Abstract

Ion beam sputtering of AlF3, LaF3, and GdF3 as single layers, AR coatings, and HR coatings for 193 nm is presented. The resulting optical properties, such as reflectance/transmittance and optical constants, and material properties, such as surface roughness and film durability, are discussed. The low temperature of the process allows for both CaF2 and fused silica substrates to be used with the same optical results.

© 2014 Optical Society of America

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References

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  1. T. Yoshida, K. Nishimoto, K. Sekine, and K. Etoh, “Fluoride antireflection coatings for deep ultraviolet optics deposited by ion-beam sputtering,” Appl. Opt. 45, 1375–1379 (2006).
    [CrossRef]
  2. D. Ristau, S. Gunster, S. Bosch, A. Duparre, E. Masetti, J. Ferre-Borrull, G. Kiriakidis, F. Peiro, E. Quesnel, and A. Tikhonravov, “Ultraviolet optical and microstructural properties of MgF2 and LaF3 coatings deposited by ion-beam sputtering and boat and electron-beam evaporation,” Appl. Opt. 41, 3196–3204 (2002).
    [CrossRef]
  3. B.-H. Liao, M.-C. Liu, and C.-C. Lee, “Process for deposition of AlF3 thin films,” Appl. Opt. 47, C-41–C-45 (2008).
    [CrossRef]

2008 (1)

B.-H. Liao, M.-C. Liu, and C.-C. Lee, “Process for deposition of AlF3 thin films,” Appl. Opt. 47, C-41–C-45 (2008).
[CrossRef]

2006 (1)

2002 (1)

Bosch, S.

Duparre, A.

Etoh, K.

Ferre-Borrull, J.

Gunster, S.

Kiriakidis, G.

Lee, C.-C.

B.-H. Liao, M.-C. Liu, and C.-C. Lee, “Process for deposition of AlF3 thin films,” Appl. Opt. 47, C-41–C-45 (2008).
[CrossRef]

Liao, B.-H.

B.-H. Liao, M.-C. Liu, and C.-C. Lee, “Process for deposition of AlF3 thin films,” Appl. Opt. 47, C-41–C-45 (2008).
[CrossRef]

Liu, M.-C.

B.-H. Liao, M.-C. Liu, and C.-C. Lee, “Process for deposition of AlF3 thin films,” Appl. Opt. 47, C-41–C-45 (2008).
[CrossRef]

Masetti, E.

Nishimoto, K.

Peiro, F.

Quesnel, E.

Ristau, D.

Sekine, K.

Tikhonravov, A.

Yoshida, T.

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Figures (4)

Fig. 1.
Fig. 1.

Transmittance data of single layer GdF3 (left, solid line), AlF3 (center, solid line), LaF3 (right, solid line), and uncoated substrates (dashed line).

Fig. 2.
Fig. 2.

Transmittance data of AR coating on both side of fused silica, LaF3/AlF3 (left) and GdF3/AlF3 (right).

Fig. 3.
Fig. 3.

Transmittance and reflectance data of GdF3/AlF3 HR coating. The two solid lines are reflectance on fused silica and CaF2 substrates. The dashed line is transmittance on fused silica, and the dotted line is transmittance on CaF2.

Fig. 4.
Fig. 4.

AFM images of coated surfaces on fused silica substrates.

Tables (2)

Tables Icon

Table 1. Single Layer Results

Tables Icon

Table 2. Surface Roughness (before and after Coating)

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