Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group

Investigations on the catastrophic damage in multilayer dielectric films

Not Accessible

Your library or personal account may give you access

Abstract

HfO2/SiO2 coatings are always fluence-limited by a class of rare catastrophic failures induced by a nanosecond laser with a wavelength of 1053 nm. The catastrophic damage in HfO2/SiO2 coatings behaves as the damage growth with repeated laser irradiation, and thus eventually limits the mirror performance. Understanding the damage processes and mechanisms associated with the catastrophic damage are important for reducing the occurrence of the catastrophic failure and allowing the HfO2/SiO2 coatings to survive at the high fluence required by high laser systems. The rough damage behavior of the catastrophic failure at the proper critical fluence is present. The pit and delamination in the catastrophic failure are investigated to find the possible reasons leading to the catastrophic failure. The experimental results indicate that nodular defect originated from the substrate easily incurs the catastrophic damage. The electric field enhancements of the pit and the substrate impurities may contribute to this phenomenon. The delamination is always present on the left of the pit when laser irradiates from left to right at oblique incidence, which may be related to the plasma plume toward the laser incidence.

© 2013 Optical Society of America

Full Article  |  PDF Article
More Like This
Characteristics of plasma scalds in multilayer dielectric films

Xiaofeng Liu, Yuan’an Zhao, Dawei Li, Guohang Hu, Yanqi Gao, Zhengxiu Fan, and Jianda Shao
Appl. Opt. 50(21) 4226-4231 (2011)

Laser damage study of nodules in electron-beam-evaporated HfO2/SiO2 high reflectors

Xinbin Cheng, Zhengxiang Shen, Hongfei Jiao, Jinlong Zhang, Bin Ma, Tao Ding, Jiangtao Lu, Xiaodong Wang, and Zhanshan Wang
Appl. Opt. 50(9) C357-C363 (2011)

Investigations on single and multiple pulse laser-induced damages in HfO2/SiO2 multilayer dielectric films at 1064 nm

Wenwen Liu, Chaoyang Wei, Jianbo Wu, Zhenkun Yu, Hui Cui, Kui Yi, and Jianda Shao
Opt. Express 21(19) 22476-22487 (2013)

Cited By

You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription

Figures (8)

You do not have subscription access to this journal. Figure files are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription

Select as filters


Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All Rights Reserved