Abstract

The classical interference experiment with a double slit is adapted for measuring the optical thickness (n − 1)d of transparent and slightly absorbing thin films on transparent or reflecting substrates and for measuring the geometrical thickness d of metal films on reflecting substrates. Also, a method is described for measuring in vacuum the optical thickness of transparent or slightly absorbing thin films on transparent substrates. Results are given of measurements on magnesium fluoride, silicon monoxide, and zinc sulfide films. The influence of admitting air into the vacuum chamber has been investigated. With the available arrangements, a precision of λ/1000 in the determination of the optical or geometrical thickness is easily obtainable for all film thicknesses. A thickness determination can be completed in about 1 min.

© 1967 Optical Society of America

Optical Properties of Evaporated Iridium in the Vacuum Ultraviolet from 500 Å to 2000 Å *†

G. Hass, G. F. Jacobus, and W. R. Hunter
J. Opt. Soc. Am. 57(6) 758-762 (1967)

Application of the Concept of Effective Refractive Index to the Measurement of Thickness Distributions of Dielectric Films

D. Keay and P. H. Lissberger
Appl. Opt. 6(4) 727-730 (1967)

Simultaneous determination of thickness and optical constants of polymer thin film by analyzing transmittance

Changsoo Jung and Bum Ku Rhee
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Optical weak measurement for the precise thickness determination of an ultra-thin film

Jing-Ru Zhao, Zhen-Jie Wu, Gui-Qiang Wang, Chun-Nan Wang, Bo-Fu Deng, and Shu-Qing Sun
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Optical Factors in the Photoemission of Thin Films

Edward G. Ramberg
Appl. Opt. 6(12) 2163-2170 (1967)