Abstract

An ion beam with high removal rate and small diameter is expected in ion beam figuring. For an ion beam figuring tool, reducing the extraction grid opening is a feasible method to decrease the ion beam diameter, but the ion beam removal rate decreases at the same time. The ion beam removal rate depends much on the ion density in the ion source discharge room. The plasma in a hollow cathode (HC) ion source and a radio frequency (RF) ion source was simulated. The simulations suggested that the ion density in the RF ion source is higher than that of the HC one. Then, a RF ion source with an integrative matching network was developed and tested in this paper, where the ion beam removal rate reached up to 193 nm/min for 10 mm opening extraction grids.

© 2017 Optical Society of America

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