Abstract

Zone plate design and efficient methods for the fabrication of zone plates for extreme ultraviolet (EUV) and soft x-ray applications in a newly developed scanning reflection microscope are presented. Based on e-beam lithography, three types of transmission zone plates with focal lengths between 6 and 15 mm are reported: (i) phase-shifting zone plates made by 190 nm thick PMMA rings on Si3N4 membranes, (ii) absorbing zone plates made by 75 nm thick Au ring structures on Si3N4, and (iii) freestanding Au rings of 50 nm thickness and increased transmission in the EUV range. Experiments at the DELTA synchrotron facility reveal a minimum spot size and resulting spatial resolution of 9±3μm, which is the theoretical limit resulting from the synchrotron beam parameters at 60 eV photon energy. Images of a Ti/Si chessboard test pattern are recorded exploiting the energy dependence of the element-specific reflectance.

© 2019 Optical Society of America

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