Abstract

This study presents a special k-type (45°, 135°) microprism structure design for the lateral-type semiconductor laser of optical systems. This study combines front- and back-side inclined exposure technology to develop a k-type microprism structure and replaces the optical prism manufactured through traditional machine processing or injection molding with a new polymer (thick-film negative photoresists) micro-optical prism structure. To obtain the optimal structural surface roughness (12–15 nm at 400μm×400μm area), the percentage of polymer material loss caused by the solvent was controlled. This roughness level meets Blu-ray specifications (λ/10, λ=405nm).

© 2012 Optical Society of America

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  1. K. Manoh, H. Yoshida, T. Kobayashi, M. Takase, K. Yamauchii, S. Fuchiwha, T. Ohno, N. Nishi, M. Ozawa, M. Ikeda, T. Tojyo, and T. Taniguchi, “Small integrated optical head device using a blue-violet laser diode for Blu-ray disc system,” Jpn. J. Appl. Phys. 42, 880–884 (2003).
    [CrossRef]
  2. J. S. Sohn, E. H. Cho, M. Lee, H. S. Kim, M. Jung, S. D. Suh, W. C. Kim, N. C. Park, and Y. P. Park, “Development of microlens for high-density small-form-factor optical pickup,” Jpn. J. Appl. Phys. 45, 1144–1151 (2006).
    [CrossRef]
  3. Y. S. Kim, S. J. Lee, N. C. Park, and Y. P. Park, “Design of wafer-based NA 0.85 micro objective lens and integrated pick up module for small sized optical drive,” Microsyst. Technol. 11, 1048–1055 (2005).
    [CrossRef]
  4. T. D. Milster, “Near-field optics: a new tool for data storage,” Proc. IEEE 88, 1480–1490 (2000).
    [CrossRef]
  5. K. S. Jung, “Design of optical path of pickup for small form factor optical disk drive,” Microsyst. Technol. 11, 1041–1047 (2005).
    [CrossRef]
  6. C. H. Lee, K. Jiang, and G. J. Davies, “Sidewall roughness characterization and comparison between silicon and SU-8 microcomponents,” Mater. Charact. 58, 603–609 (2007).
    [CrossRef]
  7. W. J. Kang, E. Rabe, S. Kopetz, and A. Neyer, “Novel exposure methods based on reflection and refraction effects in the field of SU-8 lithography,” J. Micromech. Microeng. 16, 821–831 (2006).
    [CrossRef]
  8. K. Y. Hung, H. T. Hu, and F. G. Tseng, “Application 3D glycerol-compensated inclined-exposure technology to integrated optical pick-up head,” J. Micromech. Microeng. 14, 975–983 (2004).
    [CrossRef]
  9. R. Yang and W. J. Wang, “A numerical and experimental study on gap compensation and wavelength selection in UV-lithography of ultra-high aspect ratio SU-8 microstructures,” Sens. Actuators B 110, 279–288 (2005).
    [CrossRef]
  10. K. Y. Hung and J. C. Liao, “The application of Fresnel equations and anti-reflection technology to improve inclined exposure interface reflection and develop a key component needed for Blu-ray DVD—micro-mirrors,” J. Micromech. Microeng. 18, 075022 (2008).
  11. K. Y. Hung and T. H. Liang, “Application of inclined-exposure and thick film process for high aspect-ratio micro structures on polymer optic devices,” J. Micromech. Microeng. 14, 1217–1222 (2008).
  12. M. H. Nguyen, C. J. Chang, M. C. Lee, and F. G. Tseng, “SU8 3D prisms with ultra small inclined angle for low-insertion-loss fiber/waveguide interconnection,” Opt. Express 19, 18956–18964 (2011).
    [CrossRef]
  13. E. Rabe, S. Kopetz, and A. Neyer, “The generation of mould patterns for multimode optical waveguide components by direct laser writing of SU-8 at 364 nm,” J. Micromech. Microeng. 17, 1664–1670 (2007).
    [CrossRef]
  14. K. Kim, D. S. Park, H. M. Lu, W. Che, K. Kim, J. B. Lee, and C. H. Ahn, “A tapered hollow metallic microneedle array using backside exposure of SU-8,” J. Micromech. Microeng. 14, 597–603 (2004).
    [CrossRef]
  15. O. Mert and S. Mutlu, “Self-aligned polymer thin film transistors fabricated using backside exposure,” presented at the 5th International Thin Film Transistor Conference (ITC 2009), Palaiseau, France, 5–6 March 2009.
  16. I. H. Song, K. N. Kang, Y. Y. Jin, D. S. W. Park, and P. K. Ajmera, “Microlens array fabrication by backside exposure using Fraunhofer diffraction,” Microsyst. Technol. 14, 1285–1290 (2008).
    [CrossRef]

2011 (1)

2008 (3)

I. H. Song, K. N. Kang, Y. Y. Jin, D. S. W. Park, and P. K. Ajmera, “Microlens array fabrication by backside exposure using Fraunhofer diffraction,” Microsyst. Technol. 14, 1285–1290 (2008).
[CrossRef]

K. Y. Hung and J. C. Liao, “The application of Fresnel equations and anti-reflection technology to improve inclined exposure interface reflection and develop a key component needed for Blu-ray DVD—micro-mirrors,” J. Micromech. Microeng. 18, 075022 (2008).

K. Y. Hung and T. H. Liang, “Application of inclined-exposure and thick film process for high aspect-ratio micro structures on polymer optic devices,” J. Micromech. Microeng. 14, 1217–1222 (2008).

2007 (2)

E. Rabe, S. Kopetz, and A. Neyer, “The generation of mould patterns for multimode optical waveguide components by direct laser writing of SU-8 at 364 nm,” J. Micromech. Microeng. 17, 1664–1670 (2007).
[CrossRef]

C. H. Lee, K. Jiang, and G. J. Davies, “Sidewall roughness characterization and comparison between silicon and SU-8 microcomponents,” Mater. Charact. 58, 603–609 (2007).
[CrossRef]

2006 (2)

W. J. Kang, E. Rabe, S. Kopetz, and A. Neyer, “Novel exposure methods based on reflection and refraction effects in the field of SU-8 lithography,” J. Micromech. Microeng. 16, 821–831 (2006).
[CrossRef]

J. S. Sohn, E. H. Cho, M. Lee, H. S. Kim, M. Jung, S. D. Suh, W. C. Kim, N. C. Park, and Y. P. Park, “Development of microlens for high-density small-form-factor optical pickup,” Jpn. J. Appl. Phys. 45, 1144–1151 (2006).
[CrossRef]

2005 (3)

Y. S. Kim, S. J. Lee, N. C. Park, and Y. P. Park, “Design of wafer-based NA 0.85 micro objective lens and integrated pick up module for small sized optical drive,” Microsyst. Technol. 11, 1048–1055 (2005).
[CrossRef]

K. S. Jung, “Design of optical path of pickup for small form factor optical disk drive,” Microsyst. Technol. 11, 1041–1047 (2005).
[CrossRef]

R. Yang and W. J. Wang, “A numerical and experimental study on gap compensation and wavelength selection in UV-lithography of ultra-high aspect ratio SU-8 microstructures,” Sens. Actuators B 110, 279–288 (2005).
[CrossRef]

2004 (2)

K. Y. Hung, H. T. Hu, and F. G. Tseng, “Application 3D glycerol-compensated inclined-exposure technology to integrated optical pick-up head,” J. Micromech. Microeng. 14, 975–983 (2004).
[CrossRef]

K. Kim, D. S. Park, H. M. Lu, W. Che, K. Kim, J. B. Lee, and C. H. Ahn, “A tapered hollow metallic microneedle array using backside exposure of SU-8,” J. Micromech. Microeng. 14, 597–603 (2004).
[CrossRef]

2003 (1)

K. Manoh, H. Yoshida, T. Kobayashi, M. Takase, K. Yamauchii, S. Fuchiwha, T. Ohno, N. Nishi, M. Ozawa, M. Ikeda, T. Tojyo, and T. Taniguchi, “Small integrated optical head device using a blue-violet laser diode for Blu-ray disc system,” Jpn. J. Appl. Phys. 42, 880–884 (2003).
[CrossRef]

2000 (1)

T. D. Milster, “Near-field optics: a new tool for data storage,” Proc. IEEE 88, 1480–1490 (2000).
[CrossRef]

Ahn, C. H.

K. Kim, D. S. Park, H. M. Lu, W. Che, K. Kim, J. B. Lee, and C. H. Ahn, “A tapered hollow metallic microneedle array using backside exposure of SU-8,” J. Micromech. Microeng. 14, 597–603 (2004).
[CrossRef]

Ajmera, P. K.

I. H. Song, K. N. Kang, Y. Y. Jin, D. S. W. Park, and P. K. Ajmera, “Microlens array fabrication by backside exposure using Fraunhofer diffraction,” Microsyst. Technol. 14, 1285–1290 (2008).
[CrossRef]

Chang, C. J.

Che, W.

K. Kim, D. S. Park, H. M. Lu, W. Che, K. Kim, J. B. Lee, and C. H. Ahn, “A tapered hollow metallic microneedle array using backside exposure of SU-8,” J. Micromech. Microeng. 14, 597–603 (2004).
[CrossRef]

Cho, E. H.

J. S. Sohn, E. H. Cho, M. Lee, H. S. Kim, M. Jung, S. D. Suh, W. C. Kim, N. C. Park, and Y. P. Park, “Development of microlens for high-density small-form-factor optical pickup,” Jpn. J. Appl. Phys. 45, 1144–1151 (2006).
[CrossRef]

Davies, G. J.

C. H. Lee, K. Jiang, and G. J. Davies, “Sidewall roughness characterization and comparison between silicon and SU-8 microcomponents,” Mater. Charact. 58, 603–609 (2007).
[CrossRef]

Fuchiwha, S.

K. Manoh, H. Yoshida, T. Kobayashi, M. Takase, K. Yamauchii, S. Fuchiwha, T. Ohno, N. Nishi, M. Ozawa, M. Ikeda, T. Tojyo, and T. Taniguchi, “Small integrated optical head device using a blue-violet laser diode for Blu-ray disc system,” Jpn. J. Appl. Phys. 42, 880–884 (2003).
[CrossRef]

Hu, H. T.

K. Y. Hung, H. T. Hu, and F. G. Tseng, “Application 3D glycerol-compensated inclined-exposure technology to integrated optical pick-up head,” J. Micromech. Microeng. 14, 975–983 (2004).
[CrossRef]

Hung, K. Y.

K. Y. Hung and T. H. Liang, “Application of inclined-exposure and thick film process for high aspect-ratio micro structures on polymer optic devices,” J. Micromech. Microeng. 14, 1217–1222 (2008).

K. Y. Hung and J. C. Liao, “The application of Fresnel equations and anti-reflection technology to improve inclined exposure interface reflection and develop a key component needed for Blu-ray DVD—micro-mirrors,” J. Micromech. Microeng. 18, 075022 (2008).

K. Y. Hung, H. T. Hu, and F. G. Tseng, “Application 3D glycerol-compensated inclined-exposure technology to integrated optical pick-up head,” J. Micromech. Microeng. 14, 975–983 (2004).
[CrossRef]

Ikeda, M.

K. Manoh, H. Yoshida, T. Kobayashi, M. Takase, K. Yamauchii, S. Fuchiwha, T. Ohno, N. Nishi, M. Ozawa, M. Ikeda, T. Tojyo, and T. Taniguchi, “Small integrated optical head device using a blue-violet laser diode for Blu-ray disc system,” Jpn. J. Appl. Phys. 42, 880–884 (2003).
[CrossRef]

Jiang, K.

C. H. Lee, K. Jiang, and G. J. Davies, “Sidewall roughness characterization and comparison between silicon and SU-8 microcomponents,” Mater. Charact. 58, 603–609 (2007).
[CrossRef]

Jin, Y. Y.

I. H. Song, K. N. Kang, Y. Y. Jin, D. S. W. Park, and P. K. Ajmera, “Microlens array fabrication by backside exposure using Fraunhofer diffraction,” Microsyst. Technol. 14, 1285–1290 (2008).
[CrossRef]

Jung, K. S.

K. S. Jung, “Design of optical path of pickup for small form factor optical disk drive,” Microsyst. Technol. 11, 1041–1047 (2005).
[CrossRef]

Jung, M.

J. S. Sohn, E. H. Cho, M. Lee, H. S. Kim, M. Jung, S. D. Suh, W. C. Kim, N. C. Park, and Y. P. Park, “Development of microlens for high-density small-form-factor optical pickup,” Jpn. J. Appl. Phys. 45, 1144–1151 (2006).
[CrossRef]

Kang, K. N.

I. H. Song, K. N. Kang, Y. Y. Jin, D. S. W. Park, and P. K. Ajmera, “Microlens array fabrication by backside exposure using Fraunhofer diffraction,” Microsyst. Technol. 14, 1285–1290 (2008).
[CrossRef]

Kang, W. J.

W. J. Kang, E. Rabe, S. Kopetz, and A. Neyer, “Novel exposure methods based on reflection and refraction effects in the field of SU-8 lithography,” J. Micromech. Microeng. 16, 821–831 (2006).
[CrossRef]

Kim, H. S.

J. S. Sohn, E. H. Cho, M. Lee, H. S. Kim, M. Jung, S. D. Suh, W. C. Kim, N. C. Park, and Y. P. Park, “Development of microlens for high-density small-form-factor optical pickup,” Jpn. J. Appl. Phys. 45, 1144–1151 (2006).
[CrossRef]

Kim, K.

K. Kim, D. S. Park, H. M. Lu, W. Che, K. Kim, J. B. Lee, and C. H. Ahn, “A tapered hollow metallic microneedle array using backside exposure of SU-8,” J. Micromech. Microeng. 14, 597–603 (2004).
[CrossRef]

K. Kim, D. S. Park, H. M. Lu, W. Che, K. Kim, J. B. Lee, and C. H. Ahn, “A tapered hollow metallic microneedle array using backside exposure of SU-8,” J. Micromech. Microeng. 14, 597–603 (2004).
[CrossRef]

Kim, W. C.

J. S. Sohn, E. H. Cho, M. Lee, H. S. Kim, M. Jung, S. D. Suh, W. C. Kim, N. C. Park, and Y. P. Park, “Development of microlens for high-density small-form-factor optical pickup,” Jpn. J. Appl. Phys. 45, 1144–1151 (2006).
[CrossRef]

Kim, Y. S.

Y. S. Kim, S. J. Lee, N. C. Park, and Y. P. Park, “Design of wafer-based NA 0.85 micro objective lens and integrated pick up module for small sized optical drive,” Microsyst. Technol. 11, 1048–1055 (2005).
[CrossRef]

Kobayashi, T.

K. Manoh, H. Yoshida, T. Kobayashi, M. Takase, K. Yamauchii, S. Fuchiwha, T. Ohno, N. Nishi, M. Ozawa, M. Ikeda, T. Tojyo, and T. Taniguchi, “Small integrated optical head device using a blue-violet laser diode for Blu-ray disc system,” Jpn. J. Appl. Phys. 42, 880–884 (2003).
[CrossRef]

Kopetz, S.

E. Rabe, S. Kopetz, and A. Neyer, “The generation of mould patterns for multimode optical waveguide components by direct laser writing of SU-8 at 364 nm,” J. Micromech. Microeng. 17, 1664–1670 (2007).
[CrossRef]

W. J. Kang, E. Rabe, S. Kopetz, and A. Neyer, “Novel exposure methods based on reflection and refraction effects in the field of SU-8 lithography,” J. Micromech. Microeng. 16, 821–831 (2006).
[CrossRef]

Lee, C. H.

C. H. Lee, K. Jiang, and G. J. Davies, “Sidewall roughness characterization and comparison between silicon and SU-8 microcomponents,” Mater. Charact. 58, 603–609 (2007).
[CrossRef]

Lee, J. B.

K. Kim, D. S. Park, H. M. Lu, W. Che, K. Kim, J. B. Lee, and C. H. Ahn, “A tapered hollow metallic microneedle array using backside exposure of SU-8,” J. Micromech. Microeng. 14, 597–603 (2004).
[CrossRef]

Lee, M.

J. S. Sohn, E. H. Cho, M. Lee, H. S. Kim, M. Jung, S. D. Suh, W. C. Kim, N. C. Park, and Y. P. Park, “Development of microlens for high-density small-form-factor optical pickup,” Jpn. J. Appl. Phys. 45, 1144–1151 (2006).
[CrossRef]

Lee, M. C.

Lee, S. J.

Y. S. Kim, S. J. Lee, N. C. Park, and Y. P. Park, “Design of wafer-based NA 0.85 micro objective lens and integrated pick up module for small sized optical drive,” Microsyst. Technol. 11, 1048–1055 (2005).
[CrossRef]

Liang, T. H.

K. Y. Hung and T. H. Liang, “Application of inclined-exposure and thick film process for high aspect-ratio micro structures on polymer optic devices,” J. Micromech. Microeng. 14, 1217–1222 (2008).

Liao, J. C.

K. Y. Hung and J. C. Liao, “The application of Fresnel equations and anti-reflection technology to improve inclined exposure interface reflection and develop a key component needed for Blu-ray DVD—micro-mirrors,” J. Micromech. Microeng. 18, 075022 (2008).

Lu, H. M.

K. Kim, D. S. Park, H. M. Lu, W. Che, K. Kim, J. B. Lee, and C. H. Ahn, “A tapered hollow metallic microneedle array using backside exposure of SU-8,” J. Micromech. Microeng. 14, 597–603 (2004).
[CrossRef]

Manoh, K.

K. Manoh, H. Yoshida, T. Kobayashi, M. Takase, K. Yamauchii, S. Fuchiwha, T. Ohno, N. Nishi, M. Ozawa, M. Ikeda, T. Tojyo, and T. Taniguchi, “Small integrated optical head device using a blue-violet laser diode for Blu-ray disc system,” Jpn. J. Appl. Phys. 42, 880–884 (2003).
[CrossRef]

Mert, O.

O. Mert and S. Mutlu, “Self-aligned polymer thin film transistors fabricated using backside exposure,” presented at the 5th International Thin Film Transistor Conference (ITC 2009), Palaiseau, France, 5–6 March 2009.

Milster, T. D.

T. D. Milster, “Near-field optics: a new tool for data storage,” Proc. IEEE 88, 1480–1490 (2000).
[CrossRef]

Mutlu, S.

O. Mert and S. Mutlu, “Self-aligned polymer thin film transistors fabricated using backside exposure,” presented at the 5th International Thin Film Transistor Conference (ITC 2009), Palaiseau, France, 5–6 March 2009.

Neyer, A.

E. Rabe, S. Kopetz, and A. Neyer, “The generation of mould patterns for multimode optical waveguide components by direct laser writing of SU-8 at 364 nm,” J. Micromech. Microeng. 17, 1664–1670 (2007).
[CrossRef]

W. J. Kang, E. Rabe, S. Kopetz, and A. Neyer, “Novel exposure methods based on reflection and refraction effects in the field of SU-8 lithography,” J. Micromech. Microeng. 16, 821–831 (2006).
[CrossRef]

Nguyen, M. H.

Nishi, N.

K. Manoh, H. Yoshida, T. Kobayashi, M. Takase, K. Yamauchii, S. Fuchiwha, T. Ohno, N. Nishi, M. Ozawa, M. Ikeda, T. Tojyo, and T. Taniguchi, “Small integrated optical head device using a blue-violet laser diode for Blu-ray disc system,” Jpn. J. Appl. Phys. 42, 880–884 (2003).
[CrossRef]

Ohno, T.

K. Manoh, H. Yoshida, T. Kobayashi, M. Takase, K. Yamauchii, S. Fuchiwha, T. Ohno, N. Nishi, M. Ozawa, M. Ikeda, T. Tojyo, and T. Taniguchi, “Small integrated optical head device using a blue-violet laser diode for Blu-ray disc system,” Jpn. J. Appl. Phys. 42, 880–884 (2003).
[CrossRef]

Ozawa, M.

K. Manoh, H. Yoshida, T. Kobayashi, M. Takase, K. Yamauchii, S. Fuchiwha, T. Ohno, N. Nishi, M. Ozawa, M. Ikeda, T. Tojyo, and T. Taniguchi, “Small integrated optical head device using a blue-violet laser diode for Blu-ray disc system,” Jpn. J. Appl. Phys. 42, 880–884 (2003).
[CrossRef]

Park, D. S.

K. Kim, D. S. Park, H. M. Lu, W. Che, K. Kim, J. B. Lee, and C. H. Ahn, “A tapered hollow metallic microneedle array using backside exposure of SU-8,” J. Micromech. Microeng. 14, 597–603 (2004).
[CrossRef]

Park, D. S. W.

I. H. Song, K. N. Kang, Y. Y. Jin, D. S. W. Park, and P. K. Ajmera, “Microlens array fabrication by backside exposure using Fraunhofer diffraction,” Microsyst. Technol. 14, 1285–1290 (2008).
[CrossRef]

Park, N. C.

J. S. Sohn, E. H. Cho, M. Lee, H. S. Kim, M. Jung, S. D. Suh, W. C. Kim, N. C. Park, and Y. P. Park, “Development of microlens for high-density small-form-factor optical pickup,” Jpn. J. Appl. Phys. 45, 1144–1151 (2006).
[CrossRef]

Y. S. Kim, S. J. Lee, N. C. Park, and Y. P. Park, “Design of wafer-based NA 0.85 micro objective lens and integrated pick up module for small sized optical drive,” Microsyst. Technol. 11, 1048–1055 (2005).
[CrossRef]

Park, Y. P.

J. S. Sohn, E. H. Cho, M. Lee, H. S. Kim, M. Jung, S. D. Suh, W. C. Kim, N. C. Park, and Y. P. Park, “Development of microlens for high-density small-form-factor optical pickup,” Jpn. J. Appl. Phys. 45, 1144–1151 (2006).
[CrossRef]

Y. S. Kim, S. J. Lee, N. C. Park, and Y. P. Park, “Design of wafer-based NA 0.85 micro objective lens and integrated pick up module for small sized optical drive,” Microsyst. Technol. 11, 1048–1055 (2005).
[CrossRef]

Rabe, E.

E. Rabe, S. Kopetz, and A. Neyer, “The generation of mould patterns for multimode optical waveguide components by direct laser writing of SU-8 at 364 nm,” J. Micromech. Microeng. 17, 1664–1670 (2007).
[CrossRef]

W. J. Kang, E. Rabe, S. Kopetz, and A. Neyer, “Novel exposure methods based on reflection and refraction effects in the field of SU-8 lithography,” J. Micromech. Microeng. 16, 821–831 (2006).
[CrossRef]

Sohn, J. S.

J. S. Sohn, E. H. Cho, M. Lee, H. S. Kim, M. Jung, S. D. Suh, W. C. Kim, N. C. Park, and Y. P. Park, “Development of microlens for high-density small-form-factor optical pickup,” Jpn. J. Appl. Phys. 45, 1144–1151 (2006).
[CrossRef]

Song, I. H.

I. H. Song, K. N. Kang, Y. Y. Jin, D. S. W. Park, and P. K. Ajmera, “Microlens array fabrication by backside exposure using Fraunhofer diffraction,” Microsyst. Technol. 14, 1285–1290 (2008).
[CrossRef]

Suh, S. D.

J. S. Sohn, E. H. Cho, M. Lee, H. S. Kim, M. Jung, S. D. Suh, W. C. Kim, N. C. Park, and Y. P. Park, “Development of microlens for high-density small-form-factor optical pickup,” Jpn. J. Appl. Phys. 45, 1144–1151 (2006).
[CrossRef]

Takase, M.

K. Manoh, H. Yoshida, T. Kobayashi, M. Takase, K. Yamauchii, S. Fuchiwha, T. Ohno, N. Nishi, M. Ozawa, M. Ikeda, T. Tojyo, and T. Taniguchi, “Small integrated optical head device using a blue-violet laser diode for Blu-ray disc system,” Jpn. J. Appl. Phys. 42, 880–884 (2003).
[CrossRef]

Taniguchi, T.

K. Manoh, H. Yoshida, T. Kobayashi, M. Takase, K. Yamauchii, S. Fuchiwha, T. Ohno, N. Nishi, M. Ozawa, M. Ikeda, T. Tojyo, and T. Taniguchi, “Small integrated optical head device using a blue-violet laser diode for Blu-ray disc system,” Jpn. J. Appl. Phys. 42, 880–884 (2003).
[CrossRef]

Tojyo, T.

K. Manoh, H. Yoshida, T. Kobayashi, M. Takase, K. Yamauchii, S. Fuchiwha, T. Ohno, N. Nishi, M. Ozawa, M. Ikeda, T. Tojyo, and T. Taniguchi, “Small integrated optical head device using a blue-violet laser diode for Blu-ray disc system,” Jpn. J. Appl. Phys. 42, 880–884 (2003).
[CrossRef]

Tseng, F. G.

M. H. Nguyen, C. J. Chang, M. C. Lee, and F. G. Tseng, “SU8 3D prisms with ultra small inclined angle for low-insertion-loss fiber/waveguide interconnection,” Opt. Express 19, 18956–18964 (2011).
[CrossRef]

K. Y. Hung, H. T. Hu, and F. G. Tseng, “Application 3D glycerol-compensated inclined-exposure technology to integrated optical pick-up head,” J. Micromech. Microeng. 14, 975–983 (2004).
[CrossRef]

Wang, W. J.

R. Yang and W. J. Wang, “A numerical and experimental study on gap compensation and wavelength selection in UV-lithography of ultra-high aspect ratio SU-8 microstructures,” Sens. Actuators B 110, 279–288 (2005).
[CrossRef]

Yamauchii, K.

K. Manoh, H. Yoshida, T. Kobayashi, M. Takase, K. Yamauchii, S. Fuchiwha, T. Ohno, N. Nishi, M. Ozawa, M. Ikeda, T. Tojyo, and T. Taniguchi, “Small integrated optical head device using a blue-violet laser diode for Blu-ray disc system,” Jpn. J. Appl. Phys. 42, 880–884 (2003).
[CrossRef]

Yang, R.

R. Yang and W. J. Wang, “A numerical and experimental study on gap compensation and wavelength selection in UV-lithography of ultra-high aspect ratio SU-8 microstructures,” Sens. Actuators B 110, 279–288 (2005).
[CrossRef]

Yoshida, H.

K. Manoh, H. Yoshida, T. Kobayashi, M. Takase, K. Yamauchii, S. Fuchiwha, T. Ohno, N. Nishi, M. Ozawa, M. Ikeda, T. Tojyo, and T. Taniguchi, “Small integrated optical head device using a blue-violet laser diode for Blu-ray disc system,” Jpn. J. Appl. Phys. 42, 880–884 (2003).
[CrossRef]

J. Micromech. Microeng. (6)

W. J. Kang, E. Rabe, S. Kopetz, and A. Neyer, “Novel exposure methods based on reflection and refraction effects in the field of SU-8 lithography,” J. Micromech. Microeng. 16, 821–831 (2006).
[CrossRef]

K. Y. Hung, H. T. Hu, and F. G. Tseng, “Application 3D glycerol-compensated inclined-exposure technology to integrated optical pick-up head,” J. Micromech. Microeng. 14, 975–983 (2004).
[CrossRef]

K. Y. Hung and J. C. Liao, “The application of Fresnel equations and anti-reflection technology to improve inclined exposure interface reflection and develop a key component needed for Blu-ray DVD—micro-mirrors,” J. Micromech. Microeng. 18, 075022 (2008).

K. Y. Hung and T. H. Liang, “Application of inclined-exposure and thick film process for high aspect-ratio micro structures on polymer optic devices,” J. Micromech. Microeng. 14, 1217–1222 (2008).

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[CrossRef]

K. Kim, D. S. Park, H. M. Lu, W. Che, K. Kim, J. B. Lee, and C. H. Ahn, “A tapered hollow metallic microneedle array using backside exposure of SU-8,” J. Micromech. Microeng. 14, 597–603 (2004).
[CrossRef]

Jpn. J. Appl. Phys. (2)

K. Manoh, H. Yoshida, T. Kobayashi, M. Takase, K. Yamauchii, S. Fuchiwha, T. Ohno, N. Nishi, M. Ozawa, M. Ikeda, T. Tojyo, and T. Taniguchi, “Small integrated optical head device using a blue-violet laser diode for Blu-ray disc system,” Jpn. J. Appl. Phys. 42, 880–884 (2003).
[CrossRef]

J. S. Sohn, E. H. Cho, M. Lee, H. S. Kim, M. Jung, S. D. Suh, W. C. Kim, N. C. Park, and Y. P. Park, “Development of microlens for high-density small-form-factor optical pickup,” Jpn. J. Appl. Phys. 45, 1144–1151 (2006).
[CrossRef]

Mater. Charact. (1)

C. H. Lee, K. Jiang, and G. J. Davies, “Sidewall roughness characterization and comparison between silicon and SU-8 microcomponents,” Mater. Charact. 58, 603–609 (2007).
[CrossRef]

Microsyst. Technol. (3)

K. S. Jung, “Design of optical path of pickup for small form factor optical disk drive,” Microsyst. Technol. 11, 1041–1047 (2005).
[CrossRef]

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[CrossRef]

I. H. Song, K. N. Kang, Y. Y. Jin, D. S. W. Park, and P. K. Ajmera, “Microlens array fabrication by backside exposure using Fraunhofer diffraction,” Microsyst. Technol. 14, 1285–1290 (2008).
[CrossRef]

Opt. Express (1)

Proc. IEEE (1)

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[CrossRef]

Sens. Actuators B (1)

R. Yang and W. J. Wang, “A numerical and experimental study on gap compensation and wavelength selection in UV-lithography of ultra-high aspect ratio SU-8 microstructures,” Sens. Actuators B 110, 279–288 (2005).
[CrossRef]

Other (1)

O. Mert and S. Mutlu, “Self-aligned polymer thin film transistors fabricated using backside exposure,” presented at the 5th International Thin Film Transistor Conference (ITC 2009), Palaiseau, France, 5–6 March 2009.

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Figures (5)

Fig. 1.
Fig. 1.

Schematic diagram of the k-type prism component for micro-pickup head application systems.

Fig. 2.
Fig. 2.

Schematic diagram of the light path defined using OSLO software; three prisms, an HOE, and an objective lens.

Fig. 3.
Fig. 3.

(a)–(g) Fabrication process of the k-type prism; (h) the concept of the k-type prism.

Fig. 4.
Fig. 4.

(a)–(d) Scanning electron microscopy (SEM) images of the fabricated micro k-type prisms showing (e) the optimum surface roughness provided by back-side exposure using a white light interferometer; (f) the optimum roughness provided by front-side exposure (an area of 400×400μm); and (g) the optimal roughness through front-side exposure (an area of 730×730μm).

Fig. 5.
Fig. 5.

(a) Test mechanism for k-type prisms using a He-Ne laser; (b) two He-Ne laser spots reflected by a k-type prism; (c) the k-type prism test mechanism using a blue laser; and (d) two blue laser spots reflected by a k-type prism.

Tables (1)

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Table 1. Comparison of the Roughness of Micro-Structures Fabricated in Different Studies

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