D. Xu, S. Li, X. Wang, T. Fühner, and A. Erdmann, “Defect parameters retrieval based on optical projection images,” Proc. SPIE 8789, 87890J (2013).

[CrossRef]

A. Szameit, Y. Shechtman, E. Osherovich, E. Bullkich, P. Sidorenko, H. Dana, S. Steiner, E. B. Kley, S. Gazit, T. Cohen-Hyams, S. Shoham, M. Zibulevsky, I. Yavneh, Y. C. Eldar, O. Cohen, and M. Segev, “Sparsity-based single-shot subwavelength coherent diffractive imaging,” Nat. Mater. 11, 455–459 (2012).

[CrossRef]

F. M. Huang and N. I. Zheludev, “Super-resolution without evanescent waves,” Nano Lett. 9, 1249–1254 (2009).

[CrossRef]

J. H. Park, P. D. H. Chung, C. U. Jeon, and H. K. Cho, “Mask pattern recovery by Level Set Technique based Inverse Inspection Technology (IIT) and its application on defect auto disposition,” Proc. SPIE 7488, 748809 (2009).

[CrossRef]

S. Gazit, A. Szameit, Y. C. Eldar, and M. Segev, “Super-resolution and reconstruction of sparse subwavelength images,” Opt. Express 17, 23920–23946 (2009).

[CrossRef]

P. Evanschitzky, A. Erdmann, and T. Fühner, “Extended Abbe approach for fast and accurate lithography imaging simulations,” Proc. SPIE 7470, 747007 (2009).

[CrossRef]

T. Fühner, A. Erdmann, and S. Seifert, “Direct optimization approach for lithographic process conditions,” J. Microlithogr., Microfabr., Microsyst. 6, 031006 (2007).

[CrossRef]

T. Fühner, T. Schnattinger, G. Ardelean, and A. Erdmann, “Dr. LiTHO-a development and research lithography simulator,” Proc. SPIE 6520, 65203F (2007).

[CrossRef]

M. A. T. Figueiredo, R. D. Nowak, and S. J. Wright, “Gradient projection for sparse reconstruction: application to compressed sensing and other inverse problems,” IEEE J. Sel. Top. Signal Process. 1, 586–597 (2007).

[CrossRef]

D. L. Donoho, “Compressed sensing,” IEEE Trans. Inf. Theory 52, 1289–1306 (2006).

[CrossRef]

Y. Granik, “Fast pixel-based mask optimization for inverse lithography,” J. Microlithogr., Microfabr., Microsyst. 5, 043002 (2006).

[CrossRef]

A. Erdmann, T. Fühner, T. Schnattinger, and B. Tollkühn, “Towards automatic mask and source optimization for optical lithography,” Proc. SPIE 5377, 646–657 (2004).

[CrossRef]

F. Schellenberg, “Resolution enhancement technology: the past, the present, and extensions for the future, optical microlithography,” Proc. SPIE 5377, 1–20 (2004).

[CrossRef]

T. Yasui, I. Higashikawa, P. Kuschnerus, W. Degel, K. Boehm, A. Zibold, Y. Kobiyama, J. Urbach, C. M. Schilz, and S. T. Semmler, “Actinic aerial image measurement for qualification of defect on 157 nm photomask,” Proc. SPIE 5446, 743–750 (2004).

[CrossRef]

R. Heintzmann and C. Cremer, “Laterally modulated excitation microscopy: improvement of resolution by using a diffraction grating,” Proc. SPIE 3568, 185–196 (1999).

[CrossRef]

T. Fühner, T. Schnattinger, G. Ardelean, and A. Erdmann, “Dr. LiTHO-a development and research lithography simulator,” Proc. SPIE 6520, 65203F (2007).

[CrossRef]

T. Yasui, I. Higashikawa, P. Kuschnerus, W. Degel, K. Boehm, A. Zibold, Y. Kobiyama, J. Urbach, C. M. Schilz, and S. T. Semmler, “Actinic aerial image measurement for qualification of defect on 157 nm photomask,” Proc. SPIE 5446, 743–750 (2004).

[CrossRef]

A. Szameit, Y. Shechtman, E. Osherovich, E. Bullkich, P. Sidorenko, H. Dana, S. Steiner, E. B. Kley, S. Gazit, T. Cohen-Hyams, S. Shoham, M. Zibulevsky, I. Yavneh, Y. C. Eldar, O. Cohen, and M. Segev, “Sparsity-based single-shot subwavelength coherent diffractive imaging,” Nat. Mater. 11, 455–459 (2012).

[CrossRef]

J. H. Park, P. D. H. Chung, C. U. Jeon, and H. K. Cho, “Mask pattern recovery by Level Set Technique based Inverse Inspection Technology (IIT) and its application on defect auto disposition,” Proc. SPIE 7488, 748809 (2009).

[CrossRef]

J. H. Park, P. D. H. Chung, C. U. Jeon, and H. K. Cho, “Mask pattern recovery by Level Set Technique based Inverse Inspection Technology (IIT) and its application on defect auto disposition,” Proc. SPIE 7488, 748809 (2009).

[CrossRef]

A. Szameit, Y. Shechtman, E. Osherovich, E. Bullkich, P. Sidorenko, H. Dana, S. Steiner, E. B. Kley, S. Gazit, T. Cohen-Hyams, S. Shoham, M. Zibulevsky, I. Yavneh, Y. C. Eldar, O. Cohen, and M. Segev, “Sparsity-based single-shot subwavelength coherent diffractive imaging,” Nat. Mater. 11, 455–459 (2012).

[CrossRef]

A. Szameit, Y. Shechtman, E. Osherovich, E. Bullkich, P. Sidorenko, H. Dana, S. Steiner, E. B. Kley, S. Gazit, T. Cohen-Hyams, S. Shoham, M. Zibulevsky, I. Yavneh, Y. C. Eldar, O. Cohen, and M. Segev, “Sparsity-based single-shot subwavelength coherent diffractive imaging,” Nat. Mater. 11, 455–459 (2012).

[CrossRef]

R. Heintzmann and C. Cremer, “Laterally modulated excitation microscopy: improvement of resolution by using a diffraction grating,” Proc. SPIE 3568, 185–196 (1999).

[CrossRef]

A. Szameit, Y. Shechtman, E. Osherovich, E. Bullkich, P. Sidorenko, H. Dana, S. Steiner, E. B. Kley, S. Gazit, T. Cohen-Hyams, S. Shoham, M. Zibulevsky, I. Yavneh, Y. C. Eldar, O. Cohen, and M. Segev, “Sparsity-based single-shot subwavelength coherent diffractive imaging,” Nat. Mater. 11, 455–459 (2012).

[CrossRef]

T. Yasui, I. Higashikawa, P. Kuschnerus, W. Degel, K. Boehm, A. Zibold, Y. Kobiyama, J. Urbach, C. M. Schilz, and S. T. Semmler, “Actinic aerial image measurement for qualification of defect on 157 nm photomask,” Proc. SPIE 5446, 743–750 (2004).

[CrossRef]

D. L. Donoho, “Compressed sensing,” IEEE Trans. Inf. Theory 52, 1289–1306 (2006).

[CrossRef]

Y. Eldar and G. Kutyniok, Compressed Sensing: Theory and Applications (Cambridge University, 2011).

A. Szameit, Y. Shechtman, E. Osherovich, E. Bullkich, P. Sidorenko, H. Dana, S. Steiner, E. B. Kley, S. Gazit, T. Cohen-Hyams, S. Shoham, M. Zibulevsky, I. Yavneh, Y. C. Eldar, O. Cohen, and M. Segev, “Sparsity-based single-shot subwavelength coherent diffractive imaging,” Nat. Mater. 11, 455–459 (2012).

[CrossRef]

Y. Shechteman, Y. C. Eldar, A. Szameit, and M. Segev, “Sparsity based sub-wavelength imaging with partially incoherent light via quadratic compressed sensing,” Opt. Express 19, 14807–14822 (2011).

[CrossRef]

S. Gazit, A. Szameit, Y. C. Eldar, and M. Segev, “Super-resolution and reconstruction of sparse subwavelength images,” Opt. Express 17, 23920–23946 (2009).

[CrossRef]

D. Xu, S. Li, X. Wang, T. Fühner, and A. Erdmann, “Defect parameters retrieval based on optical projection images,” Proc. SPIE 8789, 87890J (2013).

[CrossRef]

P. Evanschitzky, A. Erdmann, and T. Fühner, “Extended Abbe approach for fast and accurate lithography imaging simulations,” Proc. SPIE 7470, 747007 (2009).

[CrossRef]

T. Fühner, A. Erdmann, and S. Seifert, “Direct optimization approach for lithographic process conditions,” J. Microlithogr., Microfabr., Microsyst. 6, 031006 (2007).

[CrossRef]

T. Fühner, T. Schnattinger, G. Ardelean, and A. Erdmann, “Dr. LiTHO-a development and research lithography simulator,” Proc. SPIE 6520, 65203F (2007).

[CrossRef]

A. Erdmann, T. Fühner, T. Schnattinger, and B. Tollkühn, “Towards automatic mask and source optimization for optical lithography,” Proc. SPIE 5377, 646–657 (2004).

[CrossRef]

P. Evanschitzky, A. Erdmann, and T. Fühner, “Extended Abbe approach for fast and accurate lithography imaging simulations,” Proc. SPIE 7470, 747007 (2009).

[CrossRef]

M. A. T. Figueiredo, R. D. Nowak, and S. J. Wright, “Gradient projection for sparse reconstruction: application to compressed sensing and other inverse problems,” IEEE J. Sel. Top. Signal Process. 1, 586–597 (2007).

[CrossRef]

D. Xu, S. Li, X. Wang, T. Fühner, and A. Erdmann, “Defect parameters retrieval based on optical projection images,” Proc. SPIE 8789, 87890J (2013).

[CrossRef]

P. Evanschitzky, A. Erdmann, and T. Fühner, “Extended Abbe approach for fast and accurate lithography imaging simulations,” Proc. SPIE 7470, 747007 (2009).

[CrossRef]

T. Fühner, A. Erdmann, and S. Seifert, “Direct optimization approach for lithographic process conditions,” J. Microlithogr., Microfabr., Microsyst. 6, 031006 (2007).

[CrossRef]

T. Fühner, T. Schnattinger, G. Ardelean, and A. Erdmann, “Dr. LiTHO-a development and research lithography simulator,” Proc. SPIE 6520, 65203F (2007).

[CrossRef]

A. Erdmann, T. Fühner, T. Schnattinger, and B. Tollkühn, “Towards automatic mask and source optimization for optical lithography,” Proc. SPIE 5377, 646–657 (2004).

[CrossRef]

A. Szameit, Y. Shechtman, E. Osherovich, E. Bullkich, P. Sidorenko, H. Dana, S. Steiner, E. B. Kley, S. Gazit, T. Cohen-Hyams, S. Shoham, M. Zibulevsky, I. Yavneh, Y. C. Eldar, O. Cohen, and M. Segev, “Sparsity-based single-shot subwavelength coherent diffractive imaging,” Nat. Mater. 11, 455–459 (2012).

[CrossRef]

S. Gazit, A. Szameit, Y. C. Eldar, and M. Segev, “Super-resolution and reconstruction of sparse subwavelength images,” Opt. Express 17, 23920–23946 (2009).

[CrossRef]

J. W. Goodman, Introduction to Fourier Optics, 3rd ed. (Roberts & Company, 2005).

Y. Granik, “Fast pixel-based mask optimization for inverse lithography,” J. Microlithogr., Microfabr., Microsyst. 5, 043002 (2006).

[CrossRef]

R. Heintzmann and C. Cremer, “Laterally modulated excitation microscopy: improvement of resolution by using a diffraction grating,” Proc. SPIE 3568, 185–196 (1999).

[CrossRef]

T. Yasui, I. Higashikawa, P. Kuschnerus, W. Degel, K. Boehm, A. Zibold, Y. Kobiyama, J. Urbach, C. M. Schilz, and S. T. Semmler, “Actinic aerial image measurement for qualification of defect on 157 nm photomask,” Proc. SPIE 5446, 743–750 (2004).

[CrossRef]

F. M. Huang and N. I. Zheludev, “Super-resolution without evanescent waves,” Nano Lett. 9, 1249–1254 (2009).

[CrossRef]

J. H. Park, P. D. H. Chung, C. U. Jeon, and H. K. Cho, “Mask pattern recovery by Level Set Technique based Inverse Inspection Technology (IIT) and its application on defect auto disposition,” Proc. SPIE 7488, 748809 (2009).

[CrossRef]

A. Szameit, Y. Shechtman, E. Osherovich, E. Bullkich, P. Sidorenko, H. Dana, S. Steiner, E. B. Kley, S. Gazit, T. Cohen-Hyams, S. Shoham, M. Zibulevsky, I. Yavneh, Y. C. Eldar, O. Cohen, and M. Segev, “Sparsity-based single-shot subwavelength coherent diffractive imaging,” Nat. Mater. 11, 455–459 (2012).

[CrossRef]

T. Yasui, I. Higashikawa, P. Kuschnerus, W. Degel, K. Boehm, A. Zibold, Y. Kobiyama, J. Urbach, C. M. Schilz, and S. T. Semmler, “Actinic aerial image measurement for qualification of defect on 157 nm photomask,” Proc. SPIE 5446, 743–750 (2004).

[CrossRef]

T. Yasui, I. Higashikawa, P. Kuschnerus, W. Degel, K. Boehm, A. Zibold, Y. Kobiyama, J. Urbach, C. M. Schilz, and S. T. Semmler, “Actinic aerial image measurement for qualification of defect on 157 nm photomask,” Proc. SPIE 5446, 743–750 (2004).

[CrossRef]

Y. Eldar and G. Kutyniok, Compressed Sensing: Theory and Applications (Cambridge University, 2011).

D. Xu, S. Li, X. Wang, T. Fühner, and A. Erdmann, “Defect parameters retrieval based on optical projection images,” Proc. SPIE 8789, 87890J (2013).

[CrossRef]

C. A. Mack, Fundamental Principles of Optical Lithography: The Science of Microfabrication (Wiley, 2007).

M. A. T. Figueiredo, R. D. Nowak, and S. J. Wright, “Gradient projection for sparse reconstruction: application to compressed sensing and other inverse problems,” IEEE J. Sel. Top. Signal Process. 1, 586–597 (2007).

[CrossRef]

A. Szameit, Y. Shechtman, E. Osherovich, E. Bullkich, P. Sidorenko, H. Dana, S. Steiner, E. B. Kley, S. Gazit, T. Cohen-Hyams, S. Shoham, M. Zibulevsky, I. Yavneh, Y. C. Eldar, O. Cohen, and M. Segev, “Sparsity-based single-shot subwavelength coherent diffractive imaging,” Nat. Mater. 11, 455–459 (2012).

[CrossRef]

J. H. Park, P. D. H. Chung, C. U. Jeon, and H. K. Cho, “Mask pattern recovery by Level Set Technique based Inverse Inspection Technology (IIT) and its application on defect auto disposition,” Proc. SPIE 7488, 748809 (2009).

[CrossRef]

F. Schellenberg, “Resolution enhancement technology: the past, the present, and extensions for the future, optical microlithography,” Proc. SPIE 5377, 1–20 (2004).

[CrossRef]

T. Yasui, I. Higashikawa, P. Kuschnerus, W. Degel, K. Boehm, A. Zibold, Y. Kobiyama, J. Urbach, C. M. Schilz, and S. T. Semmler, “Actinic aerial image measurement for qualification of defect on 157 nm photomask,” Proc. SPIE 5446, 743–750 (2004).

[CrossRef]

T. Fühner, T. Schnattinger, G. Ardelean, and A. Erdmann, “Dr. LiTHO-a development and research lithography simulator,” Proc. SPIE 6520, 65203F (2007).

[CrossRef]

A. Erdmann, T. Fühner, T. Schnattinger, and B. Tollkühn, “Towards automatic mask and source optimization for optical lithography,” Proc. SPIE 5377, 646–657 (2004).

[CrossRef]

A. Szameit, Y. Shechtman, E. Osherovich, E. Bullkich, P. Sidorenko, H. Dana, S. Steiner, E. B. Kley, S. Gazit, T. Cohen-Hyams, S. Shoham, M. Zibulevsky, I. Yavneh, Y. C. Eldar, O. Cohen, and M. Segev, “Sparsity-based single-shot subwavelength coherent diffractive imaging,” Nat. Mater. 11, 455–459 (2012).

[CrossRef]

Y. Shechteman, Y. C. Eldar, A. Szameit, and M. Segev, “Sparsity based sub-wavelength imaging with partially incoherent light via quadratic compressed sensing,” Opt. Express 19, 14807–14822 (2011).

[CrossRef]

S. Gazit, A. Szameit, Y. C. Eldar, and M. Segev, “Super-resolution and reconstruction of sparse subwavelength images,” Opt. Express 17, 23920–23946 (2009).

[CrossRef]

T. Fühner, A. Erdmann, and S. Seifert, “Direct optimization approach for lithographic process conditions,” J. Microlithogr., Microfabr., Microsyst. 6, 031006 (2007).

[CrossRef]

T. Yasui, I. Higashikawa, P. Kuschnerus, W. Degel, K. Boehm, A. Zibold, Y. Kobiyama, J. Urbach, C. M. Schilz, and S. T. Semmler, “Actinic aerial image measurement for qualification of defect on 157 nm photomask,” Proc. SPIE 5446, 743–750 (2004).

[CrossRef]

A. Szameit, Y. Shechtman, E. Osherovich, E. Bullkich, P. Sidorenko, H. Dana, S. Steiner, E. B. Kley, S. Gazit, T. Cohen-Hyams, S. Shoham, M. Zibulevsky, I. Yavneh, Y. C. Eldar, O. Cohen, and M. Segev, “Sparsity-based single-shot subwavelength coherent diffractive imaging,” Nat. Mater. 11, 455–459 (2012).

[CrossRef]

A. Szameit, Y. Shechtman, E. Osherovich, E. Bullkich, P. Sidorenko, H. Dana, S. Steiner, E. B. Kley, S. Gazit, T. Cohen-Hyams, S. Shoham, M. Zibulevsky, I. Yavneh, Y. C. Eldar, O. Cohen, and M. Segev, “Sparsity-based single-shot subwavelength coherent diffractive imaging,” Nat. Mater. 11, 455–459 (2012).

[CrossRef]

A. Szameit, Y. Shechtman, E. Osherovich, E. Bullkich, P. Sidorenko, H. Dana, S. Steiner, E. B. Kley, S. Gazit, T. Cohen-Hyams, S. Shoham, M. Zibulevsky, I. Yavneh, Y. C. Eldar, O. Cohen, and M. Segev, “Sparsity-based single-shot subwavelength coherent diffractive imaging,” Nat. Mater. 11, 455–459 (2012).

[CrossRef]

A. Szameit, Y. Shechtman, E. Osherovich, E. Bullkich, P. Sidorenko, H. Dana, S. Steiner, E. B. Kley, S. Gazit, T. Cohen-Hyams, S. Shoham, M. Zibulevsky, I. Yavneh, Y. C. Eldar, O. Cohen, and M. Segev, “Sparsity-based single-shot subwavelength coherent diffractive imaging,” Nat. Mater. 11, 455–459 (2012).

[CrossRef]

A. Szameit, Y. Shechtman, E. Osherovich, E. Bullkich, P. Sidorenko, H. Dana, S. Steiner, E. B. Kley, S. Gazit, T. Cohen-Hyams, S. Shoham, M. Zibulevsky, I. Yavneh, Y. C. Eldar, O. Cohen, and M. Segev, “Sparsity-based single-shot subwavelength coherent diffractive imaging,” Nat. Mater. 11, 455–459 (2012).

[CrossRef]

Y. Shechteman, Y. C. Eldar, A. Szameit, and M. Segev, “Sparsity based sub-wavelength imaging with partially incoherent light via quadratic compressed sensing,” Opt. Express 19, 14807–14822 (2011).

[CrossRef]

S. Gazit, A. Szameit, Y. C. Eldar, and M. Segev, “Super-resolution and reconstruction of sparse subwavelength images,” Opt. Express 17, 23920–23946 (2009).

[CrossRef]

A. Erdmann, T. Fühner, T. Schnattinger, and B. Tollkühn, “Towards automatic mask and source optimization for optical lithography,” Proc. SPIE 5377, 646–657 (2004).

[CrossRef]

T. Yasui, I. Higashikawa, P. Kuschnerus, W. Degel, K. Boehm, A. Zibold, Y. Kobiyama, J. Urbach, C. M. Schilz, and S. T. Semmler, “Actinic aerial image measurement for qualification of defect on 157 nm photomask,” Proc. SPIE 5446, 743–750 (2004).

[CrossRef]

D. Xu, S. Li, X. Wang, T. Fühner, and A. Erdmann, “Defect parameters retrieval based on optical projection images,” Proc. SPIE 8789, 87890J (2013).

[CrossRef]

M. A. T. Figueiredo, R. D. Nowak, and S. J. Wright, “Gradient projection for sparse reconstruction: application to compressed sensing and other inverse problems,” IEEE J. Sel. Top. Signal Process. 1, 586–597 (2007).

[CrossRef]

D. Xu, S. Li, X. Wang, T. Fühner, and A. Erdmann, “Defect parameters retrieval based on optical projection images,” Proc. SPIE 8789, 87890J (2013).

[CrossRef]

T. Yasui, I. Higashikawa, P. Kuschnerus, W. Degel, K. Boehm, A. Zibold, Y. Kobiyama, J. Urbach, C. M. Schilz, and S. T. Semmler, “Actinic aerial image measurement for qualification of defect on 157 nm photomask,” Proc. SPIE 5446, 743–750 (2004).

[CrossRef]

A. Szameit, Y. Shechtman, E. Osherovich, E. Bullkich, P. Sidorenko, H. Dana, S. Steiner, E. B. Kley, S. Gazit, T. Cohen-Hyams, S. Shoham, M. Zibulevsky, I. Yavneh, Y. C. Eldar, O. Cohen, and M. Segev, “Sparsity-based single-shot subwavelength coherent diffractive imaging,” Nat. Mater. 11, 455–459 (2012).

[CrossRef]

F. M. Huang and N. I. Zheludev, “Super-resolution without evanescent waves,” Nano Lett. 9, 1249–1254 (2009).

[CrossRef]

T. Yasui, I. Higashikawa, P. Kuschnerus, W. Degel, K. Boehm, A. Zibold, Y. Kobiyama, J. Urbach, C. M. Schilz, and S. T. Semmler, “Actinic aerial image measurement for qualification of defect on 157 nm photomask,” Proc. SPIE 5446, 743–750 (2004).

[CrossRef]

A. Szameit, Y. Shechtman, E. Osherovich, E. Bullkich, P. Sidorenko, H. Dana, S. Steiner, E. B. Kley, S. Gazit, T. Cohen-Hyams, S. Shoham, M. Zibulevsky, I. Yavneh, Y. C. Eldar, O. Cohen, and M. Segev, “Sparsity-based single-shot subwavelength coherent diffractive imaging,” Nat. Mater. 11, 455–459 (2012).

[CrossRef]

M. A. T. Figueiredo, R. D. Nowak, and S. J. Wright, “Gradient projection for sparse reconstruction: application to compressed sensing and other inverse problems,” IEEE J. Sel. Top. Signal Process. 1, 586–597 (2007).

[CrossRef]

D. L. Donoho, “Compressed sensing,” IEEE Trans. Inf. Theory 52, 1289–1306 (2006).

[CrossRef]

Y. Granik, “Fast pixel-based mask optimization for inverse lithography,” J. Microlithogr., Microfabr., Microsyst. 5, 043002 (2006).

[CrossRef]

T. Fühner, A. Erdmann, and S. Seifert, “Direct optimization approach for lithographic process conditions,” J. Microlithogr., Microfabr., Microsyst. 6, 031006 (2007).

[CrossRef]

F. M. Huang and N. I. Zheludev, “Super-resolution without evanescent waves,” Nano Lett. 9, 1249–1254 (2009).

[CrossRef]

A. Szameit, Y. Shechtman, E. Osherovich, E. Bullkich, P. Sidorenko, H. Dana, S. Steiner, E. B. Kley, S. Gazit, T. Cohen-Hyams, S. Shoham, M. Zibulevsky, I. Yavneh, Y. C. Eldar, O. Cohen, and M. Segev, “Sparsity-based single-shot subwavelength coherent diffractive imaging,” Nat. Mater. 11, 455–459 (2012).

[CrossRef]

S. Gazit, A. Szameit, Y. C. Eldar, and M. Segev, “Super-resolution and reconstruction of sparse subwavelength images,” Opt. Express 17, 23920–23946 (2009).

[CrossRef]

Y. Shechteman, Y. C. Eldar, A. Szameit, and M. Segev, “Sparsity based sub-wavelength imaging with partially incoherent light via quadratic compressed sensing,” Opt. Express 19, 14807–14822 (2011).

[CrossRef]

R. Heintzmann and C. Cremer, “Laterally modulated excitation microscopy: improvement of resolution by using a diffraction grating,” Proc. SPIE 3568, 185–196 (1999).

[CrossRef]

F. Schellenberg, “Resolution enhancement technology: the past, the present, and extensions for the future, optical microlithography,” Proc. SPIE 5377, 1–20 (2004).

[CrossRef]

T. Yasui, I. Higashikawa, P. Kuschnerus, W. Degel, K. Boehm, A. Zibold, Y. Kobiyama, J. Urbach, C. M. Schilz, and S. T. Semmler, “Actinic aerial image measurement for qualification of defect on 157 nm photomask,” Proc. SPIE 5446, 743–750 (2004).

[CrossRef]

J. H. Park, P. D. H. Chung, C. U. Jeon, and H. K. Cho, “Mask pattern recovery by Level Set Technique based Inverse Inspection Technology (IIT) and its application on defect auto disposition,” Proc. SPIE 7488, 748809 (2009).

[CrossRef]

D. Xu, S. Li, X. Wang, T. Fühner, and A. Erdmann, “Defect parameters retrieval based on optical projection images,” Proc. SPIE 8789, 87890J (2013).

[CrossRef]

T. Fühner, T. Schnattinger, G. Ardelean, and A. Erdmann, “Dr. LiTHO-a development and research lithography simulator,” Proc. SPIE 6520, 65203F (2007).

[CrossRef]

P. Evanschitzky, A. Erdmann, and T. Fühner, “Extended Abbe approach for fast and accurate lithography imaging simulations,” Proc. SPIE 7470, 747007 (2009).

[CrossRef]

A. Erdmann, T. Fühner, T. Schnattinger, and B. Tollkühn, “Towards automatic mask and source optimization for optical lithography,” Proc. SPIE 5377, 646–657 (2004).

[CrossRef]

C. A. Mack, Fundamental Principles of Optical Lithography: The Science of Microfabrication (Wiley, 2007).

www.drlitho.com .

J. W. Goodman, Introduction to Fourier Optics, 3rd ed. (Roberts & Company, 2005).

Y. Eldar and G. Kutyniok, Compressed Sensing: Theory and Applications (Cambridge University, 2011).