Abstract

The influence of residual gas pressure and of deposition rate on the refractive index of Na3AlF6 and ThF4 films was investigated. Transition from high to medium deposition rates causes a distinct decrease of the refractive index, but a further reduction of the deposition rate gives practically no additional change. Increasing the residual gas pressure from 2 or 4 × 10−6 to 2 × 10−5 torr has no influence on the refractive index although at 2 × 10−4 torr a lower value was measured. The refractive indices of Na3AlF6, ThF4, and ZnSe coatings deposited on Ag and Al films were found to be essentially the same as those obtained on dielectric multilayers.

© 1968 Optical Society of America

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References

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  1. W. Heitmann, G. Koppelmann, Z. Angew. Phys. 23, 221 (1967).
  2. K. Diels, R. Jaeckel, Leybold Vakuum-Taschenbuch (Springer, Berlin, 1962), p. 15.
  3. A. Heisen, Optik 18, 59 (1961).
  4. H. L. Caswell, in Physics of Thin Films, G. Hass, Ed. (Academic Press, Inc., New York, 1963), Vol. 1, p. 51.
  5. Handbook of Chemistry and Physics (Chemical Rubber Company, Cleveland, 1966–67), 47th Ed.
  6. G. Hass, in Applied Optics and Optical Engineering, R. Kingslake, Ed., (Academic Press, Inc., New York, 1965), Vol. 3.
  7. K. Krebs, H. Nelkowski, R. Winkler, Z. Phys. 144, 509 (1956).
    [Crossref]
  8. K. Krebs, R. Winkler, Optik 14, 503 (1957).

1967 (1)

W. Heitmann, G. Koppelmann, Z. Angew. Phys. 23, 221 (1967).

1961 (1)

A. Heisen, Optik 18, 59 (1961).

1957 (1)

K. Krebs, R. Winkler, Optik 14, 503 (1957).

1956 (1)

K. Krebs, H. Nelkowski, R. Winkler, Z. Phys. 144, 509 (1956).
[Crossref]

Caswell, H. L.

H. L. Caswell, in Physics of Thin Films, G. Hass, Ed. (Academic Press, Inc., New York, 1963), Vol. 1, p. 51.

Diels, K.

K. Diels, R. Jaeckel, Leybold Vakuum-Taschenbuch (Springer, Berlin, 1962), p. 15.

Hass, G.

G. Hass, in Applied Optics and Optical Engineering, R. Kingslake, Ed., (Academic Press, Inc., New York, 1965), Vol. 3.

Heisen, A.

A. Heisen, Optik 18, 59 (1961).

Heitmann, W.

W. Heitmann, G. Koppelmann, Z. Angew. Phys. 23, 221 (1967).

Jaeckel, R.

K. Diels, R. Jaeckel, Leybold Vakuum-Taschenbuch (Springer, Berlin, 1962), p. 15.

Koppelmann, G.

W. Heitmann, G. Koppelmann, Z. Angew. Phys. 23, 221 (1967).

Krebs, K.

K. Krebs, R. Winkler, Optik 14, 503 (1957).

K. Krebs, H. Nelkowski, R. Winkler, Z. Phys. 144, 509 (1956).
[Crossref]

Nelkowski, H.

K. Krebs, H. Nelkowski, R. Winkler, Z. Phys. 144, 509 (1956).
[Crossref]

Winkler, R.

K. Krebs, R. Winkler, Optik 14, 503 (1957).

K. Krebs, H. Nelkowski, R. Winkler, Z. Phys. 144, 509 (1956).
[Crossref]

Optik (2)

A. Heisen, Optik 18, 59 (1961).

K. Krebs, R. Winkler, Optik 14, 503 (1957).

Z. Angew. Phys. (1)

W. Heitmann, G. Koppelmann, Z. Angew. Phys. 23, 221 (1967).

Z. Phys. (1)

K. Krebs, H. Nelkowski, R. Winkler, Z. Phys. 144, 509 (1956).
[Crossref]

Other (4)

K. Diels, R. Jaeckel, Leybold Vakuum-Taschenbuch (Springer, Berlin, 1962), p. 15.

H. L. Caswell, in Physics of Thin Films, G. Hass, Ed. (Academic Press, Inc., New York, 1963), Vol. 1, p. 51.

Handbook of Chemistry and Physics (Chemical Rubber Company, Cleveland, 1966–67), 47th Ed.

G. Hass, in Applied Optics and Optical Engineering, R. Kingslake, Ed., (Academic Press, Inc., New York, 1965), Vol. 3.

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Figures (1)

Fig. 1
Fig. 1

Influence of the residual gas pressure on the refractive index of evaporated ThF4 films. Curve calculated with the refractive indices of ZnS and ThF4 determined from multilayers prepared under ideal conditions. Tk and Tk+1 are the transmissivities of the multilayer before and after deposition of the k + 1 layer.

Tables (2)

Tables Icon

Table I Influence of Deposition Rate and Residual Gas Pressure on the Refractive Index of Na3AlF6 and ThF4 films

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Table II Refractive Indices of Dielectric Films on Metallic Mirror Coatings at 633 nm

Equations (2)

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Δ n 1 - [ ( n 1 2 - 1 ) / 4 ] ( 1 - R II ) .
R II = [ ( n - n 1 ) 2 + k 2 ] / [ ( n + n 1 ) 2 + k 2 ] ,

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