Abstract

We propose to construct broadband thin-film polarizers (TFPs) by combining the polarizing regions of long-wave pass and short-wave pass stacks. The polarization bandwidth can be broader than traditional TFPs by roughly a factor of 2. We designed and fabricated two HfO2/SiO2 Brewster’s angle TFPs with a high contrast ratio in the spectral range of 1064±25nm. The laser-induced damage was investigated and illustrates that the two designs possess quite different laser damage properties due to the different electric field distributions. Nevertheless, broadband TFPs with high laser-induced damage threshold can be achieved with proper coating design.

© 2013 Optical Society of America

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  3. C. J. Stolz, F. Y. Genin, T. A. Reitter, N. Molau, R. P. Bevis, M. K. von Gunten, D. J. Smith, and J. F. Anzellotti, “Effect of SiO2 overcoat thickness on laser damage morphology of HfO2/SiO2 Brewster’s angle polarizers at 1064 nm,” Proc. SPIE 2966, 265–272 (1997).
    [CrossRef]
  4. F. Y. Genin, C. J. Stolz, T. Reitter, M. R. Kozlowski, R. P. Bevis, and M. K. von Gunten, “Effect of electric field distribution on the morphologies of laser-induced damage in hafnia-silica multilayer polarizers,” Proc. SPIE 2966, 342–352 (1997).
    [CrossRef]
  5. C. J. Stolz, “Brewster’s angle thin film plate polarizer design study from an electric field perspective,” Proc. SPIE 3738, 347–353 (1999).
    [CrossRef]
  6. C. J. Stolz, “Status of NIF mirror technologies for completion of the NIF facility,” Proc. SPIE 7101, 710115 (2008).
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  7. M. Zhu, K. Yi, Z. Fan, and J. Shao, “Theoretical and experimental research on spectral performance and laser induced damage of Brewster’s thin film polarizers,” Appl. Surf. Sci. 257, 6884–6888 (2011).
    [CrossRef]
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    [CrossRef]
  17. B. Ma, T. Ding, H. Jiao, G. Zhou, Z. Shen, X. Cheng, J. Zhang, H. Liu, Y. Ji, P. He, and Z. Wang, “LIDT of HfO2/SiO2 HR films by different test modes at 1064 nm and 532 nm,” Proc. SPIE 7842, 78420E (2010).
    [CrossRef]
  18. C. J. Stolz, M. D. Thomas, and A. J. Griffin, “BDS thin film damage competition,” Proc. SPIE 7132, 71320C(2010).
    [CrossRef]
  19. S. Papernov and A. W. Schmid, “High-spatial-resolution studies of UV-laser-damage morphology in SiO2 thin films with artificial defects,” Proc. SPIE 5647, 141–155 (2005).
    [CrossRef]

2011 (2)

M. Zhu, K. Yi, Z. Fan, and J. Shao, “Theoretical and experimental research on spectral performance and laser induced damage of Brewster’s thin film polarizers,” Appl. Surf. Sci. 257, 6884–6888 (2011).
[CrossRef]

X. Cheng, Z. Shen, H. Jiao, J. Zhang, B. Ma, T. Ding, J. Lu, X. Wang, and Z. Wang, “Laser damage study of nodules in electron-beam-evaporated HfO2/SiO2 high reflectors,” Appl. Opt. 50, C357–C363 (2011).
[CrossRef]

2010 (2)

B. Ma, T. Ding, H. Jiao, G. Zhou, Z. Shen, X. Cheng, J. Zhang, H. Liu, Y. Ji, P. He, and Z. Wang, “LIDT of HfO2/SiO2 HR films by different test modes at 1064 nm and 532 nm,” Proc. SPIE 7842, 78420E (2010).
[CrossRef]

C. J. Stolz, M. D. Thomas, and A. J. Griffin, “BDS thin film damage competition,” Proc. SPIE 7132, 71320C(2010).
[CrossRef]

2008 (1)

C. J. Stolz, “Status of NIF mirror technologies for completion of the NIF facility,” Proc. SPIE 7101, 710115 (2008).
[CrossRef]

2005 (3)

L. J. Waxer, D. N. Maywar, J. H. Kelly, T. J. Kessler, B. E. Kruschwitz, S. J. Loucks, R. L. McCrory, D. D. Meyerhofer, S. F. B. Morse, C. Stoeckl, and J. D. Zuegel, “High-energy petawatt capability for the OMEGA laser,” Opt. Photonics News 16(7), 30–36 (2005).
[CrossRef]

S. Papernov and A. W. Schmid, “High-spatial-resolution studies of UV-laser-damage morphology in SiO2 thin films with artificial defects,” Proc. SPIE 5647, 141–155 (2005).
[CrossRef]

J. B. Oliver, A. L. Rigatti, J. D. Howe, J. Keck, J. Szczepanski, A. W. Schmid, S. Papernov, A. Kozlov, and T. Z. Kosc, “Thin-film polarizers for the OMEGA EP laser system,” Proc. SPIE 5991, 599119 (2005).
[CrossRef]

1999 (1)

C. J. Stolz, “Brewster’s angle thin film plate polarizer design study from an electric field perspective,” Proc. SPIE 3738, 347–353 (1999).
[CrossRef]

1997 (2)

C. J. Stolz, F. Y. Genin, T. A. Reitter, N. Molau, R. P. Bevis, M. K. von Gunten, D. J. Smith, and J. F. Anzellotti, “Effect of SiO2 overcoat thickness on laser damage morphology of HfO2/SiO2 Brewster’s angle polarizers at 1064 nm,” Proc. SPIE 2966, 265–272 (1997).
[CrossRef]

F. Y. Genin, C. J. Stolz, T. Reitter, M. R. Kozlowski, R. P. Bevis, and M. K. von Gunten, “Effect of electric field distribution on the morphologies of laser-induced damage in hafnia-silica multilayer polarizers,” Proc. SPIE 2966, 342–352 (1997).
[CrossRef]

1994 (1)

1991 (2)

C. Fournet, B. Pinot, B. Geenen, F. Ollivier, and W. Alexandre, “High damage threshold mirrors and polarizers in the ZrO2/SiO2 and HfO2/SiO2 dielectric systems,” Proc. SPIE 1624, 282–293 (1991).
[CrossRef]

J. D. Kmetec, J. J. Macklin, and J. F. Young, “0.5TW, 125 fs Ti:sapphire laser,” Opt. Lett. 16, 1001–1003 (1991).
[CrossRef]

1980 (1)

1974 (1)

Alexandre, W.

C. Fournet, B. Pinot, B. Geenen, F. Ollivier, and W. Alexandre, “High damage threshold mirrors and polarizers in the ZrO2/SiO2 and HfO2/SiO2 dielectric systems,” Proc. SPIE 1624, 282–293 (1991).
[CrossRef]

Aminou, D. M. A.

D. M. A. Aminou and J. Squier, “Broad band thin film plate polarizer for high power femtosecond solid-state lasers,” in Advanced Solid State Lasers, Vol. 15 of OSA Trends in Optics and Photonics Series (Optical Society of America, 1993), pp. 212–215.

Anzellotti, J. F.

C. J. Stolz, F. Y. Genin, T. A. Reitter, N. Molau, R. P. Bevis, M. K. von Gunten, D. J. Smith, and J. F. Anzellotti, “Effect of SiO2 overcoat thickness on laser damage morphology of HfO2/SiO2 Brewster’s angle polarizers at 1064 nm,” Proc. SPIE 2966, 265–272 (1997).
[CrossRef]

Bevis, R. P.

C. J. Stolz, F. Y. Genin, T. A. Reitter, N. Molau, R. P. Bevis, M. K. von Gunten, D. J. Smith, and J. F. Anzellotti, “Effect of SiO2 overcoat thickness on laser damage morphology of HfO2/SiO2 Brewster’s angle polarizers at 1064 nm,” Proc. SPIE 2966, 265–272 (1997).
[CrossRef]

F. Y. Genin, C. J. Stolz, T. Reitter, M. R. Kozlowski, R. P. Bevis, and M. K. von Gunten, “Effect of electric field distribution on the morphologies of laser-induced damage in hafnia-silica multilayer polarizers,” Proc. SPIE 2966, 342–352 (1997).
[CrossRef]

Cheng, X.

X. Cheng, Z. Shen, H. Jiao, J. Zhang, B. Ma, T. Ding, J. Lu, X. Wang, and Z. Wang, “Laser damage study of nodules in electron-beam-evaporated HfO2/SiO2 high reflectors,” Appl. Opt. 50, C357–C363 (2011).
[CrossRef]

B. Ma, T. Ding, H. Jiao, G. Zhou, Z. Shen, X. Cheng, J. Zhang, H. Liu, Y. Ji, P. He, and Z. Wang, “LIDT of HfO2/SiO2 HR films by different test modes at 1064 nm and 532 nm,” Proc. SPIE 7842, 78420E (2010).
[CrossRef]

Ding, T.

X. Cheng, Z. Shen, H. Jiao, J. Zhang, B. Ma, T. Ding, J. Lu, X. Wang, and Z. Wang, “Laser damage study of nodules in electron-beam-evaporated HfO2/SiO2 high reflectors,” Appl. Opt. 50, C357–C363 (2011).
[CrossRef]

B. Ma, T. Ding, H. Jiao, G. Zhou, Z. Shen, X. Cheng, J. Zhang, H. Liu, Y. Ji, P. He, and Z. Wang, “LIDT of HfO2/SiO2 HR films by different test modes at 1064 nm and 532 nm,” Proc. SPIE 7842, 78420E (2010).
[CrossRef]

Dobrowolski, J. A.

J. A. Dobrowolski, “Optical properties of films and coatings,” in Handbook of Optics, M. Bass ed. (McGraw-Hill, 2010), pp. 7.69–7.73.

Fan, Z.

M. Zhu, K. Yi, Z. Fan, and J. Shao, “Theoretical and experimental research on spectral performance and laser induced damage of Brewster’s thin film polarizers,” Appl. Surf. Sci. 257, 6884–6888 (2011).
[CrossRef]

Fournet, C.

C. Fournet, B. Pinot, B. Geenen, F. Ollivier, and W. Alexandre, “High damage threshold mirrors and polarizers in the ZrO2/SiO2 and HfO2/SiO2 dielectric systems,” Proc. SPIE 1624, 282–293 (1991).
[CrossRef]

Geenen, B.

C. Fournet, B. Pinot, B. Geenen, F. Ollivier, and W. Alexandre, “High damage threshold mirrors and polarizers in the ZrO2/SiO2 and HfO2/SiO2 dielectric systems,” Proc. SPIE 1624, 282–293 (1991).
[CrossRef]

Genin, F. Y.

C. J. Stolz, F. Y. Genin, T. A. Reitter, N. Molau, R. P. Bevis, M. K. von Gunten, D. J. Smith, and J. F. Anzellotti, “Effect of SiO2 overcoat thickness on laser damage morphology of HfO2/SiO2 Brewster’s angle polarizers at 1064 nm,” Proc. SPIE 2966, 265–272 (1997).
[CrossRef]

F. Y. Genin, C. J. Stolz, T. Reitter, M. R. Kozlowski, R. P. Bevis, and M. K. von Gunten, “Effect of electric field distribution on the morphologies of laser-induced damage in hafnia-silica multilayer polarizers,” Proc. SPIE 2966, 342–352 (1997).
[CrossRef]

Griffin, A. J.

C. J. Stolz, M. D. Thomas, and A. J. Griffin, “BDS thin film damage competition,” Proc. SPIE 7132, 71320C(2010).
[CrossRef]

Gu, P. F.

He, P.

B. Ma, T. Ding, H. Jiao, G. Zhou, Z. Shen, X. Cheng, J. Zhang, H. Liu, Y. Ji, P. He, and Z. Wang, “LIDT of HfO2/SiO2 HR films by different test modes at 1064 nm and 532 nm,” Proc. SPIE 7842, 78420E (2010).
[CrossRef]

Howe, J. D.

J. B. Oliver, A. L. Rigatti, J. D. Howe, J. Keck, J. Szczepanski, A. W. Schmid, S. Papernov, A. Kozlov, and T. Z. Kosc, “Thin-film polarizers for the OMEGA EP laser system,” Proc. SPIE 5991, 599119 (2005).
[CrossRef]

Ji, Y.

B. Ma, T. Ding, H. Jiao, G. Zhou, Z. Shen, X. Cheng, J. Zhang, H. Liu, Y. Ji, P. He, and Z. Wang, “LIDT of HfO2/SiO2 HR films by different test modes at 1064 nm and 532 nm,” Proc. SPIE 7842, 78420E (2010).
[CrossRef]

Jiao, H.

X. Cheng, Z. Shen, H. Jiao, J. Zhang, B. Ma, T. Ding, J. Lu, X. Wang, and Z. Wang, “Laser damage study of nodules in electron-beam-evaporated HfO2/SiO2 high reflectors,” Appl. Opt. 50, C357–C363 (2011).
[CrossRef]

B. Ma, T. Ding, H. Jiao, G. Zhou, Z. Shen, X. Cheng, J. Zhang, H. Liu, Y. Ji, P. He, and Z. Wang, “LIDT of HfO2/SiO2 HR films by different test modes at 1064 nm and 532 nm,” Proc. SPIE 7842, 78420E (2010).
[CrossRef]

Keck, J.

J. B. Oliver, A. L. Rigatti, J. D. Howe, J. Keck, J. Szczepanski, A. W. Schmid, S. Papernov, A. Kozlov, and T. Z. Kosc, “Thin-film polarizers for the OMEGA EP laser system,” Proc. SPIE 5991, 599119 (2005).
[CrossRef]

Kelly, J. H.

L. J. Waxer, D. N. Maywar, J. H. Kelly, T. J. Kessler, B. E. Kruschwitz, S. J. Loucks, R. L. McCrory, D. D. Meyerhofer, S. F. B. Morse, C. Stoeckl, and J. D. Zuegel, “High-energy petawatt capability for the OMEGA laser,” Opt. Photonics News 16(7), 30–36 (2005).
[CrossRef]

Kessler, T. J.

L. J. Waxer, D. N. Maywar, J. H. Kelly, T. J. Kessler, B. E. Kruschwitz, S. J. Loucks, R. L. McCrory, D. D. Meyerhofer, S. F. B. Morse, C. Stoeckl, and J. D. Zuegel, “High-energy petawatt capability for the OMEGA laser,” Opt. Photonics News 16(7), 30–36 (2005).
[CrossRef]

Kmetec, J. D.

Kosc, T. Z.

J. B. Oliver, A. L. Rigatti, J. D. Howe, J. Keck, J. Szczepanski, A. W. Schmid, S. Papernov, A. Kozlov, and T. Z. Kosc, “Thin-film polarizers for the OMEGA EP laser system,” Proc. SPIE 5991, 599119 (2005).
[CrossRef]

Kozlov, A.

J. B. Oliver, A. L. Rigatti, J. D. Howe, J. Keck, J. Szczepanski, A. W. Schmid, S. Papernov, A. Kozlov, and T. Z. Kosc, “Thin-film polarizers for the OMEGA EP laser system,” Proc. SPIE 5991, 599119 (2005).
[CrossRef]

Kozlowski, M. R.

F. Y. Genin, C. J. Stolz, T. Reitter, M. R. Kozlowski, R. P. Bevis, and M. K. von Gunten, “Effect of electric field distribution on the morphologies of laser-induced damage in hafnia-silica multilayer polarizers,” Proc. SPIE 2966, 342–352 (1997).
[CrossRef]

Kruschwitz, B. E.

L. J. Waxer, D. N. Maywar, J. H. Kelly, T. J. Kessler, B. E. Kruschwitz, S. J. Loucks, R. L. McCrory, D. D. Meyerhofer, S. F. B. Morse, C. Stoeckl, and J. D. Zuegel, “High-energy petawatt capability for the OMEGA laser,” Opt. Photonics News 16(7), 30–36 (2005).
[CrossRef]

Liu, H.

B. Ma, T. Ding, H. Jiao, G. Zhou, Z. Shen, X. Cheng, J. Zhang, H. Liu, Y. Ji, P. He, and Z. Wang, “LIDT of HfO2/SiO2 HR films by different test modes at 1064 nm and 532 nm,” Proc. SPIE 7842, 78420E (2010).
[CrossRef]

Loucks, S. J.

L. J. Waxer, D. N. Maywar, J. H. Kelly, T. J. Kessler, B. E. Kruschwitz, S. J. Loucks, R. L. McCrory, D. D. Meyerhofer, S. F. B. Morse, C. Stoeckl, and J. D. Zuegel, “High-energy petawatt capability for the OMEGA laser,” Opt. Photonics News 16(7), 30–36 (2005).
[CrossRef]

Lu, J.

Ma, B.

X. Cheng, Z. Shen, H. Jiao, J. Zhang, B. Ma, T. Ding, J. Lu, X. Wang, and Z. Wang, “Laser damage study of nodules in electron-beam-evaporated HfO2/SiO2 high reflectors,” Appl. Opt. 50, C357–C363 (2011).
[CrossRef]

B. Ma, T. Ding, H. Jiao, G. Zhou, Z. Shen, X. Cheng, J. Zhang, H. Liu, Y. Ji, P. He, and Z. Wang, “LIDT of HfO2/SiO2 HR films by different test modes at 1064 nm and 532 nm,” Proc. SPIE 7842, 78420E (2010).
[CrossRef]

Macklin, J. J.

Mahlein, H. F.

Maywar, D. N.

L. J. Waxer, D. N. Maywar, J. H. Kelly, T. J. Kessler, B. E. Kruschwitz, S. J. Loucks, R. L. McCrory, D. D. Meyerhofer, S. F. B. Morse, C. Stoeckl, and J. D. Zuegel, “High-energy petawatt capability for the OMEGA laser,” Opt. Photonics News 16(7), 30–36 (2005).
[CrossRef]

McCrory, R. L.

L. J. Waxer, D. N. Maywar, J. H. Kelly, T. J. Kessler, B. E. Kruschwitz, S. J. Loucks, R. L. McCrory, D. D. Meyerhofer, S. F. B. Morse, C. Stoeckl, and J. D. Zuegel, “High-energy petawatt capability for the OMEGA laser,” Opt. Photonics News 16(7), 30–36 (2005).
[CrossRef]

Meyerhofer, D. D.

L. J. Waxer, D. N. Maywar, J. H. Kelly, T. J. Kessler, B. E. Kruschwitz, S. J. Loucks, R. L. McCrory, D. D. Meyerhofer, S. F. B. Morse, C. Stoeckl, and J. D. Zuegel, “High-energy petawatt capability for the OMEGA laser,” Opt. Photonics News 16(7), 30–36 (2005).
[CrossRef]

Molau, N.

C. J. Stolz, F. Y. Genin, T. A. Reitter, N. Molau, R. P. Bevis, M. K. von Gunten, D. J. Smith, and J. F. Anzellotti, “Effect of SiO2 overcoat thickness on laser damage morphology of HfO2/SiO2 Brewster’s angle polarizers at 1064 nm,” Proc. SPIE 2966, 265–272 (1997).
[CrossRef]

Morse, S. F. B.

L. J. Waxer, D. N. Maywar, J. H. Kelly, T. J. Kessler, B. E. Kruschwitz, S. J. Loucks, R. L. McCrory, D. D. Meyerhofer, S. F. B. Morse, C. Stoeckl, and J. D. Zuegel, “High-energy petawatt capability for the OMEGA laser,” Opt. Photonics News 16(7), 30–36 (2005).
[CrossRef]

Oliver, J. B.

J. B. Oliver, A. L. Rigatti, J. D. Howe, J. Keck, J. Szczepanski, A. W. Schmid, S. Papernov, A. Kozlov, and T. Z. Kosc, “Thin-film polarizers for the OMEGA EP laser system,” Proc. SPIE 5991, 599119 (2005).
[CrossRef]

Ollivier, F.

C. Fournet, B. Pinot, B. Geenen, F. Ollivier, and W. Alexandre, “High damage threshold mirrors and polarizers in the ZrO2/SiO2 and HfO2/SiO2 dielectric systems,” Proc. SPIE 1624, 282–293 (1991).
[CrossRef]

Papernov, S.

J. B. Oliver, A. L. Rigatti, J. D. Howe, J. Keck, J. Szczepanski, A. W. Schmid, S. Papernov, A. Kozlov, and T. Z. Kosc, “Thin-film polarizers for the OMEGA EP laser system,” Proc. SPIE 5991, 599119 (2005).
[CrossRef]

S. Papernov and A. W. Schmid, “High-spatial-resolution studies of UV-laser-damage morphology in SiO2 thin films with artificial defects,” Proc. SPIE 5647, 141–155 (2005).
[CrossRef]

Pinot, B.

C. Fournet, B. Pinot, B. Geenen, F. Ollivier, and W. Alexandre, “High damage threshold mirrors and polarizers in the ZrO2/SiO2 and HfO2/SiO2 dielectric systems,” Proc. SPIE 1624, 282–293 (1991).
[CrossRef]

Reitter, T.

F. Y. Genin, C. J. Stolz, T. Reitter, M. R. Kozlowski, R. P. Bevis, and M. K. von Gunten, “Effect of electric field distribution on the morphologies of laser-induced damage in hafnia-silica multilayer polarizers,” Proc. SPIE 2966, 342–352 (1997).
[CrossRef]

Reitter, T. A.

C. J. Stolz, F. Y. Genin, T. A. Reitter, N. Molau, R. P. Bevis, M. K. von Gunten, D. J. Smith, and J. F. Anzellotti, “Effect of SiO2 overcoat thickness on laser damage morphology of HfO2/SiO2 Brewster’s angle polarizers at 1064 nm,” Proc. SPIE 2966, 265–272 (1997).
[CrossRef]

Rigatti, A. L.

J. B. Oliver, A. L. Rigatti, J. D. Howe, J. Keck, J. Szczepanski, A. W. Schmid, S. Papernov, A. Kozlov, and T. Z. Kosc, “Thin-film polarizers for the OMEGA EP laser system,” Proc. SPIE 5991, 599119 (2005).
[CrossRef]

Schmid, A. W.

J. B. Oliver, A. L. Rigatti, J. D. Howe, J. Keck, J. Szczepanski, A. W. Schmid, S. Papernov, A. Kozlov, and T. Z. Kosc, “Thin-film polarizers for the OMEGA EP laser system,” Proc. SPIE 5991, 599119 (2005).
[CrossRef]

S. Papernov and A. W. Schmid, “High-spatial-resolution studies of UV-laser-damage morphology in SiO2 thin films with artificial defects,” Proc. SPIE 5647, 141–155 (2005).
[CrossRef]

Shao, J.

M. Zhu, K. Yi, Z. Fan, and J. Shao, “Theoretical and experimental research on spectral performance and laser induced damage of Brewster’s thin film polarizers,” Appl. Surf. Sci. 257, 6884–6888 (2011).
[CrossRef]

Shen, Z.

X. Cheng, Z. Shen, H. Jiao, J. Zhang, B. Ma, T. Ding, J. Lu, X. Wang, and Z. Wang, “Laser damage study of nodules in electron-beam-evaporated HfO2/SiO2 high reflectors,” Appl. Opt. 50, C357–C363 (2011).
[CrossRef]

B. Ma, T. Ding, H. Jiao, G. Zhou, Z. Shen, X. Cheng, J. Zhang, H. Liu, Y. Ji, P. He, and Z. Wang, “LIDT of HfO2/SiO2 HR films by different test modes at 1064 nm and 532 nm,” Proc. SPIE 7842, 78420E (2010).
[CrossRef]

Smith, D. J.

C. J. Stolz, F. Y. Genin, T. A. Reitter, N. Molau, R. P. Bevis, M. K. von Gunten, D. J. Smith, and J. F. Anzellotti, “Effect of SiO2 overcoat thickness on laser damage morphology of HfO2/SiO2 Brewster’s angle polarizers at 1064 nm,” Proc. SPIE 2966, 265–272 (1997).
[CrossRef]

Squier, J.

D. M. A. Aminou and J. Squier, “Broad band thin film plate polarizer for high power femtosecond solid-state lasers,” in Advanced Solid State Lasers, Vol. 15 of OSA Trends in Optics and Photonics Series (Optical Society of America, 1993), pp. 212–215.

Stoeckl, C.

L. J. Waxer, D. N. Maywar, J. H. Kelly, T. J. Kessler, B. E. Kruschwitz, S. J. Loucks, R. L. McCrory, D. D. Meyerhofer, S. F. B. Morse, C. Stoeckl, and J. D. Zuegel, “High-energy petawatt capability for the OMEGA laser,” Opt. Photonics News 16(7), 30–36 (2005).
[CrossRef]

Stolz, C. J.

C. J. Stolz, M. D. Thomas, and A. J. Griffin, “BDS thin film damage competition,” Proc. SPIE 7132, 71320C(2010).
[CrossRef]

C. J. Stolz, “Status of NIF mirror technologies for completion of the NIF facility,” Proc. SPIE 7101, 710115 (2008).
[CrossRef]

C. J. Stolz, “Brewster’s angle thin film plate polarizer design study from an electric field perspective,” Proc. SPIE 3738, 347–353 (1999).
[CrossRef]

F. Y. Genin, C. J. Stolz, T. Reitter, M. R. Kozlowski, R. P. Bevis, and M. K. von Gunten, “Effect of electric field distribution on the morphologies of laser-induced damage in hafnia-silica multilayer polarizers,” Proc. SPIE 2966, 342–352 (1997).
[CrossRef]

C. J. Stolz, F. Y. Genin, T. A. Reitter, N. Molau, R. P. Bevis, M. K. von Gunten, D. J. Smith, and J. F. Anzellotti, “Effect of SiO2 overcoat thickness on laser damage morphology of HfO2/SiO2 Brewster’s angle polarizers at 1064 nm,” Proc. SPIE 2966, 265–272 (1997).
[CrossRef]

Szczepanski, J.

J. B. Oliver, A. L. Rigatti, J. D. Howe, J. Keck, J. Szczepanski, A. W. Schmid, S. Papernov, A. Kozlov, and T. Z. Kosc, “Thin-film polarizers for the OMEGA EP laser system,” Proc. SPIE 5991, 599119 (2005).
[CrossRef]

Tang, J. F.

Thelen, A.

Thomas, M. D.

C. J. Stolz, M. D. Thomas, and A. J. Griffin, “BDS thin film damage competition,” Proc. SPIE 7132, 71320C(2010).
[CrossRef]

von Gunten, M. K.

C. J. Stolz, F. Y. Genin, T. A. Reitter, N. Molau, R. P. Bevis, M. K. von Gunten, D. J. Smith, and J. F. Anzellotti, “Effect of SiO2 overcoat thickness on laser damage morphology of HfO2/SiO2 Brewster’s angle polarizers at 1064 nm,” Proc. SPIE 2966, 265–272 (1997).
[CrossRef]

F. Y. Genin, C. J. Stolz, T. Reitter, M. R. Kozlowski, R. P. Bevis, and M. K. von Gunten, “Effect of electric field distribution on the morphologies of laser-induced damage in hafnia-silica multilayer polarizers,” Proc. SPIE 2966, 342–352 (1997).
[CrossRef]

Wang, X.

Wang, Z.

X. Cheng, Z. Shen, H. Jiao, J. Zhang, B. Ma, T. Ding, J. Lu, X. Wang, and Z. Wang, “Laser damage study of nodules in electron-beam-evaporated HfO2/SiO2 high reflectors,” Appl. Opt. 50, C357–C363 (2011).
[CrossRef]

B. Ma, T. Ding, H. Jiao, G. Zhou, Z. Shen, X. Cheng, J. Zhang, H. Liu, Y. Ji, P. He, and Z. Wang, “LIDT of HfO2/SiO2 HR films by different test modes at 1064 nm and 532 nm,” Proc. SPIE 7842, 78420E (2010).
[CrossRef]

Waxer, L. J.

L. J. Waxer, D. N. Maywar, J. H. Kelly, T. J. Kessler, B. E. Kruschwitz, S. J. Loucks, R. L. McCrory, D. D. Meyerhofer, S. F. B. Morse, C. Stoeckl, and J. D. Zuegel, “High-energy petawatt capability for the OMEGA laser,” Opt. Photonics News 16(7), 30–36 (2005).
[CrossRef]

Yi, K.

M. Zhu, K. Yi, Z. Fan, and J. Shao, “Theoretical and experimental research on spectral performance and laser induced damage of Brewster’s thin film polarizers,” Appl. Surf. Sci. 257, 6884–6888 (2011).
[CrossRef]

Young, J. F.

Zhang, J.

X. Cheng, Z. Shen, H. Jiao, J. Zhang, B. Ma, T. Ding, J. Lu, X. Wang, and Z. Wang, “Laser damage study of nodules in electron-beam-evaporated HfO2/SiO2 high reflectors,” Appl. Opt. 50, C357–C363 (2011).
[CrossRef]

B. Ma, T. Ding, H. Jiao, G. Zhou, Z. Shen, X. Cheng, J. Zhang, H. Liu, Y. Ji, P. He, and Z. Wang, “LIDT of HfO2/SiO2 HR films by different test modes at 1064 nm and 532 nm,” Proc. SPIE 7842, 78420E (2010).
[CrossRef]

Zhou, G.

B. Ma, T. Ding, H. Jiao, G. Zhou, Z. Shen, X. Cheng, J. Zhang, H. Liu, Y. Ji, P. He, and Z. Wang, “LIDT of HfO2/SiO2 HR films by different test modes at 1064 nm and 532 nm,” Proc. SPIE 7842, 78420E (2010).
[CrossRef]

Zhu, M.

M. Zhu, K. Yi, Z. Fan, and J. Shao, “Theoretical and experimental research on spectral performance and laser induced damage of Brewster’s thin film polarizers,” Appl. Surf. Sci. 257, 6884–6888 (2011).
[CrossRef]

Zuegel, J. D.

L. J. Waxer, D. N. Maywar, J. H. Kelly, T. J. Kessler, B. E. Kruschwitz, S. J. Loucks, R. L. McCrory, D. D. Meyerhofer, S. F. B. Morse, C. Stoeckl, and J. D. Zuegel, “High-energy petawatt capability for the OMEGA laser,” Opt. Photonics News 16(7), 30–36 (2005).
[CrossRef]

Appl. Opt. (1)

Appl. Surf. Sci. (1)

M. Zhu, K. Yi, Z. Fan, and J. Shao, “Theoretical and experimental research on spectral performance and laser induced damage of Brewster’s thin film polarizers,” Appl. Surf. Sci. 257, 6884–6888 (2011).
[CrossRef]

J. Opt. Soc. Am. (2)

Opt. Lett. (2)

Opt. Photonics News (1)

L. J. Waxer, D. N. Maywar, J. H. Kelly, T. J. Kessler, B. E. Kruschwitz, S. J. Loucks, R. L. McCrory, D. D. Meyerhofer, S. F. B. Morse, C. Stoeckl, and J. D. Zuegel, “High-energy petawatt capability for the OMEGA laser,” Opt. Photonics News 16(7), 30–36 (2005).
[CrossRef]

Proc. SPIE (9)

C. J. Stolz, F. Y. Genin, T. A. Reitter, N. Molau, R. P. Bevis, M. K. von Gunten, D. J. Smith, and J. F. Anzellotti, “Effect of SiO2 overcoat thickness on laser damage morphology of HfO2/SiO2 Brewster’s angle polarizers at 1064 nm,” Proc. SPIE 2966, 265–272 (1997).
[CrossRef]

F. Y. Genin, C. J. Stolz, T. Reitter, M. R. Kozlowski, R. P. Bevis, and M. K. von Gunten, “Effect of electric field distribution on the morphologies of laser-induced damage in hafnia-silica multilayer polarizers,” Proc. SPIE 2966, 342–352 (1997).
[CrossRef]

C. J. Stolz, “Brewster’s angle thin film plate polarizer design study from an electric field perspective,” Proc. SPIE 3738, 347–353 (1999).
[CrossRef]

C. J. Stolz, “Status of NIF mirror technologies for completion of the NIF facility,” Proc. SPIE 7101, 710115 (2008).
[CrossRef]

B. Ma, T. Ding, H. Jiao, G. Zhou, Z. Shen, X. Cheng, J. Zhang, H. Liu, Y. Ji, P. He, and Z. Wang, “LIDT of HfO2/SiO2 HR films by different test modes at 1064 nm and 532 nm,” Proc. SPIE 7842, 78420E (2010).
[CrossRef]

C. J. Stolz, M. D. Thomas, and A. J. Griffin, “BDS thin film damage competition,” Proc. SPIE 7132, 71320C(2010).
[CrossRef]

S. Papernov and A. W. Schmid, “High-spatial-resolution studies of UV-laser-damage morphology in SiO2 thin films with artificial defects,” Proc. SPIE 5647, 141–155 (2005).
[CrossRef]

C. Fournet, B. Pinot, B. Geenen, F. Ollivier, and W. Alexandre, “High damage threshold mirrors and polarizers in the ZrO2/SiO2 and HfO2/SiO2 dielectric systems,” Proc. SPIE 1624, 282–293 (1991).
[CrossRef]

J. B. Oliver, A. L. Rigatti, J. D. Howe, J. Keck, J. Szczepanski, A. W. Schmid, S. Papernov, A. Kozlov, and T. Z. Kosc, “Thin-film polarizers for the OMEGA EP laser system,” Proc. SPIE 5991, 599119 (2005).
[CrossRef]

Other (3)

D. M. A. Aminou and J. Squier, “Broad band thin film plate polarizer for high power femtosecond solid-state lasers,” in Advanced Solid State Lasers, Vol. 15 of OSA Trends in Optics and Photonics Series (Optical Society of America, 1993), pp. 212–215.

A. V. Tikhonravov and M. K. Trubetskov, Optilayer Thin Film Software, http://www.optilayer.com .

J. A. Dobrowolski, “Optical properties of films and coatings,” in Handbook of Optics, M. Bass ed. (McGraw-Hill, 2010), pp. 7.69–7.73.

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Figures (6)

Fig. 1.
Fig. 1.

Transmittance of LWP and SWP stacks at Brewster’s angle.

Fig. 2.
Fig. 2.

Film structure and calculated transmittance of S-L TFP.

Fig. 3.
Fig. 3.

Measured and calculated transmittance of (a) L-S and (b) S-L TFPs.

Fig. 4.
Fig. 4.

Damage morphology of TFPs for p polarization.

Fig. 5.
Fig. 5.

Damage morphology of S-L and L-S TFPs for s polarization.

Fig. 6.
Fig. 6.

Electric field profile of S-L, L-S, and LWP TFPs for s polarization.

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