Abstract
In this paper different mixtures are prepared by metallic mode reactive sputtering. The samples were sputtered from cylindrical targets in a sputter-up configuration using an additional plasma source for oxidization. The different ratios of and in the mixtures are prepared by a target sputtering power variation. Optical film properties of the mixtures such as refractive index, which is determined by ellipsometric measurements, and optical bandgap, which is measured by photometric (transmission) measurements, are investigated. The thin-film structure is investigated by x-ray diffraction analysis and the stress of the films is presented. It is shown that the metallic mode reactive sputtering in the present configuration is applicable to continuously tune optical and mechanical properties. Finally the sputtered mixed materials are compared with other optical standard materials such as , , , and .
© 2012 Optical Society of America
Full Article | PDF ArticleMore Like This
Jan Kischkat, Sven Peters, Bernd Gruska, Mykhaylo Semtsiv, Mikaela Chashnikova, Matthias Klinkmüller, Oliana Fedosenko, Stephan Machulik, Anna Aleksandrova, Gregorii Monastyrskyi, Yuri Flores, and W. Ted Masselink
Appl. Opt. 51(28) 6789-6798 (2012)
Daniel Rademacher, Benjamin Fritz, and Michael Vergöhl
Appl. Opt. 51(7) 927-935 (2012)
Shigeng Song, Sijia Cai, Daxing Han, Carlos García Nuñez, Gong Zhang, Gavin Wallace, Lewis Fleming, Kieran Craig, Stuart Reid, Iain W. Martin, Sheila Rowan, and Des Gibson
Appl. Opt. 62(7) B73-B78 (2023)