Abstract

A planar waveguide structure in a chalcohalide glass was fabricated by dual-energy C ion implantation with energies of 5.5 and 6.0 MeV at fluences of 7.0×1014 and 8.0×1014ionscm2, respectively. A waveguide with a thickness of 5.9 μm was formed. SRIM 2013 was used to simulate the defect distribution fabricated by C ion implantation. Images of the polished end face of the C-implanted chalcohalide glass were measured with a metallographic microscope using reflected polarized light. The micro-Raman spectra were measured in air. The near-field intensity distributions were investigated at visible (633 nm) and near-infrared (1300, 1400, and 1539 nm) bands.

© 2014 Optical Society of America

Full Article  |  PDF Article

References

You do not have subscription access to this journal. Citation lists with outbound citation links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription

Cited By

You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription

Figures (6)

You do not have subscription access to this journal. Figure files are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription

Metrics

You do not have subscription access to this journal. Article level metrics are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription