Abstract

A technique is described for recording holograms and forming diffraction gratings in Shipley AZ1350 photoresist using the 4579-Å output from an argon laser. A pre-exposure technique is described that not only reduces exposure times but increases the signal-to-noise ratio of the image. It is also shown that the effects of the variable characteristic of the resist can be alleviated by monitoring diffraction efficiency during development.

© 1970 Optical Society of America

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