M. Ebert, H. Cramer, W. Tel, M. Kubis, and H. Megens, “Combined overlay, focus and CD metrology for leading edge lithography,” Proc. SPIE 7973, 797311 (2011).

[CrossRef]

A. J. E. M. Janssen, “Computation of Hopkins’ 3-circle integrals using Zernike expansions,” J. Eur. Opt. Soc. Rapid Pub. 6, 11059 (2011).

[CrossRef]

P. Vanoppen and T. Theeuwes, “Lithographic scanner stability improvements through advanced metrology and control,” Proc. SPIE 7640, 764010 (2010).

[CrossRef]

M. A. van de Kerkhof, W. de Boeij, H. Kok, M. Silova, J. Baselmans, and M. Hemerik, “Full optical column characterization of DUV lithographic projection tools,” Proc. SPIE 5377, 1960–1970 (2004).

[CrossRef]

H. Nomura, “New phase-shift gratings for measuring aberrations,” Proc. SPIE 4346, 25–35 (2001).

[CrossRef]

M. Abramowitz and I. A. Stegun, Handbook of Mathematical Functions (Dover, 1972).

M. A. van de Kerkhof, W. de Boeij, H. Kok, M. Silova, J. Baselmans, and M. Hemerik, “Full optical column characterization of DUV lithographic projection tools,” Proc. SPIE 5377, 1960–1970 (2004).

[CrossRef]

M. Ebert, H. Cramer, W. Tel, M. Kubis, and H. Megens, “Combined overlay, focus and CD metrology for leading edge lithography,” Proc. SPIE 7973, 797311 (2011).

[CrossRef]

M. A. van de Kerkhof, W. de Boeij, H. Kok, M. Silova, J. Baselmans, and M. Hemerik, “Full optical column characterization of DUV lithographic projection tools,” Proc. SPIE 5377, 1960–1970 (2004).

[CrossRef]

M. Ebert, H. Cramer, W. Tel, M. Kubis, and H. Megens, “Combined overlay, focus and CD metrology for leading edge lithography,” Proc. SPIE 7973, 797311 (2011).

[CrossRef]

T. Hastie, R. Tibshirani, and J. J. H. Friedman, The Elements of Statistical Learning (Springer, 2001), Vol. 1.

T. Hastie, R. Tibshirani, and J. J. H. Friedman, The Elements of Statistical Learning (Springer, 2001), Vol. 1.

M. A. van de Kerkhof, W. de Boeij, H. Kok, M. Silova, J. Baselmans, and M. Hemerik, “Full optical column characterization of DUV lithographic projection tools,” Proc. SPIE 5377, 1960–1970 (2004).

[CrossRef]

A. J. E. M. Janssen, “Computation of Hopkins’ 3-circle integrals using Zernike expansions,” J. Eur. Opt. Soc. Rapid Pub. 6, 11059 (2011).

[CrossRef]

A. J. E. M. Janssen, “A generalization of the Zernike circle polynomials for forward and inverse problems in diffraction theory,” arXiv:1110.2369v1 (2011).

C. Kittel, Introduction to Solid State Physics, 5th ed. (Wiley, 1976).

M. A. van de Kerkhof, W. de Boeij, H. Kok, M. Silova, J. Baselmans, and M. Hemerik, “Full optical column characterization of DUV lithographic projection tools,” Proc. SPIE 5377, 1960–1970 (2004).

[CrossRef]

M. Ebert, H. Cramer, W. Tel, M. Kubis, and H. Megens, “Combined overlay, focus and CD metrology for leading edge lithography,” Proc. SPIE 7973, 797311 (2011).

[CrossRef]

M. Ebert, H. Cramer, W. Tel, M. Kubis, and H. Megens, “Combined overlay, focus and CD metrology for leading edge lithography,” Proc. SPIE 7973, 797311 (2011).

[CrossRef]

H. Nomura, “New phase-shift gratings for measuring aberrations,” Proc. SPIE 4346, 25–35 (2001).

[CrossRef]

M. Pisarenco and I. Setija, “Compact discrepancy and chi-squared principles for over-determined inverse problems” submitted to Inverse Methods.

M. Pisarenco and I. Setija, “Compact discrepancy and chi-squared principles for over-determined inverse problems” submitted to Inverse Methods.

M. A. van de Kerkhof, W. de Boeij, H. Kok, M. Silova, J. Baselmans, and M. Hemerik, “Full optical column characterization of DUV lithographic projection tools,” Proc. SPIE 5377, 1960–1970 (2004).

[CrossRef]

M. Abramowitz and I. A. Stegun, Handbook of Mathematical Functions (Dover, 1972).

M. Ebert, H. Cramer, W. Tel, M. Kubis, and H. Megens, “Combined overlay, focus and CD metrology for leading edge lithography,” Proc. SPIE 7973, 797311 (2011).

[CrossRef]

P. Vanoppen and T. Theeuwes, “Lithographic scanner stability improvements through advanced metrology and control,” Proc. SPIE 7640, 764010 (2010).

[CrossRef]

T. Hastie, R. Tibshirani, and J. J. H. Friedman, The Elements of Statistical Learning (Springer, 2001), Vol. 1.

M. A. van de Kerkhof, W. de Boeij, H. Kok, M. Silova, J. Baselmans, and M. Hemerik, “Full optical column characterization of DUV lithographic projection tools,” Proc. SPIE 5377, 1960–1970 (2004).

[CrossRef]

P. Vanoppen and T. Theeuwes, “Lithographic scanner stability improvements through advanced metrology and control,” Proc. SPIE 7640, 764010 (2010).

[CrossRef]

A. J. E. M. Janssen, “Computation of Hopkins’ 3-circle integrals using Zernike expansions,” J. Eur. Opt. Soc. Rapid Pub. 6, 11059 (2011).

[CrossRef]

H. Nomura, “New phase-shift gratings for measuring aberrations,” Proc. SPIE 4346, 25–35 (2001).

[CrossRef]

M. A. van de Kerkhof, W. de Boeij, H. Kok, M. Silova, J. Baselmans, and M. Hemerik, “Full optical column characterization of DUV lithographic projection tools,” Proc. SPIE 5377, 1960–1970 (2004).

[CrossRef]

P. Vanoppen and T. Theeuwes, “Lithographic scanner stability improvements through advanced metrology and control,” Proc. SPIE 7640, 764010 (2010).

[CrossRef]

M. Ebert, H. Cramer, W. Tel, M. Kubis, and H. Megens, “Combined overlay, focus and CD metrology for leading edge lithography,” Proc. SPIE 7973, 797311 (2011).

[CrossRef]

T. Hastie, R. Tibshirani, and J. J. H. Friedman, The Elements of Statistical Learning (Springer, 2001), Vol. 1.

M. Pisarenco and I. Setija, “Compact discrepancy and chi-squared principles for over-determined inverse problems” submitted to Inverse Methods.

C. Kittel, Introduction to Solid State Physics, 5th ed. (Wiley, 1976).

M. Abramowitz and I. A. Stegun, Handbook of Mathematical Functions (Dover, 1972).

A. J. E. M. Janssen, “A generalization of the Zernike circle polynomials for forward and inverse problems in diffraction theory,” arXiv:1110.2369v1 (2011).