Machined immersion grating with theoretically predicted diffraction efficiency

Yuji Ikeda; Naoto Kobayashi; Yuki Sarugaku; Takashi Sukegawa; Shigeru Sugiyama; Sayumi Kaji; Kenshi Nakanishi; Sohei Kondo; Chikako Yasui; Hirokazu Kataza; Takao Nakagawa; Hideyo Kawakita

doi:10.1364/AO.54.005193

Applied Optics
Vol. 54,
Issue 16,
pp. 5193-5202
(2015)
•https://doi.org/10.1364/AO.54.005193

Machined immersion grating with theoretically predicted diffraction efficiency

Yuji Ikeda, Naoto Kobayashi, Yuki Sarugaku, Takashi Sukegawa, Shigeru Sugiyama, Sayumi Kaji, Kenshi Nakanishi, Sohei Kondo, Chikako Yasui, Hirokazu Kataza, Takao Nakagawa, and Hideyo Kawakita

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Yuji Ikeda, Naoto Kobayashi, Yuki Sarugaku, Takashi Sukegawa, Shigeru Sugiyama, Sayumi Kaji, Kenshi Nakanishi, Sohei Kondo, Chikako Yasui, Hirokazu Kataza, Takao Nakagawa, and Hideyo Kawakita, "Machined immersion grating with theoretically predicted diffraction efficiency," Appl. Opt. 54, 5193-5202 (2015)

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Abstract

An immersion grating composed of a transmissive material with a high refractive index ( $n > 2$ ) is a powerful device for high-resolution spectroscopy in the infrared region. Although the original idea is attributed to Fraunhofer about 200 years ago, an immersion grating with high diffraction efficiency has never been realized due to the difficulty in processing infrared crystals that are mostly brittle. While anisotropic etching is one successful method for fabricating a fine groove pattern on Si crystal, machining is necessary for realizing the ideal groove shape on any kind of infrared crystal. In this paper, we report the realization of the first, to the best of our knowledge, machined immersion grating made of single-crystal CdZnTe with a high diffraction efficiency that is almost identical to that theoretically predicted by rigorous coupled-wave analysis.

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Materials	Crystalline Type	Usable Wavelength (μm)^a	Index	Homogeneity	Ingot Size ( ${mm}^{3}$ )^b	Hardness ( $kg {mm}^{- 2}$ )^c
CVD-ZnS	poly-	1.4–9.4	2.2	$< 10^{- 6}$	$ϕ 300 \times H 50$	160
CVD-ZnSe	poly-	1.4–14	2.4	$< 10^{- 6}$	$ϕ 300 \times H 50$	105
CdTe or CZT	single-	5.0–20	2.7	$< 10^{- 5}$	$ϕ 150 \times H 50$	56
InP	single-	1.4–9.0	3.2	−	$ϕ 100 \times H 30$	460
GaAs	single-	1.3–10	3.4	−	$ϕ 50 \times H 100$	721
Si	single-	1.2–6.9	3.4	$< 10^{- 6}$	$> ϕ 200 \times H 100$	1100
Ge	single-	2.0–11	4.0	−	$> ϕ 200 \times H 100$	800

Items	Parameters
Material	Single-crystal CdZnTe ( $n = 2.7$ )
Blaze angle	75°
Apex angle	89°
Groove pitch	144.78 μm
Tilt angle of entrance/exit surface	2°
Area of entrance/exit surface	$22.2 mm \times 22.2 mm$
Area of diffraction surface	$21.5 mm \times 77.3 mm$

Items	Typical Requirements	Performances
Surface irregularity	$< 126 nm$ (PV)^a	$< 40 nm$ (PV)
Scattered energy loss	$< 1 %$	$< 0.07 %$ at 5 μm
Ghost intensity	$< 0.01 %$	$< 0.0026 %$ at 5 μm
Rel. diffraction efficiency	$> 70 %$	81.6% at 1.56 μm
Spectral resolution	$> 100, 000$	262,000 at 1.55 μm

Materials	Crystalline Type	Usable Wavelength (μm)^a	Index	Homogeneity	Ingot Size ( ${mm}^{3}$ )^b	Hardness ( $kg {mm}^{- 2}$ )^c
CVD-ZnS	poly-	1.4–9.4	2.2	$< 10^{- 6}$	$ϕ 300 \times H 50$	160
CVD-ZnSe	poly-	1.4–14	2.4	$< 10^{- 6}$	$ϕ 300 \times H 50$	105
CdTe or CZT	single-	5.0–20	2.7	$< 10^{- 5}$	$ϕ 150 \times H 50$	56
InP	single-	1.4–9.0	3.2	−	$ϕ 100 \times H 30$	460
GaAs	single-	1.3–10	3.4	−	$ϕ 50 \times H 100$	721
Si	single-	1.2–6.9	3.4	$< 10^{- 6}$	$> ϕ 200 \times H 100$	1100
Ge	single-	2.0–11	4.0	−	$> ϕ 200 \times H 100$	800

Items	Parameters
Material	Single-crystal CdZnTe ( $n = 2.7$ )
Blaze angle	75°
Apex angle	89°
Groove pitch	144.78 μm
Tilt angle of entrance/exit surface	2°
Area of entrance/exit surface	$22.2 mm \times 22.2 mm$
Area of diffraction surface	$21.5 mm \times 77.3 mm$

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Applied Optics