T. Germer, H. Patrick, R. Silver, and B. Bunday, “Developing an uncertainty analysis for optical scatterometry,” Proc. SPIE 7272, 72720T (2009).

[CrossRef]

J. Garnaes, P. E. Hansen, N. Agersnap, J. Holm, F. Borsetto, and A. Kühle, “Profiles of a high-aspect-ratio grating determined by spectroscopic scatterometry and atomic-force microscopy,” Appl. Opt. 45, 3201–3212 (2006).

[CrossRef]

T. Novikova, A. De Martino, S. B. Hatit, and B. Drévillon, “Application of Mueller polarimetry in conical diffraction for critical dimension measurements in microelectronics,” Appl. Opt. 45, 3688–3697 (2006).

[CrossRef]

P. Boher, J. Petit, T. Leroux, J. Foucher, Y. Desières, J. Hazart, and P. Chaton, “Optical Fourier transform scatterometry for LER and LWR metrology,” Proc. SPIE 5752, 192–203 (2005).

[CrossRef]

X. Niu, N. Jakatdar, J. Bao, and C. J. Spanos, “Specular spectroscopic scatterometry,” IEEE Trans. Semicond. Manuf. 14, 97–111 (2001).

[CrossRef]

J. S. Villarrubia, “Algorithms for scanned probe microscope image simulation, surface reconstruction, and tip estimation,” J. Res. Natl. Inst. Stand. Technol. 102, 425–454 (1997).

[CrossRef]

M. G. Moharam, E. B. Grann, D. A. Pommet, and T. K. Gaylord, “Formulation for stable and efficient implementation of the rigorous coupled-wave analysis of binary gratings,” J. Opt. Soc. Am. A 12, 1068–1076 (1995).

[CrossRef]

C. J. Raymond, M. R. Murnane, S. S. H. Naqvi, and J. R. McNeil, “Metrology of subwavelength photoresist gratings using optical scatterometry,” J. Vac. Sci. Technol. B 13, 1484–1495 (1995).

[CrossRef]

A. D. Rakić, “Algorithm for the determination of intrinsic optical constants of metal films: application to aluminum,” Appl. Opt. 34, 4755–4767 (1995).

[CrossRef]

J. Ganguly, R. N. Bhattacharya, and S. Chakraborty, “Convolution effect in the determination of compositional profiles and diffusion coefficients by microprobe step scans,” Am. Mineral. 73, 901–909 (1988).

J. Chandezon, D. Maystre, and G. Raoult, “A new theoretical method for diffraction gratings and its numerical application,” J. Opt. 11, 235–241 (1980).

[CrossRef]

Y. Aoyagi and S. Namba, “Blazed ion-etched holographic gratings,” Opt. Acta 23, 701–707 (1976).

[CrossRef]

S. T. Peng, T. Tamir, and H. L. Bertoni, “Theory of periodic dielectric waveguides,” IEEE Trans. Microw. Theory Tech. 23, 123–133 (1975).

[CrossRef]

D. W. Marquardt, “An algorithm for the least-squares estimation of nonlinear parameters,” SIAM J. Appl. Math. 11, 431–441 (1963).

[CrossRef]

K. Levenberg, “A method for the solution of certain non-linear problems in least squares,” Q. Appl. Math. 2, 164–168 (1944).

Y. Aoyagi and S. Namba, “Blazed ion-etched holographic gratings,” Opt. Acta 23, 701–707 (1976).

[CrossRef]

X. Niu, N. Jakatdar, J. Bao, and C. J. Spanos, “Specular spectroscopic scatterometry,” IEEE Trans. Semicond. Manuf. 14, 97–111 (2001).

[CrossRef]

M. Bass, C. M. DeCusatis, J. M. Enoch, V. Lakshminarayanan, G. Li, C. MacDonald, V. N. Mahajan, and E. Van Stryland, Handbook of Optics, 3rd ed. (McGraw-Hill, 2009), Vol. IV.

S. T. Peng, T. Tamir, and H. L. Bertoni, “Theory of periodic dielectric waveguides,” IEEE Trans. Microw. Theory Tech. 23, 123–133 (1975).

[CrossRef]

J. Ganguly, R. N. Bhattacharya, and S. Chakraborty, “Convolution effect in the determination of compositional profiles and diffusion coefficients by microprobe step scans,” Am. Mineral. 73, 901–909 (1988).

P. Boher, J. Petit, T. Leroux, J. Foucher, Y. Desières, J. Hazart, and P. Chaton, “Optical Fourier transform scatterometry for LER and LWR metrology,” Proc. SPIE 5752, 192–203 (2005).

[CrossRef]

T. Germer, H. Patrick, R. Silver, and B. Bunday, “Developing an uncertainty analysis for optical scatterometry,” Proc. SPIE 7272, 72720T (2009).

[CrossRef]

J. Ganguly, R. N. Bhattacharya, and S. Chakraborty, “Convolution effect in the determination of compositional profiles and diffusion coefficients by microprobe step scans,” Am. Mineral. 73, 901–909 (1988).

L. Li, J. Chandezon, G. Granet, and J. P. Plumey, “Rigorous and efficient grating-analysis method made easy for optical engineers,” Appl. Opt. 38, 304–313 (1999).

[CrossRef]

J. Chandezon, D. Maystre, and G. Raoult, “A new theoretical method for diffraction gratings and its numerical application,” J. Opt. 11, 235–241 (1980).

[CrossRef]

P. Boher, J. Petit, T. Leroux, J. Foucher, Y. Desières, J. Hazart, and P. Chaton, “Optical Fourier transform scatterometry for LER and LWR metrology,” Proc. SPIE 5752, 192–203 (2005).

[CrossRef]

E. W. Cheney and D. R. Kincaid, Numerical Mathematics and Computing (Brooks/Cole, 2012).

M. Bass, C. M. DeCusatis, J. M. Enoch, V. Lakshminarayanan, G. Li, C. MacDonald, V. N. Mahajan, and E. Van Stryland, Handbook of Optics, 3rd ed. (McGraw-Hill, 2009), Vol. IV.

P. Boher, J. Petit, T. Leroux, J. Foucher, Y. Desières, J. Hazart, and P. Chaton, “Optical Fourier transform scatterometry for LER and LWR metrology,” Proc. SPIE 5752, 192–203 (2005).

[CrossRef]

M. Bass, C. M. DeCusatis, J. M. Enoch, V. Lakshminarayanan, G. Li, C. MacDonald, V. N. Mahajan, and E. Van Stryland, Handbook of Optics, 3rd ed. (McGraw-Hill, 2009), Vol. IV.

P. Boher, J. Petit, T. Leroux, J. Foucher, Y. Desières, J. Hazart, and P. Chaton, “Optical Fourier transform scatterometry for LER and LWR metrology,” Proc. SPIE 5752, 192–203 (2005).

[CrossRef]

J. Ganguly, R. N. Bhattacharya, and S. Chakraborty, “Convolution effect in the determination of compositional profiles and diffusion coefficients by microprobe step scans,” Am. Mineral. 73, 901–909 (1988).

T. Germer, H. Patrick, R. Silver, and B. Bunday, “Developing an uncertainty analysis for optical scatterometry,” Proc. SPIE 7272, 72720T (2009).

[CrossRef]

P. Boher, J. Petit, T. Leroux, J. Foucher, Y. Desières, J. Hazart, and P. Chaton, “Optical Fourier transform scatterometry for LER and LWR metrology,” Proc. SPIE 5752, 192–203 (2005).

[CrossRef]

M. C. Hutley, Diffraction Gratings (Academic, 1982).

X. Niu, N. Jakatdar, J. Bao, and C. J. Spanos, “Specular spectroscopic scatterometry,” IEEE Trans. Semicond. Manuf. 14, 97–111 (2001).

[CrossRef]

E. W. Cheney and D. R. Kincaid, Numerical Mathematics and Computing (Brooks/Cole, 2012).

M. Bass, C. M. DeCusatis, J. M. Enoch, V. Lakshminarayanan, G. Li, C. MacDonald, V. N. Mahajan, and E. Van Stryland, Handbook of Optics, 3rd ed. (McGraw-Hill, 2009), Vol. IV.

P. Boher, J. Petit, T. Leroux, J. Foucher, Y. Desières, J. Hazart, and P. Chaton, “Optical Fourier transform scatterometry for LER and LWR metrology,” Proc. SPIE 5752, 192–203 (2005).

[CrossRef]

K. Levenberg, “A method for the solution of certain non-linear problems in least squares,” Q. Appl. Math. 2, 164–168 (1944).

M. Bass, C. M. DeCusatis, J. M. Enoch, V. Lakshminarayanan, G. Li, C. MacDonald, V. N. Mahajan, and E. Van Stryland, Handbook of Optics, 3rd ed. (McGraw-Hill, 2009), Vol. IV.

M. Bass, C. M. DeCusatis, J. M. Enoch, V. Lakshminarayanan, G. Li, C. MacDonald, V. N. Mahajan, and E. Van Stryland, Handbook of Optics, 3rd ed. (McGraw-Hill, 2009), Vol. IV.

M. Bass, C. M. DeCusatis, J. M. Enoch, V. Lakshminarayanan, G. Li, C. MacDonald, V. N. Mahajan, and E. Van Stryland, Handbook of Optics, 3rd ed. (McGraw-Hill, 2009), Vol. IV.

D. W. Marquardt, “An algorithm for the least-squares estimation of nonlinear parameters,” SIAM J. Appl. Math. 11, 431–441 (1963).

[CrossRef]

J. Chandezon, D. Maystre, and G. Raoult, “A new theoretical method for diffraction gratings and its numerical application,” J. Opt. 11, 235–241 (1980).

[CrossRef]

B. K. Minhas, S. A. Coulombe, S. S. H. Naqvi, and J. R. McNeil, “Ellipsometric scatterometry for the metrology of sub-0.1-μm-linewidth structures,” Appl. Opt. 37, 5112–5115 (1998).

[CrossRef]

C. J. Raymond, M. R. Murnane, S. S. H. Naqvi, and J. R. McNeil, “Metrology of subwavelength photoresist gratings using optical scatterometry,” J. Vac. Sci. Technol. B 13, 1484–1495 (1995).

[CrossRef]

S. S. H. Naqvi, S. Gaspar, K. Hickman, K. Bishop, and J. R. McNeil, “Linewidth measurement of gratings on photomasks: a simple technique,” Appl. Opt. 31, 1377–1384 (1992).

[CrossRef]

C. J. Raymond, M. R. Murnane, S. S. H. Naqvi, and J. R. McNeil, “Metrology of subwavelength photoresist gratings using optical scatterometry,” J. Vac. Sci. Technol. B 13, 1484–1495 (1995).

[CrossRef]

Y. Aoyagi and S. Namba, “Blazed ion-etched holographic gratings,” Opt. Acta 23, 701–707 (1976).

[CrossRef]

B. K. Minhas, S. A. Coulombe, S. S. H. Naqvi, and J. R. McNeil, “Ellipsometric scatterometry for the metrology of sub-0.1-μm-linewidth structures,” Appl. Opt. 37, 5112–5115 (1998).

[CrossRef]

C. J. Raymond, M. R. Murnane, S. S. H. Naqvi, and J. R. McNeil, “Metrology of subwavelength photoresist gratings using optical scatterometry,” J. Vac. Sci. Technol. B 13, 1484–1495 (1995).

[CrossRef]

S. S. H. Naqvi, S. Gaspar, K. Hickman, K. Bishop, and J. R. McNeil, “Linewidth measurement of gratings on photomasks: a simple technique,” Appl. Opt. 31, 1377–1384 (1992).

[CrossRef]

P. Vincent and M. Nevière, “The reciprocity theorem for corrugated surfaces used in conical diffraction mountings,” Opt. Acta 26, 889–898 (1979).

[CrossRef]

X. Niu, N. Jakatdar, J. Bao, and C. J. Spanos, “Specular spectroscopic scatterometry,” IEEE Trans. Semicond. Manuf. 14, 97–111 (2001).

[CrossRef]

T. Germer, H. Patrick, R. Silver, and B. Bunday, “Developing an uncertainty analysis for optical scatterometry,” Proc. SPIE 7272, 72720T (2009).

[CrossRef]

S. T. Peng, T. Tamir, and H. L. Bertoni, “Theory of periodic dielectric waveguides,” IEEE Trans. Microw. Theory Tech. 23, 123–133 (1975).

[CrossRef]

P. Boher, J. Petit, T. Leroux, J. Foucher, Y. Desières, J. Hazart, and P. Chaton, “Optical Fourier transform scatterometry for LER and LWR metrology,” Proc. SPIE 5752, 192–203 (2005).

[CrossRef]

J. Chandezon, D. Maystre, and G. Raoult, “A new theoretical method for diffraction gratings and its numerical application,” J. Opt. 11, 235–241 (1980).

[CrossRef]

C. J. Raymond, M. R. Murnane, S. S. H. Naqvi, and J. R. McNeil, “Metrology of subwavelength photoresist gratings using optical scatterometry,” J. Vac. Sci. Technol. B 13, 1484–1495 (1995).

[CrossRef]

C. J. Raymond, “Scatterometry for semiconductor metrology,” in Handbook of Silicon Semiconductor Metrology, A. C. Diebold, ed. (Marcel Dekker, 2001), pp. 477–514.

T. Germer, H. Patrick, R. Silver, and B. Bunday, “Developing an uncertainty analysis for optical scatterometry,” Proc. SPIE 7272, 72720T (2009).

[CrossRef]

X. Niu, N. Jakatdar, J. Bao, and C. J. Spanos, “Specular spectroscopic scatterometry,” IEEE Trans. Semicond. Manuf. 14, 97–111 (2001).

[CrossRef]

S. T. Peng, T. Tamir, and H. L. Bertoni, “Theory of periodic dielectric waveguides,” IEEE Trans. Microw. Theory Tech. 23, 123–133 (1975).

[CrossRef]

M. Bass, C. M. DeCusatis, J. M. Enoch, V. Lakshminarayanan, G. Li, C. MacDonald, V. N. Mahajan, and E. Van Stryland, Handbook of Optics, 3rd ed. (McGraw-Hill, 2009), Vol. IV.

J. S. Villarrubia, “Algorithms for scanned probe microscope image simulation, surface reconstruction, and tip estimation,” J. Res. Natl. Inst. Stand. Technol. 102, 425–454 (1997).

[CrossRef]

P. Vincent and M. Nevière, “The reciprocity theorem for corrugated surfaces used in conical diffraction mountings,” Opt. Acta 26, 889–898 (1979).

[CrossRef]

J. Ganguly, R. N. Bhattacharya, and S. Chakraborty, “Convolution effect in the determination of compositional profiles and diffusion coefficients by microprobe step scans,” Am. Mineral. 73, 901–909 (1988).

S. S. H. Naqvi, S. Gaspar, K. Hickman, K. Bishop, and J. R. McNeil, “Linewidth measurement of gratings on photomasks: a simple technique,” Appl. Opt. 31, 1377–1384 (1992).

[CrossRef]

B. K. Minhas, S. A. Coulombe, S. S. H. Naqvi, and J. R. McNeil, “Ellipsometric scatterometry for the metrology of sub-0.1-μm-linewidth structures,” Appl. Opt. 37, 5112–5115 (1998).

[CrossRef]

A. D. Rakić, “Algorithm for the determination of intrinsic optical constants of metal films: application to aluminum,” Appl. Opt. 34, 4755–4767 (1995).

[CrossRef]

L. Li, J. Chandezon, G. Granet, and J. P. Plumey, “Rigorous and efficient grating-analysis method made easy for optical engineers,” Appl. Opt. 38, 304–313 (1999).

[CrossRef]

J. Garnaes, P. E. Hansen, N. Agersnap, J. Holm, F. Borsetto, and A. Kühle, “Profiles of a high-aspect-ratio grating determined by spectroscopic scatterometry and atomic-force microscopy,” Appl. Opt. 45, 3201–3212 (2006).

[CrossRef]

T. Novikova, A. De Martino, S. B. Hatit, and B. Drévillon, “Application of Mueller polarimetry in conical diffraction for critical dimension measurements in microelectronics,” Appl. Opt. 45, 3688–3697 (2006).

[CrossRef]

L. F. Johnson, “Evolution of grating profiles under ion-beam erosion,” Appl. Opt. 18, 2559–2574 (1979).

[CrossRef]

M. J. Dodge, “Refractive properties of magnesium fluoride,” Appl. Opt. 23, 1980–1985 (1984).

[CrossRef]

S. T. Peng, T. Tamir, and H. L. Bertoni, “Theory of periodic dielectric waveguides,” IEEE Trans. Microw. Theory Tech. 23, 123–133 (1975).

[CrossRef]

X. Niu, N. Jakatdar, J. Bao, and C. J. Spanos, “Specular spectroscopic scatterometry,” IEEE Trans. Semicond. Manuf. 14, 97–111 (2001).

[CrossRef]

J. Chandezon, D. Maystre, and G. Raoult, “A new theoretical method for diffraction gratings and its numerical application,” J. Opt. 11, 235–241 (1980).

[CrossRef]

M. G. Moharam, E. B. Grann, D. A. Pommet, and T. K. Gaylord, “Formulation for stable and efficient implementation of the rigorous coupled-wave analysis of binary gratings,” J. Opt. Soc. Am. A 12, 1068–1076 (1995).

[CrossRef]

Ph. Lalanne and G. M. Morris, “Highly improved convergence of the coupled-wave method for TM polarization,” J. Opt. Soc. Am. A 13, 779–784 (1996).

[CrossRef]

G. Granet and B. Guizal, “Efficient implementation of the coupled-wave method for metallic lamellar gratings in TM polarization,” J. Opt. Soc. Am. A 13, 1019–1023 (1996).

[CrossRef]

L. Li, “Use of Fourier series in the analysis of discontinuous periodic structures,” J. Opt. Soc. Am. A 13, 1870–1876 (1996).

[CrossRef]

J. S. Villarrubia, “Algorithms for scanned probe microscope image simulation, surface reconstruction, and tip estimation,” J. Res. Natl. Inst. Stand. Technol. 102, 425–454 (1997).

[CrossRef]

C. J. Raymond, M. R. Murnane, S. S. H. Naqvi, and J. R. McNeil, “Metrology of subwavelength photoresist gratings using optical scatterometry,” J. Vac. Sci. Technol. B 13, 1484–1495 (1995).

[CrossRef]

Y. Aoyagi and S. Namba, “Blazed ion-etched holographic gratings,” Opt. Acta 23, 701–707 (1976).

[CrossRef]

P. Vincent and M. Nevière, “The reciprocity theorem for corrugated surfaces used in conical diffraction mountings,” Opt. Acta 26, 889–898 (1979).

[CrossRef]

P. Boher, J. Petit, T. Leroux, J. Foucher, Y. Desières, J. Hazart, and P. Chaton, “Optical Fourier transform scatterometry for LER and LWR metrology,” Proc. SPIE 5752, 192–203 (2005).

[CrossRef]

T. Germer, H. Patrick, R. Silver, and B. Bunday, “Developing an uncertainty analysis for optical scatterometry,” Proc. SPIE 7272, 72720T (2009).

[CrossRef]

K. Levenberg, “A method for the solution of certain non-linear problems in least squares,” Q. Appl. Math. 2, 164–168 (1944).

D. W. Marquardt, “An algorithm for the least-squares estimation of nonlinear parameters,” SIAM J. Appl. Math. 11, 431–441 (1963).

[CrossRef]

E. W. Cheney and D. R. Kincaid, Numerical Mathematics and Computing (Brooks/Cole, 2012).

M. Bass, C. M. DeCusatis, J. M. Enoch, V. Lakshminarayanan, G. Li, C. MacDonald, V. N. Mahajan, and E. Van Stryland, Handbook of Optics, 3rd ed. (McGraw-Hill, 2009), Vol. IV.

C. J. Raymond, “Scatterometry for semiconductor metrology,” in Handbook of Silicon Semiconductor Metrology, A. C. Diebold, ed. (Marcel Dekker, 2001), pp. 477–514.

M. C. Hutley, Diffraction Gratings (Academic, 1982).