or petroleum.
KBr (Ref. 6)	As for KCl above; reagent grade glacial acetic acid. Saturated solution of PbCl₂ in ethanol at 50°C 73% methanol + 3% ethanol + 22% glycerol + 2% glycerol + 2% ammonia.	Rinse with CCl₄ preferential etching observed. Etching time 10–15 sec. Polish attained in 5–10 min.
KI (Ref. 6)	Isopropyl alcohol, pyridine.
LiF (Ref. 6)	Water; 2 × 10⁻⁶ mol fraction solution of FeF₃ in H₂O; water + 1.5% ammonia.	Dislocation etch pits are formed; etching time 1–2 min.
CsI (Ref. 7)	Methyl alcohol + glycerol; weak solution of CuCl₂ or FeCl₃ in methyl alcohol.
AgCl (Ref. 8)	20% butyl amine by volume in ethyl alcohol.
Fluorite (Ref. 9)	Saturated solution of disodium salt of ethylene-diamine-tetraacetic acid.	Polishing time 15 min.
NH₄H₂Po₄	Concentrated HCl saturated with cupric oxide 80% + ethyl alcohol 20% + distilled water 20%.
NaClO₃ (Ref. 10)
Ge	5 HF + 10 HNO₃ + 11 acetic acid with 30 mg of I₂ dissolved.	Polishing and etching along (100) and (111) directions; time 4 min. Polish within 15 sec.
Si	1 HF + 3 HNO₃	Small proportion of acetic acid gives faster etch.

Material	Refractive index at 6000 Å	Spectral region of transparency at λ/4 optical thickness		Evaporation source	Remarks
Material	Refractive index at 6000 Å	From	To	Evaporation source	Remarks
Cryolite (Na₃AlF₆)	1.35	0.2	5	Tantalum boat, molybdenum boat	Soft coating
Magnesium fluoride	1.38	0.23	5	Molybdenum boat	Hard and durable
Cerium fluoride	1.63	0.3	5	Tungsten boat	—
Silicon monoxide	1.45–1.90	0.35	8	Covered tungsten coil; Mo and Ta heater	Hard and durable
Titanium oxide	2.67	0.4	8	Tungsten heater	—
Silicon	3.48^b	0.9	8	Induction heating, electric bombardment	Hard and durable
Thorium oxyfluoride	1.52	0.2	10	Molybdenum boat	—
Zinc sulfide	2.32	0.38	14	Howitzer, molybdenum boat	Hard and durable
Germanium	3.80^b	1.4	20	Tantalum boat, tungsten boat	—
Lead telluride	5.10^b	3.9	20	Molybdenum boat	—
Cerium oxide	2.2	—	—	Tungsten, tantalum boat	Hard and durable
Aluminum oxide (Al₂O₃)	1.62	—	—	Electric bombardment, tungsten boat	—
Antimony trioxide	1.85	—	—	Platinum heater	Soft coating
Magnesium oxide	—	—	—	Molybdenum boat	Abrasion, scratch and corrosion resistant

Material	Etchants/polishing agent	Remarks
NaCl (Ref. 6)	Glacial acetic acid.	Etching time 30 sec
	Methanol.
	Absolute ethyl alcohol containing an inhibitor of 3 g of mercuric chloride per liter of alcohol.
KCl (Ref. 6)	Acetic acid.	Rinse with ether.
	Concentrated solution of polyvinyl butyrol in buryl or ethyl alcohol. Ethyl alcohol saturated with 25% BaBr₂ + 5% methanol containing 100 g of BaBr₂ per liter.	Increased contrast and sharpness of pits. Etching time 30–90 sec.
	Propionic acid.	Time 30–90 sec. Rinse with ether or petroleum.
KBr (Ref. 6)	As for KCl above; reagent grade glacial acetic acid. Saturated solution of PbCl₂ in ethanol at 50°C 73% methanol + 3% ethanol + 22% glycerol + 2% glycerol + 2% ammonia.	Rinse with CCl₄ preferential etching observed. Etching time 10–15 sec. Polish attained in 5–10 min.
KI (Ref. 6)	Isopropyl alcohol, pyridine.
LiF (Ref. 6)	Water; 2 × 10⁻⁶ mol fraction solution of FeF₃ in H₂O; water + 1.5% ammonia.	Dislocation etch pits are formed; etching time 1–2 min.
CsI (Ref. 7)	Methyl alcohol + glycerol; weak solution of CuCl₂ or FeCl₃ in methyl alcohol.
AgCl (Ref. 8)	20% butyl amine by volume in ethyl alcohol.
Fluorite (Ref. 9)	Saturated solution of disodium salt of ethylene-diamine-tetraacetic acid.	Polishing time 15 min.
NH₄H₂Po₄	Concentrated HCl saturated with cupric oxide 80% + ethyl alcohol 20% + distilled water 20%.
NaClO₃ (Ref. 10)
Ge	5 HF + 10 HNO₃ + 11 acetic acid with 30 mg of I₂ dissolved.	Polishing and etching along (100) and (111) directions; time 4 min. Polish within 15 sec.
Si	1 HF + 3 HNO₃	Small proportion of acetic acid gives faster etch.

Material	Refractive index at 6000 Å	Spectral region of transparency at λ/4 optical thickness		Evaporation source	Remarks
Material	Refractive index at 6000 Å	From	To	Evaporation source	Remarks
Cryolite (Na₃AlF₆)	1.35	0.2	5	Tantalum boat, molybdenum boat	Soft coating
Magnesium fluoride	1.38	0.23	5	Molybdenum boat	Hard and durable
Cerium fluoride	1.63	0.3	5	Tungsten boat	—
Silicon monoxide	1.45–1.90	0.35	8	Covered tungsten coil; Mo and Ta heater	Hard and durable
Titanium oxide	2.67	0.4	8	Tungsten heater	—
Silicon	3.48^b	0.9	8	Induction heating, electric bombardment	Hard and durable
Thorium oxyfluoride	1.52	0.2	10	Molybdenum boat	—
Zinc sulfide	2.32	0.38	14	Howitzer, molybdenum boat	Hard and durable
Germanium	3.80^b	1.4	20	Tantalum boat, tungsten boat	—
Lead telluride	5.10^b	3.9	20	Molybdenum boat	—
Cerium oxide	2.2	—	—	Tungsten, tantalum boat	Hard and durable
Aluminum oxide (Al₂O₃)	1.62	—	—	Electric bombardment, tungsten boat	—
Antimony trioxide	1.85	—	—	Platinum heater	Soft coating
Magnesium oxide	—	—	—	Molybdenum boat	Abrasion, scratch and corrosion resistant

Abstract

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Applied Optics