Non-contact XUV metrology of Ru/B<sub>4</sub>C multilayer optics by means of Hartmann wavefront analysis

Mabel Ruiz-Lopez; Hugo Dacasa; Benoit Mahieu; Magali Lozano; Lu Li; Philippe Zeitoun; Davide Bleiner

doi:10.1364/AO.57.001315

Applied Optics
Vol. 57,
Issue 6,
pp. 1315-1320
(2018)
•https://doi.org/10.1364/AO.57.001315

Non-contact XUV metrology of Ru/B₄C multilayer optics by means of Hartmann wavefront analysis

Mabel Ruiz-Lopez, Hugo Dacasa, Benoit Mahieu, Magali Lozano, Lu Li, Philippe Zeitoun, and Davide Bleiner

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Mabel Ruiz-Lopez, Hugo Dacasa, Benoit Mahieu, Magali Lozano, Lu Li, Philippe Zeitoun, and Davide Bleiner, "Non-contact XUV metrology of Ru/B₄C multilayer optics by means of Hartmann wavefront analysis," Appl. Opt. 57, 1315-1320 (2018)

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Table of Contents Category
- Instrumentation, Measurement, and Metrology
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About this Article
History
- Original Manuscript: December 12, 2017
- Revised Manuscript: January 19, 2018
- Manuscript Accepted: January 19, 2018
- Published: February 14, 2018

Abstract

Short-wavelength imaging, spectroscopy, and lithography scale down the characteristic length-scale to nanometers. This poses tight constraints on the optics finishing tolerances, which is often difficult to characterize. Indeed, even a tiny surface defect degrades the reflectivity and spatial projection of such optics. In this study, we demonstrate experimentally that a Hartmann wavefront sensor for extreme ultraviolet (XUV) wavelengths is an effective non-contact analytical method for inspecting the surface of multilayer optics. The experiment was carried out in a tabletop laboratory using a high-order harmonic generation as an XUV source. The wavefront sensor was used to measure the wavefront errors after the reflection of the XUV beam on a spherical $Ru / B_{4} C$ multilayer mirror, scanning a large surface of approximately 40 mm in diameter. The results showed that the technique detects the aberrations in the nanometer range.

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Parameters	AFM [18]	Interferometry Techniques [17,19]
Resolution	0.25 nm	$< 1 nm$
Range	μ-scale	mm-scale
Advantage	Observation in atmospheric conditions	Possibility to measure wide fields-of-view and different shapes
Disadvantage	Inability to measure large samples	Only at large facilities (FEL or synchrotron)

Mode	Polynomial	Type of Aberration
1	$ρ \cos θ$	Tilt (Horizontal)
2	$ρ \sin θ$	Tilt (Vertical)
3	$2 ρ^{2} - 1$	Defocus (Piston)
4	$ρ^{2} \cos (2 θ)$	Astigmatism at 0°
5	$ρ^{2} \sin (2 θ)$	Astigmatism at 45°
6	$(3 ρ^{2} - 2) \cos (2 θ)$	Coma at 0°
7	$(3 ρ^{2} - 2) \sin (2 θ)$	Coma at 45°
8	$6 ρ^{4} - 6 ρ^{2} + 1$	Third order spherical aberration

Parameters	Value
Radius of curvature	100 mm
Diameter	$(38.1 \pm 0.1) mm$
Diameter	Internal hole: $(17.01 \pm 0.1) mm$
Thickness	$(8.00 \pm 0.1) mm$
Reflectivity at 12 nm	(50–55)%

Parameters	AFM [18]	Interferometry Techniques [17,19]
Resolution	0.25 nm	$< 1 nm$
Range	μ-scale	mm-scale
Advantage	Observation in atmospheric conditions	Possibility to measure wide fields-of-view and different shapes
Disadvantage	Inability to measure large samples	Only at large facilities (FEL or synchrotron)

Mode	Polynomial	Type of Aberration
1	$ρ \cos θ$	Tilt (Horizontal)
2	$ρ \sin θ$	Tilt (Vertical)
3	$2 ρ^{2} - 1$	Defocus (Piston)
4	$ρ^{2} \cos (2 θ)$	Astigmatism at 0°
5	$ρ^{2} \sin (2 θ)$	Astigmatism at 45°
6	$(3 ρ^{2} - 2) \cos (2 θ)$	Coma at 0°
7	$(3 ρ^{2} - 2) \sin (2 θ)$	Coma at 45°
8	$6 ρ^{4} - 6 ρ^{2} + 1$	Third order spherical aberration

Abstract

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Tables (3)

Equations (1)

Applied Optics