Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group

Aberration optimization in an extreme ultraviolet lithography projector via a BP neural network and simulated annealing algorithm

Not Accessible

Your library or personal account may give you access

Abstract

Extreme ultraviolet lithography (EUVL) presents promise for the advanced technology node in the manufacturing of integrated circuits. The imaging performance of EUVL is significantly affected by the aberration of projection optics. To obtain one optimum aberration for different test patterns, an inverse optimization method for aberration is proposed in this paper. The aberration models of three types of test patterns are first established by applying the backpropagation (BP) neural network. Then choosing the common indicators of the lithography process variation band (PVB) and pattern shift (PS) as the objective function, an aberration optimization method based on the algorithm of simulated annealing is proposed. After applying the optimization method, a set of optimized aberrations and the corresponding PVBs and PSs are obtained and analyzed. These results are finally compared with those from rigorous simulations. The comparison results show that zero aberration is non-optimal distribution in EUVL image simulation with mask topography. In addition, the high prediction accuracy and robustness of aberration optimization is also demonstrated from the results.

© 2021 Optical Society of America

Full Article  |  PDF Article
More Like This
Analysis and modulation of aberration in an extreme ultraviolet lithography projector via rigorous simulation and a back propagation neural network

Rongbo Zhao, Lisong Dong, Chunyue Bo, Yayi Wei, and Xiaojing Su
Appl. Opt. 59(23) 7074-7082 (2020)

Aberration analysis and compensate method of a BP neural network and sparrow search algorithm in deep ultraviolet lithography

Shuang Zhang, Libin Zhang, Tianyang Gai, Peng Xu, and Yayi Wei
Appl. Opt. 61(20) 6023-6032 (2022)

Process optimization of contact hole patterns via a simulated annealing algorithm in extreme ultraviolet lithography

Rongbo Zhao, Yayi Wei, Hong Xu, and Xiangming He
Appl. Opt. 62(4) 927-932 (2023)

Cited By

You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription

Figures (5)

You do not have subscription access to this journal. Figure files are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription

Tables (7)

You do not have subscription access to this journal. Article tables are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription

Equations (5)

You do not have subscription access to this journal. Equations are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription

Select as filters


Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All Rights Reserved