S. Weihong, W. Fan, and H. Xi, “Simulation analysis on absolute testing of spherical surface with shift-rotation method,” High Power Laser Particle Beams 23, 1–5 (2011) (in Chinese).

X. Chen, C. Lei, and W. Tu-ya, “Rotational variant error removal of the reference flat,” Acta Meterol. Sin. 31, 219–222 (2010) (in Chinese).

K. Otaki, T. Yamamoto, and Y. Fukuda, “Accuracy evaluation of the point diffraction interferometer for extreme ultraviolet lithography aspheric mirror,” J. Vac. Sci. Technol. B 20, 295–300 (2002).

[CrossRef]

S.-W. Kim and H.-G. Rhee, “Self-calibration of high frequency errors of test optics by arbitrary N-step rotation,” Int. J. Korean Soc. Precision Eng. 1, 115–123 (2000).

P. Hariharan, “Interferometric testing of optical surfaces: absolute measurements of flatness,” Opt. Eng. 36, 2478–2481 (1997).

[CrossRef]

L. A. Selberg, “Interferometer accuracy and precision,” Proc. SPIE 1400, 24–32 (1990).

[CrossRef]

B. S. Fritz, “Absolute calibration of an optical flat,” Opt. Eng. 23, 379–383 (1984).

W. Otto and Aalen-Waldhausen, “Method for the interferometric measurement of non-rotationally symmetric wavefront errors,” U.S. patent 6,839,143 (4January2005).

X. Chen, C. Lei, and W. Tu-ya, “Rotational variant error removal of the reference flat,” Acta Meterol. Sin. 31, 219–222 (2010) (in Chinese).

S. Weihong, W. Fan, and H. Xi, “Simulation analysis on absolute testing of spherical surface with shift-rotation method,” High Power Laser Particle Beams 23, 1–5 (2011) (in Chinese).

B. S. Fritz, “Absolute calibration of an optical flat,” Opt. Eng. 23, 379–383 (1984).

K. Otaki, T. Yamamoto, and Y. Fukuda, “Accuracy evaluation of the point diffraction interferometer for extreme ultraviolet lithography aspheric mirror,” J. Vac. Sci. Technol. B 20, 295–300 (2002).

[CrossRef]

P. Hariharan, “Interferometric testing of optical surfaces: absolute measurements of flatness,” Opt. Eng. 36, 2478–2481 (1997).

[CrossRef]

H. Ichikawa and T. Yamamoto, “Apparatus and method for wavefront absolute calibration and method of synthesizing wavefronts,” U.S. patent 5,982,490 (9November1999).

S.-W. Kim and H.-G. Rhee, “Self-calibration of high frequency errors of test optics by arbitrary N-step rotation,” Int. J. Korean Soc. Precision Eng. 1, 115–123 (2000).

X. Chen, C. Lei, and W. Tu-ya, “Rotational variant error removal of the reference flat,” Acta Meterol. Sin. 31, 219–222 (2010) (in Chinese).

D. Malacara, Optical Shop Testing3rd ed. (Wiley, 2007).

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K. Otaki, T. Yamamoto, and Y. Fukuda, “Accuracy evaluation of the point diffraction interferometer for extreme ultraviolet lithography aspheric mirror,” J. Vac. Sci. Technol. B 20, 295–300 (2002).

[CrossRef]

G. Seitz and W. Otto, “Method for the interferometric measurement of non-rotationally symmetric wavefront errors,” U.S. patent 7,277,186 (2October2007).

W. Otto and Aalen-Waldhausen, “Method for the interferometric measurement of non-rotationally symmetric wavefront errors,” U.S. patent 6,839,143 (4January2005).

S.-W. Kim and H.-G. Rhee, “Self-calibration of high frequency errors of test optics by arbitrary N-step rotation,” Int. J. Korean Soc. Precision Eng. 1, 115–123 (2000).

G. Seitz and W. Otto, “Method for the interferometric measurement of non-rotationally symmetric wavefront errors,” U.S. patent 7,277,186 (2October2007).

L. A. Selberg, “Interferometer accuracy and precision,” Proc. SPIE 1400, 24–32 (1990).

[CrossRef]

X. Chen, C. Lei, and W. Tu-ya, “Rotational variant error removal of the reference flat,” Acta Meterol. Sin. 31, 219–222 (2010) (in Chinese).

S. Weihong, W. Fan, and H. Xi, “Simulation analysis on absolute testing of spherical surface with shift-rotation method,” High Power Laser Particle Beams 23, 1–5 (2011) (in Chinese).

S. Weihong, W. Fan, and H. Xi, “Simulation analysis on absolute testing of spherical surface with shift-rotation method,” High Power Laser Particle Beams 23, 1–5 (2011) (in Chinese).

K. Otaki, T. Yamamoto, and Y. Fukuda, “Accuracy evaluation of the point diffraction interferometer for extreme ultraviolet lithography aspheric mirror,” J. Vac. Sci. Technol. B 20, 295–300 (2002).

[CrossRef]

H. Ichikawa and T. Yamamoto, “Apparatus and method for wavefront absolute calibration and method of synthesizing wavefronts,” U.S. patent 5,982,490 (9November1999).

X. Chen, C. Lei, and W. Tu-ya, “Rotational variant error removal of the reference flat,” Acta Meterol. Sin. 31, 219–222 (2010) (in Chinese).

C. J. Evans and R. N. Kestner, “Test optics error removal,” Appl. Opt. 35, 1015–1021 (1996).

[CrossRef]

V. Greco, R. Tronconi, C. Del Vecchio, M. Trivi, and G. Molesini, “Absolute measurement of planarity with Fritz’s method: uncertainty evaluation,” Appl. Opt. 38, 2018–2027 (1999).

[CrossRef]

S. Weihong, W. Fan, and H. Xi, “Simulation analysis on absolute testing of spherical surface with shift-rotation method,” High Power Laser Particle Beams 23, 1–5 (2011) (in Chinese).

S.-W. Kim and H.-G. Rhee, “Self-calibration of high frequency errors of test optics by arbitrary N-step rotation,” Int. J. Korean Soc. Precision Eng. 1, 115–123 (2000).

K. Otaki, T. Yamamoto, and Y. Fukuda, “Accuracy evaluation of the point diffraction interferometer for extreme ultraviolet lithography aspheric mirror,” J. Vac. Sci. Technol. B 20, 295–300 (2002).

[CrossRef]

B. S. Fritz, “Absolute calibration of an optical flat,” Opt. Eng. 23, 379–383 (1984).

P. Hariharan, “Interferometric testing of optical surfaces: absolute measurements of flatness,” Opt. Eng. 36, 2478–2481 (1997).

[CrossRef]

L. A. Selberg, “Interferometer accuracy and precision,” Proc. SPIE 1400, 24–32 (1990).

[CrossRef]

G. Seitz and W. Otto, “Method for the interferometric measurement of non-rotationally symmetric wavefront errors,” U.S. patent 7,277,186 (2October2007).

W. Otto and Aalen-Waldhausen, “Method for the interferometric measurement of non-rotationally symmetric wavefront errors,” U.S. patent 6,839,143 (4January2005).

D. Malacara, Optical Shop Testing3rd ed. (Wiley, 2007).

C. B. Moler, Numerical Computing with MATLAB (SIAM, 2004).

H. Ichikawa and T. Yamamoto, “Apparatus and method for wavefront absolute calibration and method of synthesizing wavefronts,” U.S. patent 5,982,490 (9November1999).