Application of Immersion Reflectometry to the Study of Interference Layers

Abstract

The reflectance of a thin film changes upon immersion in a transparent dielectric liquid. By use of spectrophotometry, the changes in reflectance at the wavelengths where maximum or minimum reflectance occurs have been characterized for a variety of optical combinations including both transparent and absorbing films and substrates. The complications and ambiguities of interpretation for each system and the effects of multilayer structure have been examined. Reversal of the direction of observation is discussed as one means to distinguish between absorption and inhomogeneity in the film.

© 1969 Optical Society of America

Immersion Spectrophotometry of Vapor-Deposited Films: I. Comparison with Angular Reflectance Measurements, and II. Aging Effects*

A. D. Mulford, L. D. Allen, and W. P. Ellis
J. Opt. Soc. Am. 57(6) 763-769 (1967)

Immersion Spectrophotometry of Interference Films: Refractive Indices of Fluoride Films on Uranium Dioxide and Anodic Oxide Films on Uranium Metal*

W. P. Ellis
J. Opt. Soc. Am. 53(5) 613-619 (1963)

Optical Properties of Anodic-Oxide Interference Films on Uranium Immersed in Refractive Media*

W. P. Ellis and E. D. Megarity
J. Opt. Soc. Am. 54(2) 225-228 (1964)

Use of an Evaporated Dielectric Film for Determining the Optical Constants of a Metal. II

D. K. Burge
Appl. Opt. 4(8) 967-969 (1965)

Dispersion of the Phase Change for Dielectric Multilayers. Application to the Interference Filter*

P. W. Baumeister and F. A. Jenkins
J. Opt. Soc. Am. 47(1) 57-61 (1957)