In-line wavefront aberration adjustment of a projection lens for a lithographic tool using the dominant mode method

Zhiyong Yang; Xiuguo Chen; Hao Jiang; Shiyuan Liu

doi:10.1364/AO.58.004176

Applied Optics
Vol. 58,
Issue 15,
pp. 4176-4184
(2019)
•https://doi.org/10.1364/AO.58.004176

In-line wavefront aberration adjustment of a projection lens for a lithographic tool using the dominant mode method

Zhiyong Yang, Xiuguo Chen, Hao Jiang, and Shiyuan Liu

Not Accessible

Your library or personal account may give you access

Get PDF
Email
Share
Get Citation
Copy Citation Text
Zhiyong Yang, Xiuguo Chen, Hao Jiang, and Shiyuan Liu, "In-line wavefront aberration adjustment of a projection lens for a lithographic tool using the dominant mode method," Appl. Opt. 58, 4176-4184 (2019)

Export Citation
- BibTex
- Endnote (RIS)
- HTML
- Plain Text
Citation alert
Save article

Check for updates

Related Topics
Table of Contents Category
- Imaging Systems, Image Processing, and Displays
Optics & Photonics Topics
?

The topics in this list come from the Optics and Photonics Topics applied to this article.

About this Article
History
- Original Manuscript: February 1, 2019
- Revised Manuscript: April 29, 2019
- Manuscript Accepted: April 29, 2019
- Published: May 20, 2019

Abstract

Aberration adjustment is of great importance in the lithographic process of integrated circuit manufacturing due to the pressure variance, lens thermal effects, overlay correction, and 3D mask effects. With the objective of removing the crosstalk effect, as well as reducing computational complexity during in-line application, a dominant mode method is proposed to adjust the aberrations of the projection lens for a lithographic tool. Theoretical definitions and corresponding calculations of dominant modes are proposed to select the compensators of the projection lens and to build the control matrix for compensator settings. The proposed method is successfully applied in a practical aberration adjustment of the projection lens in a lithographic tool, and the results demonstrate its feasibility and performance.

Full Article | PDF Article

More Like This

Wavefront aberration measurement method for a hyper-NA lithographic projection lens based on principal component analysis of an aerial image

Boer Zhu, Xiangzhao Wang, Sikun Li, Guanyong Yan, Lina Shen, and Lifeng Duan
Appl. Opt. 55(12) 3192-3198 (2016)

Iterative method for in situ measurement of lens aberrations in lithographic tools using CTC-based quadratic aberration model

Shiyuan Liu, Shuang Xu, Xiaofei Wu, and Wei Liu
Opt. Express 20(13) 14272-14283 (2012)

Wavefront aberration compensation of projection lens using clocking lens elements

ChunLai Liu, Wei Huang, Zhenguang Shi, and Weicai Xu
Appl. Opt. 52(22) 5398-5401 (2013)

Previous Article Next Article

Cited By

You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription

Figures (10)

You do not have subscription access to this journal. Figure files are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription

Tables (3)

You do not have subscription access to this journal. Article tables are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription

Equations (14)

You do not have subscription access to this journal. Equations are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription

	Compensator	Setting Value
C1	Laser	Wavelength (pm)
C2	Reticle stage (object plane) position	Height (μm)
C3	Wafer stage (image plane) position
C4	No. 4 lens element
C5	No. 12 lens element
C6	No. 13 lens element
C7	No. 14 lens element
C8	No. 17 lens element

Dominant Mode	Optical Aberration	$Z D C$ Combination
$ϕ_{d 1}$	Defocus	$Z D_{4; 0, 0} = 1$
$ϕ_{d 2}$	0th-order spherical	$Z D_{9; 0, 0} = 1$
$ϕ_{d 3}$	Magnification	$Z D_{2; 1, 0} = 0.712$
$ϕ_{d 3}$	Magnification	$Z D_{3; 0, 1} = 0.288$
$ϕ_{d 4}$	1st-order coma	$Z D_{7; 1, 0} = 0.712$
$ϕ_{d 4}$	1st-order coma	$Z D_{8; 0, 1} = 0.288$
$ϕ_{d 5}$	3rd-order distortion	$Z D_{2; 3, 0} = 0.459$
		$Z D_{2; 1, 2} = 0.124$
		$Z D_{3; 0, 1} = - 0.105$
		$Z D_{3; 2, 1} = 0.311$
$ϕ_{d 6}$	Image plane deviation	$Z D_{4; 2, 0} = 0.284$
		$Z D_{5; 0, 0} = 0.115$
		$Z D_{5; 2, 0} = 0.270$
		$Z D_{6; 1, 1} = 0.330$

Optical Aberration	DMC	DMC Caused by Temperature Changes	DMC Caused by Pressure Changes
Defocus	$ϕ_{1}$	13.9756	−29.9493
0th-order spherical	$ϕ_{2}$	1.1692	−2.1038
Magnification	$ϕ_{3}$	10.0417	−10.1009
1st-order coma	$ϕ_{4}$	0.1296	−0.3274
3rd-order distortion	$ϕ_{5}$	0.1110	−0.1136
Image plane deviation	$ϕ_{6}$	–0.4147	0.2785

	Compensator	Setting Value
C1	Laser	Wavelength (pm)
C2	Reticle stage (object plane) position	Height (μm)
C3	Wafer stage (image plane) position
C4	No. 4 lens element
C5	No. 12 lens element
C6	No. 13 lens element
C7	No. 14 lens element
C8	No. 17 lens element

Dominant Mode	Optical Aberration	$Z D C$ Combination
$ϕ_{d 1}$	Defocus	$Z D_{4; 0, 0} = 1$
$ϕ_{d 2}$	0th-order spherical	$Z D_{9; 0, 0} = 1$
$ϕ_{d 3}$	Magnification	$Z D_{2; 1, 0} = 0.712$
$ϕ_{d 3}$	Magnification	$Z D_{3; 0, 1} = 0.288$
$ϕ_{d 4}$	1st-order coma	$Z D_{7; 1, 0} = 0.712$
$ϕ_{d 4}$	1st-order coma	$Z D_{8; 0, 1} = 0.288$
$ϕ_{d 5}$	3rd-order distortion	$Z D_{2; 3, 0} = 0.459$
		$Z D_{2; 1, 2} = 0.124$
		$Z D_{3; 0, 1} = - 0.105$
		$Z D_{3; 2, 1} = 0.311$
$ϕ_{d 6}$	Image plane deviation	$Z D_{4; 2, 0} = 0.284$
		$Z D_{5; 0, 0} = 0.115$
		$Z D_{5; 2, 0} = 0.270$
		$Z D_{6; 1, 1} = 0.330$

Abstract

Cited By

Figures (10)

Tables (3)

Equations (14)

Applied Optics