Abstract

Interference lithography using a deep-ultraviolet (DUV) laser is instrumental in the manufacture of subwavelength patterns used at visible wavelengths. We investigated a grating mask strategy for exposure in terms of how to set and illuminate masks. To obtain high aspect ratio patterns, high fringe visibility, and high exposure uniformity are essential, and for that purpose the use of only two beams with liquid immersion is necessary but not sufficient. It needs to be addressed whether the grating should face air or liquid to achieve index matching without affecting its beam-splitting properties. Currently, the most feasible solution to produce sub-200 nm periods requires the use of a fused-silica grating under Bragg geometry (not normal incidence geometry) and filling the gap between the grating and resist with a high-index liquid.

© 2012 Optical Society of America

Full Article  |  PDF Article
OSA Recommended Articles
100 nm period grating by high-index phase-mask immersion lithography

Yannick Bourgin, Yves Jourlin, Olivier Parriaux, Anne Talneau, Svetlen Tonchev, Colette Veillas, Petri Karvinen, Nicolas Passilly, Ahmad R. Md Zain, Richard M. De La Rue, Jürgen Van Erps, and David Troadec
Opt. Express 18(10) 10557-10566 (2010)

Double-sided structured mask for sub-micron resolution proximity i-line mask-aligner lithography

Yannick Bourgin, Thomas Siefke, Thomas Käsebier, Pascal Genevée, Adriana Szeghalmi, Ernst-Bernhard Kley, and Uwe D. Zeitner
Opt. Express 23(13) 16628-16637 (2015)

References

You do not have subscription access to this journal. Citation lists with outbound citation links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription

Cited By

You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription

Figures (12)

You do not have subscription access to this journal. Figure files are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription

Equations (4)

You do not have subscription access to this journal. Equations are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription

Metrics

You do not have subscription access to this journal. Article level metrics are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access OSA Member Subscription