Abstract

High harmonic generation sources have made great progress over the past decade and now readily support applications in the extreme ultraviolet (EUV) regime and beyond. In many applications, the keys to the utility of these sources are multilayer components such as mirrors and beam splitters. Here we present recent results in the development and fabrication of such components in the EUV regime, including line-narrowing mirrors achieving bandwidths (λ/Δλ) of 175, single and multiple harmonic-selecting multilayers with reflectances of greater than 40% in the 13 nm range, and ultralow stress membrane beam splitters enabling direct EUV pulse energy monitoring.

© 2015 Optical Society of America

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