Abstract

The possibility of enhanced mirrors for laser megajoule reflectors has been studied, and preliminary samples have been realized with magnetron sputtering technology. Spectral measurements of improved reflectivity and cosmetics analysis are presented.

© 2014 Optical Society of America

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References

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  1. F. Sabary, V. Griveau, C. Marcel, and D. Marteau, “Electrochemical impedance spectroscopy studies of protected silver reflectors deposited by magnetron sputtering,” in Proceedings of 48th Annual Technical Conference Proceedings (2005), pp. 386–389.
  2. G. Chauveau, D. Torricini, C. Grèzes-Besset, D. Stojcevski, and M. Lequime, “PACA2M: magnetron sputtering for 2-meter optics,” Proc. SPIE 8168, 81680P (2011).
    [CrossRef]
  3. I. Safi, “Recent aspects concerning DC reactive magnetron sputtering on thin film: a review,” Surf. Coat. Technol. 127, 203–219 (2000).
    [CrossRef]
  4. D. Stojcevski, M. Lequime, G. Chauveau, D. Torricini, and C. Grèzes-Besset, “Broadband optical monitoring for a 2-meter optics magnetron sputtering deposition machine,” Proc. SPIE 8168, 81681 (2011).
    [CrossRef]
  5. H. Piombini and Ph. Voarino, “Apparatus designed for very accurate measurement of the optical reflection,” Appl. Opt. 46, 8609–8618 (2007).
    [CrossRef]
  6. Ph. Voarino, H. Piombini, F. Sabary, D. Marteau, J. Dubard, J. Hameury, and J. R. Filtz, “High-accuracy measurements of the normal specular reflectance,” Appl. Opt. 47, C303–C309 (2008).
    [CrossRef]
  7. Ph. Voarino, S. Petitrenaud, and H. Piombini, “High-precision measurements of reflectance,” Proc. SPIE 6342, Z3421 (2006).
  8. H. Piombini, S. Bruynooghe, and Ph. Voarino, “Spectral measurement in reflection on steeply aspheric surfaces,” Proc. SPIE 7102, 71021C (2008).
    [CrossRef]
  9. H. Piombini, D. Soler, and Ph. Voarino, “New device to measure the reflectivity on steeply curved surface,” Proc. SPIE 7018, 70181B (2008).
    [CrossRef]
  10. H. Piombini and L. Caillon, “Reflectance measurement of spherical samples,” Opt. Rev. 16, 571–574 (2009).
    [CrossRef]
  11. H. Piombini, Ph. Voarino, and D. Breider, “Toward the reflectance measurement of micro components,” J. Eur. Opt. Soc. 5, 10034S (2010).
    [CrossRef]

2011

G. Chauveau, D. Torricini, C. Grèzes-Besset, D. Stojcevski, and M. Lequime, “PACA2M: magnetron sputtering for 2-meter optics,” Proc. SPIE 8168, 81680P (2011).
[CrossRef]

D. Stojcevski, M. Lequime, G. Chauveau, D. Torricini, and C. Grèzes-Besset, “Broadband optical monitoring for a 2-meter optics magnetron sputtering deposition machine,” Proc. SPIE 8168, 81681 (2011).
[CrossRef]

2010

H. Piombini, Ph. Voarino, and D. Breider, “Toward the reflectance measurement of micro components,” J. Eur. Opt. Soc. 5, 10034S (2010).
[CrossRef]

2009

H. Piombini and L. Caillon, “Reflectance measurement of spherical samples,” Opt. Rev. 16, 571–574 (2009).
[CrossRef]

2008

Ph. Voarino, H. Piombini, F. Sabary, D. Marteau, J. Dubard, J. Hameury, and J. R. Filtz, “High-accuracy measurements of the normal specular reflectance,” Appl. Opt. 47, C303–C309 (2008).
[CrossRef]

H. Piombini, S. Bruynooghe, and Ph. Voarino, “Spectral measurement in reflection on steeply aspheric surfaces,” Proc. SPIE 7102, 71021C (2008).
[CrossRef]

H. Piombini, D. Soler, and Ph. Voarino, “New device to measure the reflectivity on steeply curved surface,” Proc. SPIE 7018, 70181B (2008).
[CrossRef]

2007

2006

Ph. Voarino, S. Petitrenaud, and H. Piombini, “High-precision measurements of reflectance,” Proc. SPIE 6342, Z3421 (2006).

2000

I. Safi, “Recent aspects concerning DC reactive magnetron sputtering on thin film: a review,” Surf. Coat. Technol. 127, 203–219 (2000).
[CrossRef]

Breider, D.

H. Piombini, Ph. Voarino, and D. Breider, “Toward the reflectance measurement of micro components,” J. Eur. Opt. Soc. 5, 10034S (2010).
[CrossRef]

Bruynooghe, S.

H. Piombini, S. Bruynooghe, and Ph. Voarino, “Spectral measurement in reflection on steeply aspheric surfaces,” Proc. SPIE 7102, 71021C (2008).
[CrossRef]

Caillon, L.

H. Piombini and L. Caillon, “Reflectance measurement of spherical samples,” Opt. Rev. 16, 571–574 (2009).
[CrossRef]

Chauveau, G.

G. Chauveau, D. Torricini, C. Grèzes-Besset, D. Stojcevski, and M. Lequime, “PACA2M: magnetron sputtering for 2-meter optics,” Proc. SPIE 8168, 81680P (2011).
[CrossRef]

D. Stojcevski, M. Lequime, G. Chauveau, D. Torricini, and C. Grèzes-Besset, “Broadband optical monitoring for a 2-meter optics magnetron sputtering deposition machine,” Proc. SPIE 8168, 81681 (2011).
[CrossRef]

Dubard, J.

Filtz, J. R.

Grèzes-Besset, C.

D. Stojcevski, M. Lequime, G. Chauveau, D. Torricini, and C. Grèzes-Besset, “Broadband optical monitoring for a 2-meter optics magnetron sputtering deposition machine,” Proc. SPIE 8168, 81681 (2011).
[CrossRef]

G. Chauveau, D. Torricini, C. Grèzes-Besset, D. Stojcevski, and M. Lequime, “PACA2M: magnetron sputtering for 2-meter optics,” Proc. SPIE 8168, 81680P (2011).
[CrossRef]

Griveau, V.

F. Sabary, V. Griveau, C. Marcel, and D. Marteau, “Electrochemical impedance spectroscopy studies of protected silver reflectors deposited by magnetron sputtering,” in Proceedings of 48th Annual Technical Conference Proceedings (2005), pp. 386–389.

Hameury, J.

Lequime, M.

G. Chauveau, D. Torricini, C. Grèzes-Besset, D. Stojcevski, and M. Lequime, “PACA2M: magnetron sputtering for 2-meter optics,” Proc. SPIE 8168, 81680P (2011).
[CrossRef]

D. Stojcevski, M. Lequime, G. Chauveau, D. Torricini, and C. Grèzes-Besset, “Broadband optical monitoring for a 2-meter optics magnetron sputtering deposition machine,” Proc. SPIE 8168, 81681 (2011).
[CrossRef]

Marcel, C.

F. Sabary, V. Griveau, C. Marcel, and D. Marteau, “Electrochemical impedance spectroscopy studies of protected silver reflectors deposited by magnetron sputtering,” in Proceedings of 48th Annual Technical Conference Proceedings (2005), pp. 386–389.

Marteau, D.

Ph. Voarino, H. Piombini, F. Sabary, D. Marteau, J. Dubard, J. Hameury, and J. R. Filtz, “High-accuracy measurements of the normal specular reflectance,” Appl. Opt. 47, C303–C309 (2008).
[CrossRef]

F. Sabary, V. Griveau, C. Marcel, and D. Marteau, “Electrochemical impedance spectroscopy studies of protected silver reflectors deposited by magnetron sputtering,” in Proceedings of 48th Annual Technical Conference Proceedings (2005), pp. 386–389.

Petitrenaud, S.

Ph. Voarino, S. Petitrenaud, and H. Piombini, “High-precision measurements of reflectance,” Proc. SPIE 6342, Z3421 (2006).

Piombini, H.

H. Piombini, Ph. Voarino, and D. Breider, “Toward the reflectance measurement of micro components,” J. Eur. Opt. Soc. 5, 10034S (2010).
[CrossRef]

H. Piombini and L. Caillon, “Reflectance measurement of spherical samples,” Opt. Rev. 16, 571–574 (2009).
[CrossRef]

H. Piombini, S. Bruynooghe, and Ph. Voarino, “Spectral measurement in reflection on steeply aspheric surfaces,” Proc. SPIE 7102, 71021C (2008).
[CrossRef]

H. Piombini, D. Soler, and Ph. Voarino, “New device to measure the reflectivity on steeply curved surface,” Proc. SPIE 7018, 70181B (2008).
[CrossRef]

Ph. Voarino, H. Piombini, F. Sabary, D. Marteau, J. Dubard, J. Hameury, and J. R. Filtz, “High-accuracy measurements of the normal specular reflectance,” Appl. Opt. 47, C303–C309 (2008).
[CrossRef]

H. Piombini and Ph. Voarino, “Apparatus designed for very accurate measurement of the optical reflection,” Appl. Opt. 46, 8609–8618 (2007).
[CrossRef]

Ph. Voarino, S. Petitrenaud, and H. Piombini, “High-precision measurements of reflectance,” Proc. SPIE 6342, Z3421 (2006).

Sabary, F.

Ph. Voarino, H. Piombini, F. Sabary, D. Marteau, J. Dubard, J. Hameury, and J. R. Filtz, “High-accuracy measurements of the normal specular reflectance,” Appl. Opt. 47, C303–C309 (2008).
[CrossRef]

F. Sabary, V. Griveau, C. Marcel, and D. Marteau, “Electrochemical impedance spectroscopy studies of protected silver reflectors deposited by magnetron sputtering,” in Proceedings of 48th Annual Technical Conference Proceedings (2005), pp. 386–389.

Safi, I.

I. Safi, “Recent aspects concerning DC reactive magnetron sputtering on thin film: a review,” Surf. Coat. Technol. 127, 203–219 (2000).
[CrossRef]

Soler, D.

H. Piombini, D. Soler, and Ph. Voarino, “New device to measure the reflectivity on steeply curved surface,” Proc. SPIE 7018, 70181B (2008).
[CrossRef]

Stojcevski, D.

D. Stojcevski, M. Lequime, G. Chauveau, D. Torricini, and C. Grèzes-Besset, “Broadband optical monitoring for a 2-meter optics magnetron sputtering deposition machine,” Proc. SPIE 8168, 81681 (2011).
[CrossRef]

G. Chauveau, D. Torricini, C. Grèzes-Besset, D. Stojcevski, and M. Lequime, “PACA2M: magnetron sputtering for 2-meter optics,” Proc. SPIE 8168, 81680P (2011).
[CrossRef]

Torricini, D.

G. Chauveau, D. Torricini, C. Grèzes-Besset, D. Stojcevski, and M. Lequime, “PACA2M: magnetron sputtering for 2-meter optics,” Proc. SPIE 8168, 81680P (2011).
[CrossRef]

D. Stojcevski, M. Lequime, G. Chauveau, D. Torricini, and C. Grèzes-Besset, “Broadband optical monitoring for a 2-meter optics magnetron sputtering deposition machine,” Proc. SPIE 8168, 81681 (2011).
[CrossRef]

Voarino, Ph.

H. Piombini, Ph. Voarino, and D. Breider, “Toward the reflectance measurement of micro components,” J. Eur. Opt. Soc. 5, 10034S (2010).
[CrossRef]

H. Piombini, D. Soler, and Ph. Voarino, “New device to measure the reflectivity on steeply curved surface,” Proc. SPIE 7018, 70181B (2008).
[CrossRef]

H. Piombini, S. Bruynooghe, and Ph. Voarino, “Spectral measurement in reflection on steeply aspheric surfaces,” Proc. SPIE 7102, 71021C (2008).
[CrossRef]

Ph. Voarino, H. Piombini, F. Sabary, D. Marteau, J. Dubard, J. Hameury, and J. R. Filtz, “High-accuracy measurements of the normal specular reflectance,” Appl. Opt. 47, C303–C309 (2008).
[CrossRef]

H. Piombini and Ph. Voarino, “Apparatus designed for very accurate measurement of the optical reflection,” Appl. Opt. 46, 8609–8618 (2007).
[CrossRef]

Ph. Voarino, S. Petitrenaud, and H. Piombini, “High-precision measurements of reflectance,” Proc. SPIE 6342, Z3421 (2006).

Appl. Opt.

J. Eur. Opt. Soc.

H. Piombini, Ph. Voarino, and D. Breider, “Toward the reflectance measurement of micro components,” J. Eur. Opt. Soc. 5, 10034S (2010).
[CrossRef]

Opt. Rev.

H. Piombini and L. Caillon, “Reflectance measurement of spherical samples,” Opt. Rev. 16, 571–574 (2009).
[CrossRef]

Proc. SPIE

G. Chauveau, D. Torricini, C. Grèzes-Besset, D. Stojcevski, and M. Lequime, “PACA2M: magnetron sputtering for 2-meter optics,” Proc. SPIE 8168, 81680P (2011).
[CrossRef]

D. Stojcevski, M. Lequime, G. Chauveau, D. Torricini, and C. Grèzes-Besset, “Broadband optical monitoring for a 2-meter optics magnetron sputtering deposition machine,” Proc. SPIE 8168, 81681 (2011).
[CrossRef]

Ph. Voarino, S. Petitrenaud, and H. Piombini, “High-precision measurements of reflectance,” Proc. SPIE 6342, Z3421 (2006).

H. Piombini, S. Bruynooghe, and Ph. Voarino, “Spectral measurement in reflection on steeply aspheric surfaces,” Proc. SPIE 7102, 71021C (2008).
[CrossRef]

H. Piombini, D. Soler, and Ph. Voarino, “New device to measure the reflectivity on steeply curved surface,” Proc. SPIE 7018, 70181B (2008).
[CrossRef]

Surf. Coat. Technol.

I. Safi, “Recent aspects concerning DC reactive magnetron sputtering on thin film: a review,” Surf. Coat. Technol. 127, 203–219 (2000).
[CrossRef]

Other

F. Sabary, V. Griveau, C. Marcel, and D. Marteau, “Electrochemical impedance spectroscopy studies of protected silver reflectors deposited by magnetron sputtering,” in Proceedings of 48th Annual Technical Conference Proceedings (2005), pp. 386–389.

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Figures (16)

Fig. 1.
Fig. 1.

View of the deposition magnetron sputtering machine, so-called PACA2M.

Fig. 2.
Fig. 2.

View of the PACA2M plasma inside the chamber.

Fig. 3.
Fig. 3.

Cleaning machine Kombi 650.

Fig. 4.
Fig. 4.

Stack manufactured by CILAS.

Fig. 5.
Fig. 5.

Schema of V and plane reflectors.

Fig. 6.
Fig. 6.

Experimental setup of CEA device.

Fig. 7.
Fig. 7.

Reflectance mapping at 700 nm.

Fig. 8.
Fig. 8.

Sample image.

Fig. 9.
Fig. 9.

Experimental measurement and theoretical fit for two plane samples (a) and for the shape sample (b) for the A-type samples.

Fig. 10.
Fig. 10.

Experimental measurement and theoretical fit for two plane samples (a) and for the shape sample (b) for the B-type samples.

Fig. 11.
Fig. 11.

(a) Spectral responses on three locations of each A-type sample and reflectance mappings at 700 nm for (b) a top sample, (c) a shape sample, and (d) bottom sample.

Fig. 12.
Fig. 12.

(a) Spectral responses on three locations of each sample B-type and reflectance mappings at 700 nm for (b) a top sample, (c) a shape sample, and (d) bottom sample.

Fig. 13.
Fig. 13.

Number of local defects versus the number of the image for (a) an A-type sample, (b) a B-type sample, and (c) a CEA sample.

Fig. 14.
Fig. 14.

Number of local defects versus the size of defect in the 609 images for (a) an A-type sample, (b) a B-type sample, and (c) a CEA sample.

Fig. 15.
Fig. 15.

Number of local defects versus the number of the image for (a) an A-type sample, (b) a B-type sample, and (c) a CEA sample.

Fig. 16.
Fig. 16.

Example of image made a LEICA microscope using Normaski contrast. All the obtained results for the nine samples are summarized in Table 3.

Tables (3)

Tables Icon

Table 1. Fit of Thicknesses (in Percentage) from Experimental Measurement for the Shape Samples (B) for the A-Type Samples

Tables Icon

Table 2. Fit of Thicknesses (in Percentage) from Experimental Measurement for the Shape Sample (B) for the B-Type Samples

Tables Icon

Table 3. Summary of Measurements of Local Defects Made on CILAS Samples and CEA Samples

Equations (1)

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R(λ)=K(λ)VMeasurement(λ)VMeasurement background(λ)VReference(λ)VReference background(λ)

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