Simultaneous measurement of the refractive index and the pressure by mode splitting in concentric triple microring resonators with a single opening

Ping Zhang; Chen Zhang; Zhiruo Yan

doi:10.1364/AO.417669

Applied Optics
Vol. 60,
Issue 11,
pp. 2958-2966
(2021)
•https://doi.org/10.1364/AO.417669

Simultaneous measurement of the refractive index and the pressure by mode splitting in concentric triple microring resonators with a single opening

Ping Zhang, Chen Zhang, and Zhiruo Yan

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Ping Zhang, Chen Zhang, and Zhiruo Yan, "Simultaneous measurement of the refractive index and the pressure by mode splitting in concentric triple microring resonators with a single opening," Appl. Opt. 60, 2958-2966 (2021)

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Table of Contents Category
- Optical Devices, Sensors, and Detectors
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About this Article
History
- Original Manuscript: December 15, 2020
- Revised Manuscript: March 1, 2021
- Manuscript Accepted: March 16, 2021
- Published: April 5, 2021

Abstract

Concentric triple microring resonators with a single opening on the flexible SU-8 substrate are proposed and theoretically demonstrated for simultaneous detection of refractive index (RI) and pressure changes. Since an opening defect is introduced, the mode splitting occurs, which forms a symmetric and an asymmetric standing wave mode (SWM). The energy distribution of the two SWMs is quite different so that the sensitivities of the RI and pressure in the SWMs can be distinguished. The RI sensitivities of 186.37 nm/RIU and 107.69 nm/RIU and the pressure sensitivities of 1.42 pm/KPa and 1.07 pm/KPa are obtained corresponding to the symmetric and the asymmetric SWMs, respectively. By solving a second-order sensitivity inverse matrix, the change in RI and pressure can be measured simultaneously, thereby eliminating the influence of the strain-optical coupling effect in the field of biosensing application. The proposed structure has great potential in achieving simultaneous measurement of multiple parameters.

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Data underlying the results presented in this paper are not publicly available at this time but may be obtained from the authors upon reasonable request.

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Symbol	Meaning	Value [µm]
${Gap}_{0}$	Coupling gap between the straight and microring resonators	0.08
$W_{s 1}$	Width of straight waveguide 1 and waveguide 4	0.3
$W_{s 2}$	Width of straight waveguide 2 and waveguide 3	0.2
$W_{s l o t}$	Slot width of the straight waveguide	0.06
${Gap}_{1}$	Gap between three microring resonators	0.08
$R_{m}$	Radius of the middle microring	4.28
$W_{r 1}$	Outer ring width	0.3
$W_{r 2}$	Middle ring width	0.4
$W_{r 3}$	Inner ring width	0.5
$H_{Si}$	Si layer height	0.18
$H_{S U_{8}}$	SU-8 layer height	15

$Δ n_{s e t}$	$P_{s e t} / K P a$	$Δ λ_{SSWM} / n m$	$Δ λ_{ASWM} / n m$	$Δ n_{a c t}$	$P_{a c t} / K P a$
0.0022	475	1.084	0.742	0.002268	465.592
0.0022	950	1.761	1.251	0.002307	937.301
0.0022	1230	2.153	1.552	0.002112	1239.257
0.0052	475	1.640	1.068	0.005108	484.517
0.0052	950	2.319	1.579	0.005114	961.895
0.0052	1230	2.726	1.878	0.005341	1218.749

Optical Resonator	Sensing Variable	Radius (µm)	Modes	$S_{RI}$ (nm/RIU)	$S_{P}$ (pm/KPa)	$Q$	Ref.
Microdisk	RI,	2	WGM(0,36)	45.8821	–	1500	[27]
	Temperature		WGM(1,28)	72.9402	–	200
SOMRR	RI,	3.25	WGM (SSWM)	77.07	5.01	738	[29]
SOMRR	Pressure		WGM (ASWM)	69.54	5.72	595
Microdisk	RI,	2	WGM (0,36)	29.07	0.576	5990	[30]
Microdisk	Pressure		WGM (1,28)	38.68	0.589	1200
ADSRMRR	Pressure	$\sim 5$	WGM	–	48.5	$\sim 800$	[45]
MOEMS	Pressure	40	photonic crystal	–	316.15 nm/RIU	12,245	[46]
AWG	Pressure	4	photoelastic effect	–	0.01853	–	[47]
Our work	RI,	4.28	WGM (SSWM)	186.37	1.42	781	Our
Our work	Pressure		WGM (ASWM)	107.69	1.07	1520	work

Symbol	Meaning	Value [µm]
${Gap}_{0}$	Coupling gap between the straight and microring resonators	0.08
$W_{s 1}$	Width of straight waveguide 1 and waveguide 4	0.3
$W_{s 2}$	Width of straight waveguide 2 and waveguide 3	0.2
$W_{s l o t}$	Slot width of the straight waveguide	0.06
${Gap}_{1}$	Gap between three microring resonators	0.08
$R_{m}$	Radius of the middle microring	4.28
$W_{r 1}$	Outer ring width	0.3
$W_{r 2}$	Middle ring width	0.4
$W_{r 3}$	Inner ring width	0.5
$H_{Si}$	Si layer height	0.18
$H_{S U_{8}}$	SU-8 layer height	15

$Δ n_{s e t}$	$P_{s e t} / K P a$	$Δ λ_{SSWM} / n m$	$Δ λ_{ASWM} / n m$	$Δ n_{a c t}$	$P_{a c t} / K P a$
0.0022	475	1.084	0.742	0.002268	465.592
0.0022	950	1.761	1.251	0.002307	937.301
0.0022	1230	2.153	1.552	0.002112	1239.257
0.0052	475	1.640	1.068	0.005108	484.517
0.0052	950	2.319	1.579	0.005114	961.895
0.0052	1230	2.726	1.878	0.005341	1218.749

Abstract

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Figures (11)

Tables (4)

Equations (12)

Applied Optics