X. G. Chen, S. Y. Liu, C. W. Zhang, and J. L. Zhu, “Improved measurement accuracy in optical scatterometry using fitting error interpolation based library search,” Measurement 46, 2638–2646 (2013).

[CrossRef]

N. F. Zhang, R. M. Silver, H. Zhou, and B. M. Barnes, “Improving optical measurement uncertainty with combined multitool metrology using a Bayesian approach,” Appl. Opt. 51, 6196–6206 (2012).

[CrossRef]

S. Y. Liu, Y. Ma, X. G. Chen, and C. W. Zhang, “Estimation of the convergence order of rigorous coupled-wave analysis for binary gratings in optical critical dimension metrology,” Opt. Eng. 51, 081504 (2012).

[CrossRef]

J. Pomplun and F. Schmidt, “Accelerated a posterior error estimation for the reduced basis method with application to 3D electromagnetic scattering problems,” SIAM J. Sci. Comput. 32, 498–520 (2010).

[CrossRef]

J. Li, J. J. Hwu, Y. Liu, S. Rabello, Z. Liu, and J. Hu, “Mueller matrix measurement of asymmetric gratings,” J. Micro/Nanolith. MEMS MOEMS 9, 041305 (2010).

C. W. Zhang, S. Y. Liu, T. L. Shi, and Z. R. Tang, “Improved model-based infrared reflectrometry for measuring deep trench structures,” J. Opt. Soc. Am. A 26, 2327–2335 (2009).

[CrossRef]

T. A. Germer, H. J. Patrick, R. M. Silver, and B. Bunday, “Developing an uncertainty analysis for optical scatterometry,” Proc. SPIE 7272, 72720T (2009).

[CrossRef]

H. J. Patrick, R. Attota, B. M. Barnes, T. A. Germer, R. G. Dixson, M. T. Stocker, R. M. Silver, and M. R. Bishop, “Optical critical dimension measurement of silicon grating targets using focal plane scatterfield microscopy,” J. Micro/Nanolith. MEMS MOEMS 7, 013012 (2008).

C. H. Ko and Y. S. Ku, “Overlay measurement using angular scatterometer for the capability of integrated metrology,” Opt. Express 14, 6001–6010 (2006).

[CrossRef]

T. Novikova, A. De Martino, S. B. Hatit, and B. Drévillon, “Application of Mueller polarimetry in conical diffraction for critical dimension measurements in microelectronics,” Appl. Opt. 45, 3688–3697 (2006).

[CrossRef]

H. Gross, R. Model, M. Bär, M. Wurm, B. Bodermann, and A. Rathsfeld, “Mathematical modelling of indirect measurements in scatterometry,” Measurement 39, 782–794 (2006).

[CrossRef]

Y. S. Ku, S. C. Wang, D. M. Shyu, and N. Smith, “Scatterometry-based metrology with feature region signatures matching,” Opt. Express 14, 8482–8491 (2006).

[CrossRef]

M. Littau, D. Forman, J. Bruce, C. J. Raymond, and S. G. Hummel, “Diffraction signature analysis methods for improving scatterometry precision,” Proc. SPIE 6152, 615236 (2006).

[CrossRef]

C. Raymond, “Overview of scatterometry applications in high volume silicon manufacturing,” AIP Conf. Proc. 788, 394–402 (2005).

[CrossRef]

C. J. Raymond, M. Littau, A. Chuprin, and S. Ward, “Comparison of solutions to the scatterometry inverse problems,” Proc. SPIE 5375, 564–575 (2004).

[CrossRef]

P. Thony, D. Herisson, D. Henry, E. Severgnini, and M. Vasconi, “Review of CD measurement and scatterometry,” AIP Conf. Proc. 683, 381–388 (2003).

[CrossRef]

E. Drége, J. Reed, and D. Byrne, “Linearized inversion of scatterometric data to obtain surface profile information,” Opt. Eng. 41, 225–236 (2002).

[CrossRef]

X. Niu, N. Jakatdar, J. Bao, and C. J. Spanos, “Specular spectroscopic scatterometry,” IEEE Trans. Semicond. Manuf. 14, 97–111 (2001).

[CrossRef]

H. T. Huang, W. Kong, and F. L. Terry, “Normal-incidence spectroscopic ellipsometry for critical dimension monitoring,” Appl. Phys. Lett. 78, 2985–3983 (2001).

[CrossRef]

B. K. Minhas, S. A. Coulombe, S. Sohail, H. Naqvi, and J. R. McNeil, “Ellipsometric scatterometry for metrology of sub-0.1 μm linewidth structures,” Appl. Opt. 37, 5112–5115 (1998).

[CrossRef]

H. Ichikawa, “Electromagnetic analysis of diffraction gratings by the finite-difference time-domain method,” J. Opt. Soc. Am. A 15, 152–157 (1998).

[CrossRef]

C. M. Herzinger, B. Johs, W. A. McGahan, J. A. Woollam, and W. Paulson, “Ellipsometric determination of optical constants for silicon and thermally grown silicon dioxide via a multi-sample, multi-wavelength, multi-angle investigation,” J. Appl. Phys. 83, 3323–3336 (1998).

[CrossRef]

D. T. Lee and C. K. Wong, “Worst-case analysis for region and partial region searches in multidimensional binary search trees and balanced quad trees,” Acta Inform. 9, 23–29 (1977).

[CrossRef]

J. L. Bentley, “Multidimensional binary search trees used for associative searching,” Commun. ACM 18, 509–517 (1975).

[CrossRef]

H. J. Patrick, R. Attota, B. M. Barnes, T. A. Germer, R. G. Dixson, M. T. Stocker, R. M. Silver, and M. R. Bishop, “Optical critical dimension measurement of silicon grating targets using focal plane scatterfield microscopy,” J. Micro/Nanolith. MEMS MOEMS 7, 013012 (2008).

X. Niu, N. Jakatdar, J. Bao, and C. J. Spanos, “Specular spectroscopic scatterometry,” IEEE Trans. Semicond. Manuf. 14, 97–111 (2001).

[CrossRef]

H. Gross, R. Model, M. Bär, M. Wurm, B. Bodermann, and A. Rathsfeld, “Mathematical modelling of indirect measurements in scatterometry,” Measurement 39, 782–794 (2006).

[CrossRef]

N. F. Zhang, R. M. Silver, H. Zhou, and B. M. Barnes, “Improving optical measurement uncertainty with combined multitool metrology using a Bayesian approach,” Appl. Opt. 51, 6196–6206 (2012).

[CrossRef]

H. J. Patrick, R. Attota, B. M. Barnes, T. A. Germer, R. G. Dixson, M. T. Stocker, R. M. Silver, and M. R. Bishop, “Optical critical dimension measurement of silicon grating targets using focal plane scatterfield microscopy,” J. Micro/Nanolith. MEMS MOEMS 7, 013012 (2008).

J. L. Bentley, “Multidimensional binary search trees used for associative searching,” Commun. ACM 18, 509–517 (1975).

[CrossRef]

H. J. Patrick, R. Attota, B. M. Barnes, T. A. Germer, R. G. Dixson, M. T. Stocker, R. M. Silver, and M. R. Bishop, “Optical critical dimension measurement of silicon grating targets using focal plane scatterfield microscopy,” J. Micro/Nanolith. MEMS MOEMS 7, 013012 (2008).

H. Gross, R. Model, M. Bär, M. Wurm, B. Bodermann, and A. Rathsfeld, “Mathematical modelling of indirect measurements in scatterometry,” Measurement 39, 782–794 (2006).

[CrossRef]

M. Littau, D. Forman, J. Bruce, C. J. Raymond, and S. G. Hummel, “Diffraction signature analysis methods for improving scatterometry precision,” Proc. SPIE 6152, 615236 (2006).

[CrossRef]

T. A. Germer, H. J. Patrick, R. M. Silver, and B. Bunday, “Developing an uncertainty analysis for optical scatterometry,” Proc. SPIE 7272, 72720T (2009).

[CrossRef]

E. Drége, J. Reed, and D. Byrne, “Linearized inversion of scatterometric data to obtain surface profile information,” Opt. Eng. 41, 225–236 (2002).

[CrossRef]

X. G. Chen, S. Y. Liu, C. W. Zhang, and J. L. Zhu, “Improved measurement accuracy in optical scatterometry using fitting error interpolation based library search,” Measurement 46, 2638–2646 (2013).

[CrossRef]

S. Y. Liu, Y. Ma, X. G. Chen, and C. W. Zhang, “Estimation of the convergence order of rigorous coupled-wave analysis for binary gratings in optical critical dimension metrology,” Opt. Eng. 51, 081504 (2012).

[CrossRef]

C. J. Raymond, M. Littau, A. Chuprin, and S. Ward, “Comparison of solutions to the scatterometry inverse problems,” Proc. SPIE 5375, 564–575 (2004).

[CrossRef]

H. J. Patrick, R. Attota, B. M. Barnes, T. A. Germer, R. G. Dixson, M. T. Stocker, R. M. Silver, and M. R. Bishop, “Optical critical dimension measurement of silicon grating targets using focal plane scatterfield microscopy,” J. Micro/Nanolith. MEMS MOEMS 7, 013012 (2008).

E. Drége, J. Reed, and D. Byrne, “Linearized inversion of scatterometric data to obtain surface profile information,” Opt. Eng. 41, 225–236 (2002).

[CrossRef]

M. Littau, D. Forman, J. Bruce, C. J. Raymond, and S. G. Hummel, “Diffraction signature analysis methods for improving scatterometry precision,” Proc. SPIE 6152, 615236 (2006).

[CrossRef]

T. A. Germer, H. J. Patrick, R. M. Silver, and B. Bunday, “Developing an uncertainty analysis for optical scatterometry,” Proc. SPIE 7272, 72720T (2009).

[CrossRef]

H. J. Patrick, R. Attota, B. M. Barnes, T. A. Germer, R. G. Dixson, M. T. Stocker, R. M. Silver, and M. R. Bishop, “Optical critical dimension measurement of silicon grating targets using focal plane scatterfield microscopy,” J. Micro/Nanolith. MEMS MOEMS 7, 013012 (2008).

A. Gionis, P. Indyk, and P. Motwani, “Similarity search in high dimensions via hashing,” Proc. VLDB, 518–529 (1999).

H. Gross, R. Model, M. Bär, M. Wurm, B. Bodermann, and A. Rathsfeld, “Mathematical modelling of indirect measurements in scatterometry,” Measurement 39, 782–794 (2006).

[CrossRef]

P. Thony, D. Herisson, D. Henry, E. Severgnini, and M. Vasconi, “Review of CD measurement and scatterometry,” AIP Conf. Proc. 683, 381–388 (2003).

[CrossRef]

P. Thony, D. Herisson, D. Henry, E. Severgnini, and M. Vasconi, “Review of CD measurement and scatterometry,” AIP Conf. Proc. 683, 381–388 (2003).

[CrossRef]

C. M. Herzinger, B. Johs, W. A. McGahan, J. A. Woollam, and W. Paulson, “Ellipsometric determination of optical constants for silicon and thermally grown silicon dioxide via a multi-sample, multi-wavelength, multi-angle investigation,” J. Appl. Phys. 83, 3323–3336 (1998).

[CrossRef]

J. Li, J. J. Hwu, Y. Liu, S. Rabello, Z. Liu, and J. Hu, “Mueller matrix measurement of asymmetric gratings,” J. Micro/Nanolith. MEMS MOEMS 9, 041305 (2010).

H. T. Huang, W. Kong, and F. L. Terry, “Normal-incidence spectroscopic ellipsometry for critical dimension monitoring,” Appl. Phys. Lett. 78, 2985–3983 (2001).

[CrossRef]

M. Littau, D. Forman, J. Bruce, C. J. Raymond, and S. G. Hummel, “Diffraction signature analysis methods for improving scatterometry precision,” Proc. SPIE 6152, 615236 (2006).

[CrossRef]

J. Li, J. J. Hwu, Y. Liu, S. Rabello, Z. Liu, and J. Hu, “Mueller matrix measurement of asymmetric gratings,” J. Micro/Nanolith. MEMS MOEMS 9, 041305 (2010).

A. Gionis, P. Indyk, and P. Motwani, “Similarity search in high dimensions via hashing,” Proc. VLDB, 518–529 (1999).

X. Niu, N. Jakatdar, J. Bao, and C. J. Spanos, “Specular spectroscopic scatterometry,” IEEE Trans. Semicond. Manuf. 14, 97–111 (2001).

[CrossRef]

G. E. Jellison and F. A. Modine, “Parameterization of the optical functions of amorphous materials in the interband region,” Appl. Phys. Lett. 69, 371–373 (1996).

[CrossRef]

C. M. Herzinger, B. Johs, W. A. McGahan, J. A. Woollam, and W. Paulson, “Ellipsometric determination of optical constants for silicon and thermally grown silicon dioxide via a multi-sample, multi-wavelength, multi-angle investigation,” J. Appl. Phys. 83, 3323–3336 (1998).

[CrossRef]

H. T. Huang, W. Kong, and F. L. Terry, “Normal-incidence spectroscopic ellipsometry for critical dimension monitoring,” Appl. Phys. Lett. 78, 2985–3983 (2001).

[CrossRef]

D. T. Lee and C. K. Wong, “Worst-case analysis for region and partial region searches in multidimensional binary search trees and balanced quad trees,” Acta Inform. 9, 23–29 (1977).

[CrossRef]

J. Li, J. J. Hwu, Y. Liu, S. Rabello, Z. Liu, and J. Hu, “Mueller matrix measurement of asymmetric gratings,” J. Micro/Nanolith. MEMS MOEMS 9, 041305 (2010).

M. Littau, D. Forman, J. Bruce, C. J. Raymond, and S. G. Hummel, “Diffraction signature analysis methods for improving scatterometry precision,” Proc. SPIE 6152, 615236 (2006).

[CrossRef]

C. J. Raymond, M. Littau, A. Chuprin, and S. Ward, “Comparison of solutions to the scatterometry inverse problems,” Proc. SPIE 5375, 564–575 (2004).

[CrossRef]

X. G. Chen, S. Y. Liu, C. W. Zhang, and J. L. Zhu, “Improved measurement accuracy in optical scatterometry using fitting error interpolation based library search,” Measurement 46, 2638–2646 (2013).

[CrossRef]

S. Y. Liu, Y. Ma, X. G. Chen, and C. W. Zhang, “Estimation of the convergence order of rigorous coupled-wave analysis for binary gratings in optical critical dimension metrology,” Opt. Eng. 51, 081504 (2012).

[CrossRef]

C. W. Zhang, S. Y. Liu, T. L. Shi, and Z. R. Tang, “Improved model-based infrared reflectrometry for measuring deep trench structures,” J. Opt. Soc. Am. A 26, 2327–2335 (2009).

[CrossRef]

J. Li, J. J. Hwu, Y. Liu, S. Rabello, Z. Liu, and J. Hu, “Mueller matrix measurement of asymmetric gratings,” J. Micro/Nanolith. MEMS MOEMS 9, 041305 (2010).

J. Li, J. J. Hwu, Y. Liu, S. Rabello, Z. Liu, and J. Hu, “Mueller matrix measurement of asymmetric gratings,” J. Micro/Nanolith. MEMS MOEMS 9, 041305 (2010).

S. Y. Liu, Y. Ma, X. G. Chen, and C. W. Zhang, “Estimation of the convergence order of rigorous coupled-wave analysis for binary gratings in optical critical dimension metrology,” Opt. Eng. 51, 081504 (2012).

[CrossRef]

C. M. Herzinger, B. Johs, W. A. McGahan, J. A. Woollam, and W. Paulson, “Ellipsometric determination of optical constants for silicon and thermally grown silicon dioxide via a multi-sample, multi-wavelength, multi-angle investigation,” J. Appl. Phys. 83, 3323–3336 (1998).

[CrossRef]

H. Gross, R. Model, M. Bär, M. Wurm, B. Bodermann, and A. Rathsfeld, “Mathematical modelling of indirect measurements in scatterometry,” Measurement 39, 782–794 (2006).

[CrossRef]

G. E. Jellison and F. A. Modine, “Parameterization of the optical functions of amorphous materials in the interband region,” Appl. Phys. Lett. 69, 371–373 (1996).

[CrossRef]

A. Gionis, P. Indyk, and P. Motwani, “Similarity search in high dimensions via hashing,” Proc. VLDB, 518–529 (1999).

X. Niu, N. Jakatdar, J. Bao, and C. J. Spanos, “Specular spectroscopic scatterometry,” IEEE Trans. Semicond. Manuf. 14, 97–111 (2001).

[CrossRef]

T. A. Germer, H. J. Patrick, R. M. Silver, and B. Bunday, “Developing an uncertainty analysis for optical scatterometry,” Proc. SPIE 7272, 72720T (2009).

[CrossRef]

H. J. Patrick, R. Attota, B. M. Barnes, T. A. Germer, R. G. Dixson, M. T. Stocker, R. M. Silver, and M. R. Bishop, “Optical critical dimension measurement of silicon grating targets using focal plane scatterfield microscopy,” J. Micro/Nanolith. MEMS MOEMS 7, 013012 (2008).

C. M. Herzinger, B. Johs, W. A. McGahan, J. A. Woollam, and W. Paulson, “Ellipsometric determination of optical constants for silicon and thermally grown silicon dioxide via a multi-sample, multi-wavelength, multi-angle investigation,” J. Appl. Phys. 83, 3323–3336 (1998).

[CrossRef]

J. Pomplun and F. Schmidt, “Accelerated a posterior error estimation for the reduced basis method with application to 3D electromagnetic scattering problems,” SIAM J. Sci. Comput. 32, 498–520 (2010).

[CrossRef]

J. Li, J. J. Hwu, Y. Liu, S. Rabello, Z. Liu, and J. Hu, “Mueller matrix measurement of asymmetric gratings,” J. Micro/Nanolith. MEMS MOEMS 9, 041305 (2010).

H. Gross, R. Model, M. Bär, M. Wurm, B. Bodermann, and A. Rathsfeld, “Mathematical modelling of indirect measurements in scatterometry,” Measurement 39, 782–794 (2006).

[CrossRef]

C. Raymond, “Overview of scatterometry applications in high volume silicon manufacturing,” AIP Conf. Proc. 788, 394–402 (2005).

[CrossRef]

M. Littau, D. Forman, J. Bruce, C. J. Raymond, and S. G. Hummel, “Diffraction signature analysis methods for improving scatterometry precision,” Proc. SPIE 6152, 615236 (2006).

[CrossRef]

C. J. Raymond, M. Littau, A. Chuprin, and S. Ward, “Comparison of solutions to the scatterometry inverse problems,” Proc. SPIE 5375, 564–575 (2004).

[CrossRef]

C. J. Raymond, “Scatterometry for semiconductor metrology,” in Handbook of Silicon Semiconductor Metrology, A. C. Diebold, ed. (Academic, 2001), Chap. 18, pp. 477–514.

E. Drége, J. Reed, and D. Byrne, “Linearized inversion of scatterometric data to obtain surface profile information,” Opt. Eng. 41, 225–236 (2002).

[CrossRef]

J. Pomplun and F. Schmidt, “Accelerated a posterior error estimation for the reduced basis method with application to 3D electromagnetic scattering problems,” SIAM J. Sci. Comput. 32, 498–520 (2010).

[CrossRef]

P. Thony, D. Herisson, D. Henry, E. Severgnini, and M. Vasconi, “Review of CD measurement and scatterometry,” AIP Conf. Proc. 683, 381–388 (2003).

[CrossRef]

N. F. Zhang, R. M. Silver, H. Zhou, and B. M. Barnes, “Improving optical measurement uncertainty with combined multitool metrology using a Bayesian approach,” Appl. Opt. 51, 6196–6206 (2012).

[CrossRef]

T. A. Germer, H. J. Patrick, R. M. Silver, and B. Bunday, “Developing an uncertainty analysis for optical scatterometry,” Proc. SPIE 7272, 72720T (2009).

[CrossRef]

H. J. Patrick, R. Attota, B. M. Barnes, T. A. Germer, R. G. Dixson, M. T. Stocker, R. M. Silver, and M. R. Bishop, “Optical critical dimension measurement of silicon grating targets using focal plane scatterfield microscopy,” J. Micro/Nanolith. MEMS MOEMS 7, 013012 (2008).

X. Niu, N. Jakatdar, J. Bao, and C. J. Spanos, “Specular spectroscopic scatterometry,” IEEE Trans. Semicond. Manuf. 14, 97–111 (2001).

[CrossRef]

H. J. Patrick, R. Attota, B. M. Barnes, T. A. Germer, R. G. Dixson, M. T. Stocker, R. M. Silver, and M. R. Bishop, “Optical critical dimension measurement of silicon grating targets using focal plane scatterfield microscopy,” J. Micro/Nanolith. MEMS MOEMS 7, 013012 (2008).

H. T. Huang, W. Kong, and F. L. Terry, “Normal-incidence spectroscopic ellipsometry for critical dimension monitoring,” Appl. Phys. Lett. 78, 2985–3983 (2001).

[CrossRef]

P. Thony, D. Herisson, D. Henry, E. Severgnini, and M. Vasconi, “Review of CD measurement and scatterometry,” AIP Conf. Proc. 683, 381–388 (2003).

[CrossRef]

P. Thony, D. Herisson, D. Henry, E. Severgnini, and M. Vasconi, “Review of CD measurement and scatterometry,” AIP Conf. Proc. 683, 381–388 (2003).

[CrossRef]

C. J. Raymond, M. Littau, A. Chuprin, and S. Ward, “Comparison of solutions to the scatterometry inverse problems,” Proc. SPIE 5375, 564–575 (2004).

[CrossRef]

D. T. Lee and C. K. Wong, “Worst-case analysis for region and partial region searches in multidimensional binary search trees and balanced quad trees,” Acta Inform. 9, 23–29 (1977).

[CrossRef]

C. M. Herzinger, B. Johs, W. A. McGahan, J. A. Woollam, and W. Paulson, “Ellipsometric determination of optical constants for silicon and thermally grown silicon dioxide via a multi-sample, multi-wavelength, multi-angle investigation,” J. Appl. Phys. 83, 3323–3336 (1998).

[CrossRef]

H. Gross, R. Model, M. Bär, M. Wurm, B. Bodermann, and A. Rathsfeld, “Mathematical modelling of indirect measurements in scatterometry,” Measurement 39, 782–794 (2006).

[CrossRef]

X. G. Chen, S. Y. Liu, C. W. Zhang, and J. L. Zhu, “Improved measurement accuracy in optical scatterometry using fitting error interpolation based library search,” Measurement 46, 2638–2646 (2013).

[CrossRef]

S. Y. Liu, Y. Ma, X. G. Chen, and C. W. Zhang, “Estimation of the convergence order of rigorous coupled-wave analysis for binary gratings in optical critical dimension metrology,” Opt. Eng. 51, 081504 (2012).

[CrossRef]

C. W. Zhang, S. Y. Liu, T. L. Shi, and Z. R. Tang, “Improved model-based infrared reflectrometry for measuring deep trench structures,” J. Opt. Soc. Am. A 26, 2327–2335 (2009).

[CrossRef]

X. G. Chen, S. Y. Liu, C. W. Zhang, and J. L. Zhu, “Improved measurement accuracy in optical scatterometry using fitting error interpolation based library search,” Measurement 46, 2638–2646 (2013).

[CrossRef]

D. T. Lee and C. K. Wong, “Worst-case analysis for region and partial region searches in multidimensional binary search trees and balanced quad trees,” Acta Inform. 9, 23–29 (1977).

[CrossRef]

P. Thony, D. Herisson, D. Henry, E. Severgnini, and M. Vasconi, “Review of CD measurement and scatterometry,” AIP Conf. Proc. 683, 381–388 (2003).

[CrossRef]

C. Raymond, “Overview of scatterometry applications in high volume silicon manufacturing,” AIP Conf. Proc. 788, 394–402 (2005).

[CrossRef]

T. Novikova, A. De Martino, S. B. Hatit, and B. Drévillon, “Application of Mueller polarimetry in conical diffraction for critical dimension measurements in microelectronics,” Appl. Opt. 45, 3688–3697 (2006).

[CrossRef]

B. K. Minhas, S. A. Coulombe, S. Sohail, H. Naqvi, and J. R. McNeil, “Ellipsometric scatterometry for metrology of sub-0.1 μm linewidth structures,” Appl. Opt. 37, 5112–5115 (1998).

[CrossRef]

N. F. Zhang, R. M. Silver, H. Zhou, and B. M. Barnes, “Improving optical measurement uncertainty with combined multitool metrology using a Bayesian approach,” Appl. Opt. 51, 6196–6206 (2012).

[CrossRef]

G. E. Jellison and F. A. Modine, “Parameterization of the optical functions of amorphous materials in the interband region,” Appl. Phys. Lett. 69, 371–373 (1996).

[CrossRef]

H. T. Huang, W. Kong, and F. L. Terry, “Normal-incidence spectroscopic ellipsometry for critical dimension monitoring,” Appl. Phys. Lett. 78, 2985–3983 (2001).

[CrossRef]

J. L. Bentley, “Multidimensional binary search trees used for associative searching,” Commun. ACM 18, 509–517 (1975).

[CrossRef]

X. Niu, N. Jakatdar, J. Bao, and C. J. Spanos, “Specular spectroscopic scatterometry,” IEEE Trans. Semicond. Manuf. 14, 97–111 (2001).

[CrossRef]

C. M. Herzinger, B. Johs, W. A. McGahan, J. A. Woollam, and W. Paulson, “Ellipsometric determination of optical constants for silicon and thermally grown silicon dioxide via a multi-sample, multi-wavelength, multi-angle investigation,” J. Appl. Phys. 83, 3323–3336 (1998).

[CrossRef]

H. J. Patrick, R. Attota, B. M. Barnes, T. A. Germer, R. G. Dixson, M. T. Stocker, R. M. Silver, and M. R. Bishop, “Optical critical dimension measurement of silicon grating targets using focal plane scatterfield microscopy,” J. Micro/Nanolith. MEMS MOEMS 7, 013012 (2008).

J. Li, J. J. Hwu, Y. Liu, S. Rabello, Z. Liu, and J. Hu, “Mueller matrix measurement of asymmetric gratings,” J. Micro/Nanolith. MEMS MOEMS 9, 041305 (2010).

M. G. Moharam, E. B. Grann, D. A. Pommet, and T. K. Gaylord, “Formulation of stable and efficient implementation of the rigorous coupled wave analysis of binary gratings,” J. Opt. Soc. Am. A 12, 1068–1076 (1995).

[CrossRef]

L. Li, “Use of Fourier series in the analysis of discontinuous periodic structures,” J. Opt. Soc. Am. A 13, 1870–1876 (1996).

[CrossRef]

Y. Nakata and M. Kashiba, “Boundary-element analysis of plane-wave diffraction from groove-type dielectric and metallic gratings,” J. Opt. Soc. Am. A 7, 1494–1502 (1990).

[CrossRef]

H. Ichikawa, “Electromagnetic analysis of diffraction gratings by the finite-difference time-domain method,” J. Opt. Soc. Am. A 15, 152–157 (1998).

[CrossRef]

C. W. Zhang, S. Y. Liu, T. L. Shi, and Z. R. Tang, “Improved model-based infrared reflectrometry for measuring deep trench structures,” J. Opt. Soc. Am. A 26, 2327–2335 (2009).

[CrossRef]

H. Gross, R. Model, M. Bär, M. Wurm, B. Bodermann, and A. Rathsfeld, “Mathematical modelling of indirect measurements in scatterometry,” Measurement 39, 782–794 (2006).

[CrossRef]

X. G. Chen, S. Y. Liu, C. W. Zhang, and J. L. Zhu, “Improved measurement accuracy in optical scatterometry using fitting error interpolation based library search,” Measurement 46, 2638–2646 (2013).

[CrossRef]

S. Y. Liu, Y. Ma, X. G. Chen, and C. W. Zhang, “Estimation of the convergence order of rigorous coupled-wave analysis for binary gratings in optical critical dimension metrology,” Opt. Eng. 51, 081504 (2012).

[CrossRef]

E. Drége, J. Reed, and D. Byrne, “Linearized inversion of scatterometric data to obtain surface profile information,” Opt. Eng. 41, 225–236 (2002).

[CrossRef]

M. Littau, D. Forman, J. Bruce, C. J. Raymond, and S. G. Hummel, “Diffraction signature analysis methods for improving scatterometry precision,” Proc. SPIE 6152, 615236 (2006).

[CrossRef]

T. A. Germer, H. J. Patrick, R. M. Silver, and B. Bunday, “Developing an uncertainty analysis for optical scatterometry,” Proc. SPIE 7272, 72720T (2009).

[CrossRef]

C. J. Raymond, M. Littau, A. Chuprin, and S. Ward, “Comparison of solutions to the scatterometry inverse problems,” Proc. SPIE 5375, 564–575 (2004).

[CrossRef]

J. Pomplun and F. Schmidt, “Accelerated a posterior error estimation for the reduced basis method with application to 3D electromagnetic scattering problems,” SIAM J. Sci. Comput. 32, 498–520 (2010).

[CrossRef]

C. J. Raymond, “Scatterometry for semiconductor metrology,” in Handbook of Silicon Semiconductor Metrology, A. C. Diebold, ed. (Academic, 2001), Chap. 18, pp. 477–514.

A. Gionis, P. Indyk, and P. Motwani, “Similarity search in high dimensions via hashing,” Proc. VLDB, 518–529 (1999).