Abstract

The time-dependent absorption at 790 nm of TiO2 films prepared by ion-beam sputtering (IBS) and electron-beam evaporation (EBE) was measured. The pump source was a Ti:sapphire oscillator that was operated in CW and pulsed (50 fs) modes. The absorption coefficient of the IBS film under CW illumination was 8cm1, independent of time and power. Under pulsed illumination, there was evidence of three-photon absorption, and the total absorption increased 10-fold over time at the highest measured irradiance. The absorption of the EBE film had higher initial absorption (24cm1) and increased under both CW and pulsed illumination with time. An electron state model based on band-to-band excitation and electron trapping is presented that explains the observed results. The implications for laser-induced damage of oxide coatings are discussed.

© 2013 Optical Society of America

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