Abstract

To improve the quality of grating masks made by scanning beam interference lithography, this article established a mathematical model of step-scanning exposure and analyzed the effects of the beam drift error on the interference image. Beam angle drift can be decomposed into the drift error δx in the exposure plane (XOZ plane) and the drift error δy perpendicular to the plane. Analysis shows that the δx has a major impact on the interference fringes during exposure, which may affect the precision of phase lock. δy leads to the appearance of deflected interference strips and affects the exposure dose. When a low-frequency drift error appears in the light path, the exposure contrast on the photoresist will decrease with the exposure process, which makes the fabrication of large-size diffraction gratings difficult. Furthermore, taking advantage of the characteristics of a scanning beam interference lithography system, an exposed beam stable system was designed that can effectively suppress the low-frequency drift of the beam. The total beam angle control accuracy is better than the 2.7 μrad, and position control accuracy is better than 3.9 μm (both for 1σ), which achieves the expected goal of the design.

© 2017 Optical Society of America

Full Article  |  PDF Article
More Like This
Scan angle error measurement based on phase-stepping algorithms in scanning beam interference lithography

Minkang Li, Xiansong Xiang, Changhe Zhou, and Chunlong Wei
Appl. Opt. 58(10) 2641-2649 (2019)

Method for exposure dose monitoring and control in scanning beam interference lithography

Ying Song, Yujuan Liu, Shan Jiang, Yang Zhu, Liu Zhang, and Zhaowu Liu
Appl. Opt. 60(10) 2767-2774 (2021)

Active control technology of a diffraction grating wavefront by scanning beam interference lithography

Zhaowu Liu, Hang Yang, Yubo Li, Shan Jiang, Wei Wang, Ying Song, Bayanheshig, and Wenhao Li
Opt. Express 29(23) 37066-37074 (2021)

References

You do not have subscription access to this journal. Citation lists with outbound citation links are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription

Cited By

You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription

Figures (15)

You do not have subscription access to this journal. Figure files are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription

Equations (15)

You do not have subscription access to this journal. Equations are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription

Metrics