Abstract

Rough ground samples of fused silica were irradiated with an argon ion beam. At high angles of incidence the randomly pitted surface structure was converted to a striated surface. An explanation for the development of the striated topography is based on the dependence of sputtering rate on the localized angle of incidence of the ions with respect to individual surface features. Experimental conditions for removal of isolated surface defects and the conditions under which a smooth surface may be produced by ion erosion are discussed.

© 1970 Optical Society of America

Evolution of grating profiles under ion-beam erosion

L. F. Johnson
Appl. Opt. 18(15) 2559-2574 (1979)

Evolution mechanism of surface roughness during ion beam sputtering of fused silica

Mingjin Xu, Yifan Dai, Lin Zhou, Xiaoqiang Peng, Shaoshan Chen, and Wenlin Liao
Appl. Opt. 57(20) 5566-5573 (2018)

Influence of ion-beam etching by Ar ions with an energy of 200–1000 eV on the roughness and sputtering yield of a single-crystal silicon surface

M. S. Mikhailenko, A. E. Pestov, N. I. Chkhalo, M. V. Zorina, A. K. Chernyshev, N. N. Salashchenko, and I. I. Kuznetsov
Appl. Opt. 61(10) 2825-2833 (2022)

Asymmetric triangular grating profiles with 90° groove angles produced by ion-beam erosion

L. F. Johnson and K. A. Ingersoll
Appl. Opt. 20(17) 2951-2961 (1981)

Ion polishing with the aid of a planarizing film

Leo F. Johnson and K. A. Ingersoll
Appl. Opt. 22(8) 1165-1167 (1983)